US7695570B2ExpiredUtilityA1

Processing-subject cleaning method and apparatus, and device manufacturing method and device

Assignee: SEIKO EPSON CORPPriority: Mar 15, 2002Filed: Mar 7, 2006Granted: Apr 13, 2010
Est. expiryMar 15, 2022(expired)· nominal 20-yr term from priority
Inventors:Yoshiaki Mori
H10P 72/0406H10P 72/0414B08B 2203/0229B08B 3/02Y10S438/906C03C 23/0075
63
PatentIndex Score
1
Cited by
24
References
6
Claims

Abstract

The invention reduces the amounts of cleaning liquids and rinse liquid used, as well as the energy consumption. A cleaning head has a plurality of cleaning units and a drying unit. An organic substance cleaning portion of each cleaning unit blows a first cleaning agent selectively over a portion to be cleaned of a substrate, and sucks reaction products etc. through a first suction mouth. An inorganic substance cleaning portion blows a second cleaning agent over the portion to be cleaned of the substrate from which organic substance have been removed, and sucks reaction products etc. through a second suction mouth. A rinse portion blows pure water the portion of the substrate from which inorganic substance have been removed, and sucks its vapor through a third suction mouth. The drying unit dries the substrate by blowing out a heated gas from a hot wind blowing-out mouth. A light guide illuminates the portion to be cleaned of the substrate with ultraviolet light, and thereby decomposes residual organic substances.

Claims

exact text as granted — not AI-modified
1. A processing-subject cleaning method, comprising:
 removing, in an organic substance cleaning portion, an organic substance by blowing a first cleaning agent through a first nozzle selectively over a pattern-forming portion of a processing-subject; 
 removing, in an inorganic substance cleaning portion, an inorganic substance by blowing a second cleaning agent through a second nozzle different from the first nozzle selectively over the pattern-forming portion; 
 blowing a rinse liquid, in a rinse portion, through a third nozzle different from the first and second nozzles selectively over the pattern-forming portion and removing the rinse liquid; and 
 drying a portion of the process-subject over which the rinse liquid was blown using a wind blowing unit located behind the first, second and third nozzles; 
 at least one of the removing an organic substance, the removing an inorganic substance, and the blowing of the rinse liquid being performed by a liquid jetting device; 
 providing a single cleaning head comprising the first, second and third nozzles; 
 wherein the organic substance cleaning portion, the inorganic substance cleaning portion and the rinse portion are arranged in this order, along a straight path, in a moving direction of the single cleaning head that moves along a direction substantially parallel to a surface of the processing-subject. 
 
   
   
     2. The processing-subject cleaning method according to  claim 1 , the blowing the rinse liquid being executed after each of the removing an organic substance and the removing an inorganic substance has been executed plural times. 
   
   
     3. The processing-subject cleaning method according to  claim 1 , the first cleaning agent being a mixture of a first reactive gas, capable of reacting with the organic substance, and a first dissolving liquid, capable of dissolving the first reactive gas in itself. 
   
   
     4. The processing-subject cleaning method according to  claim 1 , the second cleaning agent being a mixture of a second reactive gas, capable of reacting with the inorganic substance, and a second dissolving liquid, capable of dissolving the second reactive gas in itself. 
   
   
     5. The processing-subject cleaning method according to  claim 1 , the first cleaning agent being a first reactive gas that is blown over the pattern-forming portion and can react with the organic substance, and a first dissolving liquid that is blown over the pattern-forming portion and can dissolve the first reactive gas in itself. 
   
   
     6. The processing-subject cleaning method according to  claim 1 , the second cleaning agent being a second reactive gas that is blown over the pattern-forming portion and can react with the inorganic substance, and a second dissolving liquid that is blown over the pattern-forming portion and can dissolve the second reactive gas in itself.

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