USD341418SExpiredUtility

Supply nozzle for applying liquid resist to a semiconductor wafer

Assignee: TOKYO ELECTRON LTDPriority: Feb 22, 1991Filed: Aug 21, 1991Granted: Nov 16, 1993
Est. expiryFeb 22, 2011(expired)· nominal 20-yr term from priority
Inventors:Masami Akimoto
83
PatentIndex Score
24
Cited by
4
References
1
Claims

Claims

exact text as granted — not AI-modified
The ornamental design for supply nozzle for applying liquid resist to a semiconductor wafer, as shown and described.

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