USD793572SActiveUtility

Electrode plate for plasma processing apparatus

Assignee: TOKYO ELECTRON LTDPriority: Jun 10, 2015Filed: Dec 1, 2015Granted: Aug 1, 2017

Est. expiryJun 10, 2035(~8.9 yrs left)· nominal 20-yr term from priority

PatentIndex Score

501

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References

Claims

exact text as granted — not AI-modified

CLAIM 
     
       The ornamental design for an electrode plate for plasma processing apparatus, as shown and described.

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