Method for manufacturing a composite member from a porous substrate by selectively infiltrating conductive material into the substrate to form via and wiring regions
Abstract
Disclosed is a method for manufacturing a composite member comprising a porous substrate, a via, and a wiring. The method comprises exposing a first region and a second region in the porous substrate to a exposure beam through a mask, the second region exposed by the exposure beam not more than 50% of the exposure of the first region, the exposure beam having the wavelength that an average size of voids of the porous substrate is, as expressed by a radius of gyration, {fraction (1/20 to 10 times, and forming the via and the wiring by infiltrating a conductive material into the first region and the second region respectively.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1. A method for manufacturing a composite member comprising a porous substrate, an interfacial conductive portion where a conductive material is filled piercing through the entire thickness of the porous substrate, and a non-interfacial conductive portion where a conductive material is filled but not piercing the entire thickness of the porous substrate; said method comprising:
exposing a first region and a second region in said porous substrate using an exposure beam, the amount of exposure to said second region being not more than 50% of the amount of exposure to said first region, and an average size of voids of said porous substrate being, as expressed by a radius of gyration, {fraction (1/20)} to 10 times a wavelength of said exposure beam; and
forming said interfacial conductive portion and non-interfacial conductive portion by infiltrating a conductive material into said first region and said second region respectively.
2. The method for manufacturing a composite member according to claim 1 , wherein said exposing a first region and a second region in said porous substrate using the exposure beam is performed through a mask comprising a first light-transmitting region for exposing said first region and a second light-transmitting region for exposing said second region, and an average transmittance of said second light-transmitting region being not more than 50% of an average transmittance of said first light-transmitting region.
3. The method for manufacturing a composite member according to claim 2 , wherein the average transmittance of said first light-transmitting region of said mask is in the range of 90% to 100%.
4. The method for manufacturing a composite member according to claim 2 , wherein the average transmittance of said second light-transmitting region of said mask is 8.4% or more of an average transmittance of said first light-transmitting region.
5. The method for manufacturing a composite member according to claim 2 , wherein the average transmittance of said second light-transmitting region of said mask is in the range of 15% to 35% of an average transmittance of said first light-transmitting region.
6. The method for manufacturing a composite member according to claim 2 , wherein said second light-transmitting region comprises an aggregation of fine patterns of which an average aperture ratio is not more than 50% of an average aperture ratio of said first light-transmitting region.
7. The method for manufacturing a composite member according to claim 6 , wherein the average aperture ratio of said second light-transmitting region of said mask is 35% or less.
8. The method for manufacturing a composite member according to claim 6 , wherein a size of said fine patterns of said second light-transmitting region is in the range of 0.1 μm to 10 μm.
9. The method for manufacturing a composite member according to claim 6 , wherein said fine patterns of said second light-transmitting region are circular or polygonal in configuration, and said fine patterns are arranged in a triangular lattice pattern.
10. The method for manufacturing a composite member according to claim 9 , wherein said fine patterns of said second light-transmitting region are circular in configuration, and a center-to-center distance between the neighboring circles is at least twice as large as the diameter of said circle.
11. The method for manufacturing a composite member according to claim 6 , wherein said fine patterns of said second light-transmitting region are circular or polygonal in configuration, and said fine patterns are arranged to form a square lattice.
12. The method for manufacturing a composite member according to claim 6 , wherein said fine patterns are stripe patterns having aperture ratio of not more than 50%, and the width between the neighboring stripe patterns is in the range of 0.1 μm to 10 μm.
13. A method for manufacturing a composite member comprising a porous substrate, non-interfacial conductive portions which are formed on the opposite surfaces of the porous substrate and where a conductive material is filled but not piercing the entire thickness of the porous substrate, and an interfacial conductive portion which is electrically connected with said non-interfacial conductive portions and where a conductive material is filled piercing through the entire thickness of the porous substrate; said method comprising:
disposing masks on respective of the opposite surfaces of said porous substrate, said masks each comprising a first light-transmitting region for exposing a first region of said porous substrate and a second light-transmitting region for exposing a second region on the opposite surfaces of said porous substrate, said second light-transmitting region comprising an aggregation of fine patterns, an average transmittance of said second light-transmitting region being not more than 50% of an average transmittance of said first light-transmitting region, and each of said masks aligned based on the position of said first light-transmitting region of each of said masks;
exposing said first region and said second region to an exposure beam through each of said masks, an average size of voids of said porous substrate being, as expressed by a radius of gyration, {fraction (1/20)} to 10 times a wavelength of said exposure beam; and
forming said interfacial conductive portion and non-interfacial conductive portion by infiltrating a conductive material into said first region and said second region respectively.
14. The method for manufacturing a composite member according to claim 13 , wherein an average aperture ratio of said second light-transmitting region of said masks is 35% or less.
15. The method for manufacturing a composite member according to claim 13 , wherein a size of said fine patterns of said second light-transmitting region of said masks is in the range of 0.1 μm to 10 μm.
16. The method for manufacturing a composite member according to claim 13 , wherein a size of said fine patterns of said second light-transmitting region of said masks is in the range of 0.5 μm to 5 μm.
17. The method for manufacturing a composite member according to claim 13 , wherein said fine patterns of said second light-transmitting region are circular or polygonal in configuration, and said fine patterns are arranged in a triangular lattice pattern.
18. The method for manufacturing a composite member according to claim 17 , wherein said fine patterns of said second light-transmitting region are circular in configuration, and a center-to-center distance between neighboring circles is at least twice as large as the diameter of said circles.
19. The method for manufacturing a composite member according to claim 13 , wherein said fine patterns of said second light-transmitting region are circular or polygonal in configuration, and said fine patterns are arranged in a square lattice pattern.
20. The method for manufacturing a composite member according to claim 13 , wherein said fine patterns are stripe patterns having an aperture ratio of not more than 50%, and the width between the neighboring stripe patterns is in the range of 0.1 μm to 10 μm.Join the waitlist — get patent alerts
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