Active device array substrate and method for inspecting the same

Abstract

An active device array substrate is provided. The active device array substrate includes multiple pixel structures, a drive circuit, multiple signal lines and a control line. The pixel structures are disposed in a display area. The drive circuit is disposed outside the display area. The signal lines are electrically connected to the drive circuit and the pixel structures corresponded to the signal lines. The control lines are intersected with the signal lines. A method adapted for inspecting defects on the active device array substrate is also provided. First, a tested signal line is selected from the signal lines, and the control line and the tested-signal line are conducted. Second, a test signal is input from the control line to the tested-signal line to determine a location of a defect. Finally, the control line and the tested signal line are isolated.

What is claimed is: 
     
       1. An inspection method, adapted to detect a defect on an active device array substrate, wherein the active device array substrate comprises:
 a plurality of pixel structures, disposed in a display area; 
 a driving circuit, disposed outside the display area; 
 a plurality of signal lines, electrically connected to the driving circuit and the corresponding pixel structures; and 
 a control line, intersected with the signal lines, 
 the inspection method comprising: 
 selecting a tested signal line from the signal lines; 
 conducting the control line and the tested signal line; 
 inputting a test signal to the tested signal line from the control line to determine a location of the defect; and 
 isolating the control line and the tested signal line. 
 
     
     
       2. The inspection method as claimed in  claim 1 , wherein the step of selecting the tested signal line from the signal lines comprises:
 determining the tested signal line corresponding to the defect through a voltage imaging measurement method. 
 
     
     
       3. The inspection method as claimed in  claim 1 , wherein the step of inputting the test signal to the tested signal line to determine the location of the defect comprises:
 performing an infrared thermography detection to the active device array substrate, so as to determine the location of the detect according to obtained infrared thermography information. 
 
     
     
       4. The inspection method as claimed in  claim 1 , wherein the step of conducting the control line and the tested signal line comprises:
 welding an intersection of the control line and the tested signal line through laser, so as to form a welding point connecting the control line and the tested signal line. 
 
     
     
       5. The inspection method as claimed in  claim 4 , wherein after the location of the defect is determined, the step of isolating the control line and the tested signal line comprises:
 removing a part of the tested signal line connected at two opposite sides of the welding point to form:
 a first signal line segment, electrically connected to the driving circuit; 
 a second signal line segment, electrically connected to the pixel structure; and 
 a third signal line segment, having the welding point, and isolated to the first signal line segment and the second signal line segment. 
 
 
     
     
       6. The inspection method as claimed in  claim 5 , further comprising:
 forming a connection line electrically connected to the first signal line segment and the second signal line segment, wherein the connection line is isolated to the third signal line segment. 
 
     
     
       7. The inspection method as claimed in  claim 4 , wherein one side of the signal line has a first extending portion, one side of the control line has a second extending portion, and the first extending portion and the second extending portion are intersected to each other, so as to form the welding point after laser welding. 
     
     
       8. The inspection method as claimed in  claim 7 , wherein after the location of the defect is determined, the step of isolating the control line and the tested signal line comprises:
 removing a part of the first extending portion connected to the welding point to isolate the welding point and the signal line; and 
 removing a part of the second extending portion connected to the welding point to isolate the welding point and the control line. 
 
     
     
       9. An inspection method, adapted to detect a defect on an active device array substrate, wherein the active device array substrate comprises:
 a plurality of pixel structures, disposed in a display area; 
 a driving circuit, disposed outside the display area; 
 a control line, located between the driving circuit and the display area; 
 a plurality of signal lines, electrically connected to the driving circuit and the corresponding pixel structures, and intersected with the control line, wherein the signal lines comprise a target signal line, and the target signal line comprises:
 a first signal line segment, electrically connected to the driving circuit; 
 a second signal line segment, electrically connected to the corresponding pixel structure; 
 a third signal line segment, having a welding point connected to the control line, and respectively isolated to the first signal line segment and the second signal line segment; and 
 a connection line, electrically connected to the first signal line segment and the second signal line segment, and isolated to the third signal line segment, 
 
 the inspection method comprising: 
 selecting a tested signal line from the signal lines; 
 conducting the control line and the tested signal line; 
 inputting a test signal to the tested signal line from the control line to determine a location of the defect; and 
 isolating the control line and the tested signal line. 
 
     
     
       10. An inspection method, adapted to detect a defect on an active device array substrate, wherein the active device array substrate comprises:
 a plurality of pixel structures, disposed in a display area; 
 a driving circuit, disposed outside the display area; 
 a control line, located between the driving circuit and the display area; and 
 a plurality of signal lines, electrically connected to the driving circuit and the corresponding pixel structures, and intersected with the control line, wherein one side of each of the signal lines has at least one first extending portion, one side of the control line has at least one second extending portion, one of the signal lines is defined as a target signal line, the first extending portion of the target signal line and the corresponding second extending portion are intersected to form a welding point, the target signal line further has a first main body portion and a first disconnection portion, the control line further has a second main body portion and a second disconnection portion, and the welding point is electrically isolated to the first main body portion and the second main body portion through the first disconnection portion and the second disconnection portion, respectively, 
 the inspection method comprising: 
 selecting a tested signal line from the signal lines; 
 conducting the control line and the tested signal line; 
 inputting a test signal to the tested signal line from the control line to determine a location of the defect; and 
 isolating the control line and the tested signal line. 
 
     
     
       11. An inspection method, adapted to detect a defect on an active device array substrate, wherein the active device array substrate comprises:
 a plurality of pixel structures, disposed in a display area; 
 a driving circuit, disposed outside the display area; 
 a control line, located between the driving circuit and the display area, and electrically isolated to the driving circuit; and 
 a plurality of signal lines, electrically connected to the driving circuit and the corresponding pixel structures, and intersected with the control line, wherein one side of each of the signal lines has at least one first extending portion, one side of the control line has at least one second extending portion, and at least one of the first extending portions is intersected with the corresponding second extending portion, 
 the inspection method comprising: 
 selecting a tested signal line from the signal lines; 
 conducting the control line and the tested signal line; 
 inputting a test signal to the tested signal line from the control line to determine a location of the defect; and 
 isolating the control line and the tested signal line. 
 
     
     
       12. An inspection method, adapted to detect a defect on an active device array substrate, wherein the active device array substrate comprises:
 a plurality of pixel structures, disposed in a display area; 
 a driving circuit, disposed outside the display area; 
 a control line, located between the driving circuit and the display area; and 
 a plurality of signal lines, electrically connected to the driving circuit and the corresponding pixel structures, and intersected with the control line, wherein one side of each of the signal lines has at least one first extending portion, one side of the control line has at least one second extending portion, wherein one of the signal lines is defined as a target signal line, the first extending portion of the target signal line and the corresponding second extending portion are intersected to form a welding point, and the welding point is not electrically connected to the driving circuit, 
 the inspection method comprising: 
 selecting a tested signal line from the signal lines; 
 conducting the control line and the tested signal line; 
 inputting a test signal to the tested signal line from the control line to determine a location of the defect; and 
 isolating the control line and the tested signal line.