High purity metal Mo coarse powder and sintered sputtering target produced by thereof

Abstract

A sintered sputtering target for forming a high purity metal Mo thin film having a remarkably little particle generation is provided. A high purity metal Mo coarse powder as a raw material is provided for making this target. The sintered sputtering target has a theoretical density ratio of 98% or more. The target is obtained by sintering the high purity metal Mo coarse powder. This particle powder has the high purity of 99.99 or more % by mass and an average particle diameter of 5.5 to 7.5 μm.

1. A high purity metal powder, comprising:
 a highly pure Mo coarse powder for making a sintered sputtering target, 
 wherein said powder has a high purity of 99.99 or more % by mass and an average particle diameter of 5.5 to 7.5 μm, and a specific surface area of 0.07 to 0.2 m 2 /g, and 
 wherein the highest reduction temperature to form the highly pure Mo coarse powder is between 1150 and 1300 degrees C. 
 
     
     
       2. A target comprising: a sintered sputtering target for forming a highly pure metal Mo thin film having little particle generation, wherein said target is sintered by HIP by using a highly pure metal Mo coarse powder having a high purity of 99.99 or more % by mass, an average particle diameter of 5.5 to 7.5 μm and a specific surface area of 0.07 to 0.2 m 2 /g and oxygen quantities occupying ratio to the whole powders is below 150 ppm, and a theoretical density ratio of 98% or more, and where the highest reduction temperature to form the highly pure Mo coarse powder is between 1150 and 1300 degrees C. 
     
     
       3. The high purity metal powder of  claim 1 , wherein said highly pure Mo coarse powder further comprises 4 to 7 ppm potassium. 
     
     
       4. The high purity metal powder of  claim 1 , wherein said powder used to form said highly pure Mo coarse powder comprises 30 to 150 ppm potassium. 
     
     
       5. The target of  claim 2 , wherein said highly pure metal Mo coarse powder further comprises 4 to 7 ppm potassium. 
     
     
       6. The target of  claim 2 , wherein said powder used to form said highly pure metal Mo coarse powder comprises 30 to 150 ppm potassium.