USD606952SActiveUtility

Plasma inducing plate for semiconductor deposition apparatus

Assignee: ASM GENITECH KOREA LTDPriority: Jan 16, 2009Filed: Jan 16, 2009Granted: Dec 29, 2009

Est. expiryJan 16, 2029(~2.5 yrs left)· nominal 20-yr term from priority

PatentIndex Score

534

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References

Claims

exact text as granted — not AI-modified

CLAIM 
     
       The ornamental design for a plasma inducing plate for semiconductor deposition apparatus, as shown and described.

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