US9670753B2ActiveUtilityA1
Optimized acidizing of production and injection wells
Est. expiryJan 24, 2034(~7.5 yrs left)· nominal 20-yr term from priority
E21B 43/25E21B 49/00C09K 8/72G06F 30/17E21B 43/27G06F 17/5086E21B 43/26E21B 41/0092
79
PatentIndex Score
6
Cited by
17
References
17
Claims
Abstract
A system, computer program product, and computer implemented method are provided for determining an optimal acidizing placement design which would yield a prescribed profile of injection or production rate that accounts for the drawdown from heel to toe and reservoir heterogeneity and thereby improve hydrocarbon recovery.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1. A computer-implemented method for optimizing acid placement for well treatments, the method comprising:
determining a flow rate profile of a well in a reservoir formation based on a uniform acid placement function;
determining a reference location along a length of the well, wherein the reference location satisfies a condition of having a minimum ratio between a current injection front and a target injection front;
determining a reference value based on the flow rate profile at the reference location along the length of the well;
defining a target flow rate profile based on the reference value;
determining a pressure distribution along the length of the well based on the target flow rate profile;
determining an acid placement function that yields a prescribed shape of the flow rate profile for the well based on the target flow rate profile and the pressure distribution; and
optimizing placement of an acid treatment along the length of the well, based on the acid placement function.
2. The method of claim 1 , wherein the target flow rate profile is a target injection profile.
3. The method of claim 2 , wherein the target injection profile and a permeability of an undamaged portion of the reservoir formation are uniform.
4. The method of claim 1 , wherein the reference location along the length of the well satisfies a condition of having a minimum ratio between a current production front and a target production front.
5. The method of claim 4 , wherein the target flow rate profile is a target production profile.
6. The method of claim 5 , wherein the target production profile and a permeability of an undamaged portion of the reservoir formation are uniform.
7. The method of claim 5 , wherein the target production profile is uniform and a permeability of an undamaged portion of the reservoir formation is non-uniform.
8. The method of claim 5 , wherein the target production profile is non-uniform and a permeability of an undamaged portion of the reservoir formation is uniform.
9. A system for optimizing acid placement for well treatments, the system comprising:
at least one processor; and
a memory coupled to the at least one processor and storing processor readable instructions, which when executed by the processor cause the processor to perform a plurality of operations, including operations to:
determine a flow rate profile of a well in a reservoir formation based on a uniform acid placement function;
determine a reference location along a length of the well, wherein the reference location satisfies a condition of having a minimum ratio between a current injection front and a target injection front;
determine a reference value based on the flow rate profile at the reference location along the length of the well;
define a target flow rate profile based on the reference value;
determine a pressure distribution along the length of the well based on the target flow rate profile;
determine an acid placement function that yields a prescribed shape of the flow rate profile for the well based on the target flow rate profile and the pressure distribution; and
optimize placement of an acid treatment along the length of the well, based on the acid placement function.
10. The system of claim 9 , wherein the target flow rate profile is a target injection profile.
11. The system of claim 10 , wherein the target injection profile and a permeability of an undamaged portion of the reservoir formation are uniform.
12. The system of claim 9 , wherein the reference location along the length of the well satisfies a condition of having a minimum ratio between a current production front and a target production front.
13. The system of claim 12 , wherein the target flow rate profile is a target production profile.
14. The system of claim 13 , wherein the target production profile and a permeability of an undamaged portion of the reservoir formation are uniform.
15. The system of claim 13 , wherein the target production profile is uniform and a permeability of an undamaged portion of the reservoir formation is non-uniform.
16. The system of claim 13 , wherein the target production profile is non-uniform and a permeability of an undamaged portion of the reservoir formation is uniform.
17. A non-transitory computer readable medium having instructions stored therein, which when executed by a computer cause the computer to perform a plurality operations, including operations to:
determine a flow rate profile of a well in a reservoir formation based on a uniform acid placement function;
determine a reference location along a length of the well, wherein the reference location satisfies a condition of having a minimum ratio between a current injection front and a target injection front;
determine a reference value based on the flow rate profile at the reference location along the length of the well;
define a target flow rate profile based on the reference value;
determine a pressure distribution along the length of the well based on the target flow rate profile;
determine an acid placement function that yields a prescribed shape of the flow rate profile for the well based on the target flow rate profile and the pressure distribution; and
optimize placement of an acid treatment along the length of the well, based on the acid placement function.Join the waitlist — get patent alerts
Track US9670753B2 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.