US8946738B2ActiveUtilityA1

Light emitting device, light emitting module, and method for manufacturing light emitting device

Assignee: TOSHIBA KKPriority: Mar 25, 2011Filed: Aug 7, 2013Granted: Feb 3, 2015
Est. expiryMar 25, 2031(~4.6 yrs left)· nominal 20-yr term from priority
H05K 1/181H05K 2201/10454H05K 2201/10106H10H 20/853H10H 20/819H10H 20/0364H10H 20/84H10H 20/018H10H 20/8506H10H 20/857H10H 20/85H01L 33/62H01L 33/44H01L 33/486H01L 33/0079H01L 33/20H01L 2924/0002H01L 33/54H01L 2933/0066H01L 2924/00
49
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References
20
Claims

Abstract

According to one embodiment, a light emitting device includes a semiconductor layer, a p-side electrode, an n-side electrode, a first insulating layer, a p-side interconnect layer, an n-side interconnect layer, and a second insulating layer. The portion of the second p-side interconnect layer has the L-shaped cross section being configured to include a p-side external terminal exposed from the first insulating layer and the second insulating layer at a third surface having a plane orientation different from the first surface and the second surface. The portion of the second n-side interconnect layer has the L-shaped cross section being configured to include an n-side external terminal exposed from the first insulating layer and the second insulating layer at the third surface.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
       1. A light emitting device, comprising:
 a semiconductor layer including a first surface, a second surface opposite to the first surface, and a light emitting layer provided between the first surface and the second surface; 
 a p-side electrode provided on the semiconductor layer; 
 an n-side electrode provided on the semiconductor layer; 
 a first insulating layer provided on the second surface side, the first insulating layer having a first via communicating with the p-side electrode and a second via communicating with the n-side electrode; 
 a p-side interconnect layer including a first p-side interconnect layer electrically connected to the p-side electrode through the first via, and a second p-side interconnect layer electrically connected to the first p-side interconnect layer and provided on an interconnect surface provided on a side of the first insulating layer opposite to the semiconductor layer, the second p-side interconnect layer including a portion having a U-shaped cross section; 
 an n-side interconnect layer including a first n-side interconnect layer electrically connected to the n-side electrode through the second via, and a second n-side interconnect layer electrically connected to the first n-side interconnect layer, separated from the p-side interconnect layer and provided on the interconnect surface, the second n-side interconnect layer including a portion having a U-shaped cross section; and 
 a second insulating layer provided between the p-side interconnect layer and the n-side interconnect layer, 
 the portion of the second p-side interconnect layer having a p-side external terminal exposed from the first insulating layer and the second insulating layer at a third surface having a plane orientation different from the first surface and the second surface, 
 the portion of the second n-side interconnect layer having an n-side external terminal exposed from the first insulating layer and the second insulating layer at the third surface. 
 
     
     
       2. The device of  claim 1 , further comprising a third insulating layer provided inside the U-shaped configuration of the second p-side interconnect layer and inside the U-shaped configuration of the second n-side interconnect layer. 
     
     
       3. The device of  claim 2 , wherein the second insulating layer and the third insulating layer are the same resin material. 
     
     
       4. The device of  claim 1 , wherein a distance between the p-side external terminal and the n-side external terminal exposed at the third surface is greater than a distance between the first p-side interconnect layer and the first n-side interconnect layer on the interconnect surface. 
     
     
       5. The device of  claim 1 , wherein a planar size of the first p-side interconnect layer is larger than a planar size of a portion of the second p-side interconnect layer provided on the first p-side interconnect layer. 
     
     
       6. The device of  claim 1 , wherein the first p-side interconnect layer is connected to the p-side electrode through a plurality of the first vias. 
     
     
       7. The device of  claim 1 , further comprising a transparent body provided on the first surface, the transparent body being transparent to an emitted light from the light emitting layer. 
     
     
       8. The device of  claim 7 , wherein the transparent body includes a transparent resin and a phosphor dispersed in the transparent resin. 
     
     
       9. The device of  claim 7 , further comprising a reflective film provided on a side surface of the transparent body, the reflective film being reflective with respect to the emitted light from the light emitting layer. 
     
     
       10. The device of  claim 9 , wherein the reflective film is provided also on a side surface of the first insulating layer. 
     
     
       11. The device of  claim 1 , wherein the third surface is perpendicular to the first surface. 
     
     
       12. The device of  claim 1 , wherein the third surface is not perpendicular to the first surface and is tilted with respect to the first surface. 
     
