Exposure apparatus and exposure method using the same

Abstract

An exposure method includes loading a first substrate on a loading portion , the first substrate having a photo alignment agent which is coated on the first substrate, irradiating the first substrate by moving the first substrate in a first speed in a first direction to a working portion while loading a second substrate on the loading portion, the working portion having an ultra violet light source generating ultra violet ray to harden a photo alignment agent, simultaneously irradiating the first substrate and the second substrate by moving the first substrate and the second substrate in the first direction in the working portion, and unloading the first substrate from an unloading portion while irradiating the second substrate by moving the second substrate in the first direction in the working portion.

What is claimed is: 
     
       1. An exposure method comprising:
 loading a first substrate on a loading portion, the first substrate having a photo alignment agent which is coated on the first substrate; 
 irradiating the first substrate by moving the first substrate in a first speed in a first direction to a working portion while 
 loading a second substrate on the loading portion, the working portion having an ultra violet light source generating ultra violet ray to harden a photo alignment agent; 
 simultaneously irradiating the first substrate and the second substrate by moving the first substrate and the second substrate in the first direction in the working portion; and 
 unloading the first substrate from an unloading portion while irradiating the second substrate by moving the second substrate in the first direction in the working portion. 
 
     
     
       2. The exposure method of  claim 1 , between loading the first substrate and irradiating the first substrate, further comprising:
 moving the first substrate in a second speed in the first direction, the second speed being faster than the first speed. 
 
     
     
       3. The exposure method of  claim 2 , further comprising:
 between irradiating the first and second substrates, and unloading the first substrate while irradiating the second substrate, 
 moving the first substrate in a third speed in the first direction, the third speed being faster than the first speed. 
 
     
     
       4. The exposure method of  claim 1 , wherein the first and second substrates are irradiated in an exposure area disposed in the working portion which is between the loading portion and the unloading portion, and
 the loading portion, the working portion and the unloading portion are disposed in the first direction in order. 
 
     
     
       5. The exposure method of  claim 4 , wherein the first and second substrates are transferred by an air floating stage, and
 first and second grippers hold the first and second substrates to transfer the first and second substrates. 
 
     
     
       6. The exposure method of  claim 5 , wherein loading the first substrate comprises:
 moving the first substrate in a second direction substantially perpendicular to the first direction to place the first substrate on the first gripper and to place a side of the first substrate in parallel with the first direction, and aligning the first substrate by rotating the first substrate in a plane which formed by the first and second directions. 
 
     
     
       7. The exposure method of  claim 6 , wherein loading the first substrate further comprises:
 after aligning the first substrate, rotating the first substrate in the plane to form a predetermined angle between the side of the first substrate and the first direction. 
 
     
     
       8. The exposure method of  claim 1 , wherein the first substrate is loaded on a first gripper and the second substrate is loaded on a second gripper. 
     
     
       9. The exposure method of  claim 1 , further comprising:
 irradiating the second substrate by moving the second substrate in the first direction while loading a third substrate on the loading portion. 
 
     
     
       10. The exposure method of  claim 9 , further comprising:
 irradiating the third substrate by moving the third substrate in the first direction while loading a fourth substrate on the loading portion.