Process and apparatus for backing-up or supplementing a gas supply system
Abstract
The invention is directed to a process for providing a gas having a minimum pressure and a composition that includes a major component to an end application, said process comprising the following steps: a) providing a first gas having said major component in a first concentration to said end application; b) providing means for measuring the pressure of said first gas being delivered to said end application; c) providing a second gas having a second concentration of said major component of said first gas which exceeds said first concentration; d) providing a third gas having a third concentration of said major component of said first gas which is less than said first concentration; e) providing means for mixing said second and said third gases so as to produce a fourth gas at at least said minimum pressure and which has said major component in a fourth concentration; wherein, f) when said means for measuring the pressure of said first gas to be received at said end application detects a deficiency with respect to said minimum pressure, said deficiency is offset by the addition of said fourth gas.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1. A process for providing a gas having a minimum pressure and a composition that includes a major component to an end application, said process comprising the following steps: a) providing a first gas having said major component in a first concentration to said end application; b) providing means for measuring the pressure of said first gas being delivered to said end application; c) providing a second gas having a second concentration of said major component of said first gas which exceeds said first concentration; d) providing a third gas having a third concentration of said major component of said first gas which is less than said first concentration; e) providing means for mixing said second and said third gases so as to produce a fourth gas at at least said minimum pressure and which has said major component in a fourth concentration; wherein, f) when said means for measuring the pressure of said first gas to be received at said end application detects a deficiency with respect to said minimum pressure, said deficiency is offset by the addition of said fourth gas.
2. The process according to claim 1, wherein said first gas comprises oxygen as said major component.
3. The process according to claim 1, wherein said first gas is oxygen enriched air having an oxygen concentration between 22 and 99 vol. %.
4. The process according to claim 2, wherein said oxygen is present in an amount selected between 90 and 95 vol. %.
5. The process according to claim 1, wherein said first gas is provided from a non-cryogenic supply system.
6. The process according to claim 1, wherein said first gas is oxygen product provided from a gas supply system utilizing vacuum and/or pressure swing adsorption.
7. The process according to claim 1, wherein said second gas comprises oxygen as said major component.
8. The process according to claim 7, wherein said oxygen is present in an amount selected to be greater than 95 vol. %.
9. The process according to claim 1, wherein said second gas is vaporized liquid oxygen.
10. The process according to claim 1, wherein said third gas is vaporized liquid nitrogen.
11. The process according to claim 1, wherein said third gas is vaporized liquid argon.
12. The process according to claim 1, wherein said third gas is compressed air.
13. The process according to claim 1, wherein said first concentration differs by less than 4.5 vol. % from said fourth concentration.
14. The process according to claim 1, wherein said end application has a tolerance with respect to how much said first concentration and said fourth concentration may differ from each other, and wherein said fourth concentration and said first concentration are within said tolerance.
15. The process according to claim 1, wherein said end application is glass finishing.
16. The process according to claim 1, wherein said major component is nitrogen.
17. The process according to claim 16, wherein first concentration is greater than about 95 vol. % and less than 100 vol. %.
18. The process according to claim 1, wherein said first gas is nitrogen produced from the separation of air via a membrane system.
19. A system for providing a gas having a minimum pressure and a composition that includes a major component to an end application, said system comprising: a) means for providing a first gas having said major component in a first concentration to said end application; b) means for measuring the pressure of said first gas being delivered to said end application; c) means for providing a second gas having a second concentration of said major component of said first gas which exceeds said first concentration; d) means for providing a third gas having a third concentration of said major component of said first gas which is less than said first concentration; e) means for mixing said second and said third gases so as to produce a fourth gas at at least said minimum pressure and which has said major component in a fourth concentration; wherein, f) when said means for measuring the pressure of said first gas to be received at said end application detects a deficiency with respect to said minimum pressure, said deficiency is offset by the addition of said fourth gas.
20. The system of claim 19, wherein said means for providing a first gas having said major component in a first concentration to said end application is a non-cryogenic air separation system.Join the waitlist — get patent alerts
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