USD491963SExpiredUtility

Inner wall shield for a process chamber for manufacturing semiconductors

Assignee: TOKYO ELECTRON LTDPriority: Nov 20, 2002Filed: May 20, 2003Granted: Jun 22, 2004

Est. expiryNov 20, 2022(expired)· nominal 20-yr term from priority

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exact text as granted — not AI-modified

I claim the ornamental design for inner wall shield for a process chamber for manufacturing semiconductors, as shown and described.

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