     
       13. The device of  claim 1 , wherein
 a planar configuration of the light emitting device is a rectangular configuration as viewed from a direction perpendicular to the first surface, and 
 the third surface is a surface including a long side of the rectangular configuration. 
 
     
     
       14. A light emitting module, comprising:
 a mounting substrate including a pad in a mounting surface; and 
 the device of  claim 1  mounted to the mounting surface by bonding the p-side external terminal and the n-side external terminal to the pad, 
 the first surface of the light emitting device being configured to face a lateral direction when the third surface faces downward. 
 
     
     
       15. A method for manufacturing a light emitting device, comprising:
 forming a p-side interconnect layer on an interconnect surface of a stacked body, the stacked body including a plurality of semiconductor layers, a p-side electrode, an n-side electrode, and a first insulating layer, the plurality of semiconductor layers being partitionally separated by a dicing region, each of the plurality of semiconductor layers including a first surface, a second surface opposite to the first surface, and a light emitting layer provided between the first surface and the second surface, the p-side electrode being provided on the semiconductor layer, the n-side electrode being provided on the semiconductor layer, the first insulating layer being provided on the second surface side and having a first via communicating with the p-side electrode, a second via communicating with the n-side electrode, and an interconnect surface formed on a side opposite to the semiconductor layer; 
 forming an n-side interconnect layer on the interconnect surface apart from the p-side interconnect layer; 
 forming a second insulating layer between the p-side interconnect layer and the n-side interconnect layer; and 
 exposing a portion of the p-side interconnect layer and a portion of the n-side interconnect layer at a third surface of a plane orientation different from the first surface and the second surface by cutting a region of the dicing region, the cut region of the dicing region including the second insulating layer, a portion of the p-side interconnect layer, and a portion of the n-side interconnect layer, 
 the forming of the p-side interconnect layer including:
 forming a first p-side interconnect layer inside the first via and on the interconnect surface; and 
 forming a second p-side interconnect layer in a recessed configuration on the first p-side interconnect layer, a portion of the second p-side interconnect layer having a U-shaped cross section, and exposed from the first insulating layer and the second insulating layer, 
 
 the forming of the n-side interconnect layer including:
 forming a first n-side interconnect layer inside the second via and on the interconnect surface; and 
 forming a second n-side interconnect layer in a recessed configuration on the first n-side interconnect layer, a portion of the second n-side interconnect layer having a U-shaped cross section, and exposed from the first insulating layer and the second insulating layer. 
 
 
     
     
       16. The method of  claim 15 , further comprising filling a third insulating layer inside the second p-side interconnect layer and inside the second n-side interconnect layer. 
     
     
       17. The method of  claim 15 , wherein a portion of the p-side interconnect layer and a portion of the n-side interconnect layer are formed to jut onto the dicing region extending in a direction along the third surface. 
     
     
       18. The method of  claim 17 , wherein the jutting portions of the p-side interconnect layer and the n-side interconnect layer are formed on both width-direction sides of the dicing region extending in the direction along the third surface. 
     
     
       19. The method of  claim 18 , further comprising filling a third insulating layer inside the second p-side interconnect layer and inside the second n-side interconnect layer. 
     
     
       20. A light emitting device, comprising:
 a semiconductor layer including a first surface, a second surface opposite to the first surface, and a light emitting layer provided between the first surface and the second surface; 
 a p-side electrode provided on the semiconductor layer; 
 an n-side electrode provided on the semiconductor layer; 
 a first insulating layer provided on the second surface side, the first insulating layer having a first via communicating with the p-side electrode and a second via communicating with the n-side electrode; 
 a p-side interconnect layer including a first p-side interconnect layer electrically connected to the p-side electrode through the first via, and a second p-side interconnect layer electrically connected to the first p-side interconnect layer and provided on an interconnect surface provided on a side of the first insulating layer opposite to the semiconductor layer, the second p-side interconnect layer including a portion having an U-shaped cross section; 
 an n-side interconnect layer including a first n-side interconnect layer electrically connected to the n-side electrode through the second via, and a second n-side interconnect layer electrically connected to the first n-side interconnect layer, separated from the p-side interconnect layer and provided on the interconnect surface, the second n-side interconnect layer including a portion having an U-shaped cross section; and 
 a second insulating layer provided between the p-side interconnect layer and the n-side interconnect layer.

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