USD420022SExpiredUtility

Electrostatic chuck with improved spacing and charge migration reduction mask

86
Assignee: APPLIED MATERIALS INCPriority: Dec 24, 1997Filed: Dec 24, 1997Granted: Feb 1, 2000
Est. expiryDec 24, 2017(expired)· nominal 20-yr term from priority
Inventors:Vincent E. BurkhartAllen FlaniganSteven V. Sansoni
86
PatentIndex Score
31
Cited by
1
References
1
Claims

Claims

exact text as granted — not AI-modified
The ornamental design for an electrostatic chuck with improved spacing and charge migration reduction mask, as shown and described.

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