USD404375SExpiredUtility

Heat retaining tube base for use in a semiconductor wafer head processing apparatus

Assignee: TOKYO ELECTRON LTDPriority: Aug 20, 1997Filed: Feb 12, 1998Granted: Jan 19, 1999
Est. expiryAug 20, 2017(expired)· nominal 20-yr term from priority
54
PatentIndex Score
8
Cited by
4
References
1
Claims

Claims

exact text as granted — not AI-modified
I claim the ornamental design for a heat retaining tube base for use in a semiconductor wafer heat processing apparatus, as shown and described.

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