Position determining device, position determining method, lithographic apparatus, and method for manufacturing object

Abstract

A position determining device includes a first lighting unit configured to emit light to an edge portion of a rotating substrate and a second lighting unit configured to emit light to at least one mark on a surface of the substrate. The alignment device further includes a light receiving unit disposed on a side corresponding to the surface of the substrate and configured to receive light that is emitted from the first lighting unit and then passes through a region outside the substrate and to receive light that is emitted from the second lighting unit and then reflected from the at least one mark. The position of the substrate is determined based on a result of light reception by the light receiving unit.

What is claimed is: 
     
       1. A position determining device comprising:
 a first lighting unit configured to emit light to an edge portion of a substrate arranged on a stage having, as a mark, neither an orientation flat nor a notch; 
 a second lighting unit configured to emit light to at least one mark on a surface of the substrate; 
 a light receiving unit disposed on a side of the surface of the substrate and configured to receive light that is emitted from the first lighting unit and then passes through a region outside the substrate and to receive light that is emitted from the second lighting unit and then reflected from the at least one mark; and 
 a determining unit configured to determine a position of the edge portion and a position of the at least one mark based on a result of light reception by the light receiving unit, and then determine the position of the substrate with respect to the stage based on the determined position of the edge portion and the determined position of the at least one mark. 
 
     
     
       2. The position determining device according to  claim 1 , wherein the second lighting unit emits the light at an angle with respect to the surface, of the substrate, where the at least one mark is provided, and in an outwardly direction, from an inner side of the substrate. 
     
     
       3. The position determining device according to  claim 1 , wherein the first lighting unit is disposed on a side of either one of a front surface and a back surface of the substrate, and the second lighting unit is disposed on the side of the other. 
     
     
       4. The position determining device according to  claim 1 , further comprising a rotating unit configured to rotate the substrate,
 wherein the light receiving unit receives at least one of the light from the first lighting unit and the light from the second lighting unit while the rotating unit rotates the substrate. 
 
     
     
       5. The position determining device according to  claim 1 , wherein the second lighting unit emits the light to the at least one mark on a back surface of the substrate. 
     
     
       6. The position determining device according to  claim 1 , wherein the determining unit determines the position of the substrate based on the result of light reception and sample information about the at least one mark. 
     
     
       7. The position determining device according to  claim 1 , wherein the determining unit determines the position of the at least one mark by using only a selected part of the result of light reception in a radial direction of the substrate and information about a distance from the edge portion to the at least one mark. 
     
     
       8. The position determining device according to  claim 1 , wherein the second lighting unit emits flashing light. 
     
     
       9. The position determining device according to  claim 1 , wherein the light receiving unit adjusts a light reception range in a rotation direction of the substrate based on the number of the at least one mark. 
     
     
       10. The position determining device according to  claim 1 , wherein the second lighting unit changes a lighting condition based on the number of the at least one mark and the position of the substrate in a rotation direction of the substrate. 
     
     
       11. The position determining device according to  claim 1 , wherein the determining unit determines the position of the substrate based on a result of moving-average processing performed on the result of the light reception. 
     
     
       12. The position determining device according to  claim 1 , wherein the position of the substrate includes a position in each of two directions which are orthogonal to each other in an in-plane of the substrate and a position of a rotation direction around a direction orthogonal to the two directions orthogonal to each other. 
     
     
       13. The position determining device according to  claim 1 , wherein the determining unit determines an amount of position deviation of the substrate with respect to the center of the stage based on the determined position of the edge portion and the determined position of the at least one mark. 
     
     
       14. A position determining method comprising:
 an emitting step of emitting light to an edge portion of a substrate arranged on a stage and to at least one mark provided on a surface of the substrate, the substrate has, as a mark, neither an orientation flat nor a notch; 
 a receiving step of receiving light passing through a region outside the substrate and light reflected from the at least one mark by using a single light receiving unit; 
 a first determining step of determining a position of the edge portion and a position of the at least one mark based on a result of light reception in the receiving step; and 
 a second determining step of determining the position of the substrate with respect to the stage based on the determined position of the edge portion and the determined position of the at least one mark determined in the first determining step. 
 
     
     
       15. The position determining method according to  claim 14 , wherein the at least one mark on the substrate comprises a plurality of marks, and
 the position of the substrate is determined based on the result of light reception in the receiving step and information about the plurality of marks. 
 
     
     
       16. The method according to  claim 14 , wherein the position of the substrate includes a position in each of two directions which are orthogonal to each other in an in-plane of the substrate and a position of a rotation direction around a direction orthogonal to the two directions orthogonal to each other. 
     
     
       17. A lithographic apparatus comprising:
 a position determining device configured to determine a position of a substrate arranged on a stage, the position of the substrate is the position of the substrate with respect to the stage; and 
 a position adjusting unit configured to adjust the position of the substrate with respect to a stage capable of moving with the substrate placed thereon based on the position of the substrate determined by the position determining device, 
 wherein the position determining device includes
 a first lighting unit configured to emit light to an edge portion of the substrate having, as a mark, neither an orientation flat nor a notch, 
 a second lighting unit configured to emit light to at least one mark on a surface of the substrate, 
 a light receiving unit disposed on a side corresponding to the surface of the substrate and configured to receive light that is emitted from the first lighting unit and then passes through a region outside the substrate and to receive light that is emitted from the second lighting unit and then reflected from the at least one mark, and 
 a determining unit configured to determine a position of the edge portion and a position of the at least one mark based on a result of light reception by the light receiving unit, and then determine the position of the substrate with respect to the stage based on the determined position of the edge portion and the determined position of the at least one mark, and 
 
 the lithographic apparatus forms a pattern on the substrate adjusted by the position adjusting unit. 
 
     
     
       18. The lithographic apparatus according to  claim 17 , wherein the lithographic apparatus performs edge exposure on the substrate based on a position of the edge portion of the substrate obtained by the position determining device. 
     
     
       19. A method for manufacturing an object, the method comprising:
 a step of forming a pattern on a substrate by using the lithographic apparatus according to  claim 17 ; and 
 a step of processing the substrate with the pattern formed thereon by the step of forming to manufacture the object. 
 
     
     
       20. The lithography apparatus according to  claim 17 , wherein the position of the substrate includes a position in each of two directions which are orthogonal to each other in an in-plane of the substrate and a position of a rotation direction around a direction orthogonal to the two directions orthogonal to each other.