USD877079SActiveUtility

Electrode plate for plasma processing apparatus

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Assignee: TOKYO ELECTRON LTDPriority: Aug 26, 2015Filed: Feb 16, 2016Granted: Mar 3, 2020
Est. expiryAug 26, 2035(~9.1 yrs left)· nominal 20-yr term from priority
Inventors:Shinichi KozukaRyosuke NiitsumaManabu Ishikawa
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PatentIndex Score
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Cited by
14
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for an electrode plate for plasma processing apparatus, as shown and described.

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