US8643280B2ActiveUtilityA1
Method for controlling ion energy in radio frequency plasmas
Est. expiryMar 20, 2028(~1.7 yrs left)· nominal 20-yr term from priority
H01J 37/32009H01J 37/32165H01J 37/32706H01J 37/32146H01J 37/04H01J 37/32091
69
PatentIndex Score
4
Cited by
12
References
2
Claims
Abstract
A method of establishing a DC bias in front of at least one electrode in a plasma operating apparatus by applying an RF voltage with at least two harmonic frequency components with a controlled relative phase between the components, where at least one of the higher frequency components is established as an even multiple of the lower frequency component.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1. A method of establishing a DC bias in front of at least one electrode in a plasma operating apparatus by applying to one electrode an RF voltage with at least two harmonic frequency components with a controlled relative phase between the components, where at least one of the higher frequency components is established as an even multiple of the lower frequency component.
2. A method of establishing a DC bias in front of at least one electrode in a plasma operating apparatus by applying an RF voltage with at least two harmonic frequency components with a controlled relative phase between the components, where at least one of the higher frequency components is established as an even multiple of the lower frequency component and the DC bias of sheaths between the plasma and the electrodes is linearly adjusted by tuning the relative phase.Join the waitlist — get patent alerts
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