US9599500B2ActiveUtilityPatentIndex 93
Ink level sensor and related methods
Est. expiryJun 27, 2031(~5 yrs left)· nominal 20-yr term from priority
G01F 23/263B41J 2/14153B41J 2/175B41J 2/17566B41J 2002/17579
93
PatentIndex Score
35
Cited by
27
References
9
Claims
Abstract
In an embodiment, a method of sensing an ink level includes applying a pre-charge voltage Vp to a sense capacitor to charge the sense capacitor with a charge Q 1 , sharing Q 1 between the sense capacitor and a reference capacitor, causing a reference voltage Vg at the gate of an evaluation transistor, and determining a resistance from drain to source of the evaluation transistor that results from Vg.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1. An ink level sensor comprising:
a sense capacitor whose capacitance changes with a level of ink in a chamber;
a first switch to apply a voltage Vp to the sense capacitor, placing a charge on the sense capacitor;
a second switch to share the charge between the sense capacitor and a reference capacitor, resulting in a reference voltage Vg; and
an evaluation transistor configured to provide a drain to source resistance in proportion to the reference voltage.
2. An ink level sensor as in claim 1 , wherein the sense capacitor comprises:
a metal plate;
a passivation layer over the metal plate; and
substance within a chamber above the passivation layer.
3. An ink level sensor as in claim 2 , wherein the substance is selected from the group consisting of ink, ink and air, and air.
4. An ink level sensor as in claim 1 , wherein the reference capacitor comprises gate capacitance of the evaluation transistor.
5. An ink level sensor as in claim 1 , further comprising a sense structure that includes the sense capacitor, the chamber, a nozzle, a metal plate firing element disposed within the fluid chamber, a passivation layer over the firing element, and an insulating layer on a silicon substrate.
6. An ink level sensor as in claim 1 , further comprising a clearing resistor to purge ink residue from the chamber.
7. An ink level sensor as in claim 2 , wherein the metal plate comprises a resistor firing element.
8. An ink level sensor as in claim 2 , further comprising a parasitic elimination element to eliminate a parasitic capacitance formed under the metal plate.
9. An ink level sensor as in claim 8 , wherein the parasitic elimination element comprises a conductive poly silicon layer.Cited by (0)
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