USD411516SExpiredUtility

Gas diffusion plate for electrode of semiconductor wafer processing apparatus

Assignee: TOKYO ELECTRON LTDPriority: Mar 15, 1996Filed: Sep 10, 1996Granted: Jun 29, 1999

Est. expiryMar 15, 2016(expired)· nominal 20-yr term from priority

PatentIndex Score

469

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References

Claims

exact text as granted — not AI-modified

We claim the ornamental design for gas diffusion plate for electrode of semiconductor wafer processing apparatus, as shown and described.

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