USD1000928SActiveUtility

Polishing pad

41
Assignee: CHO BENG YOULPriority: Jun 3, 2022Filed: Jun 3, 2022Granted: Oct 10, 2023
Est. expiryJun 3, 2042(~15.8 yrs left)· nominal 20-yr term from priority
Inventors:Beng Youl Cho
41
PatentIndex Score
2
Cited by
63
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for a polishing pad, as shown and described.

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