US5350924AExpiredUtility

Ion-optical imaging system

Assignee: IMS IONEN MIKROFAB SYSTPriority: Jul 10, 1991Filed: Jul 10, 1992Granted: Sep 27, 1994
Est. expiryJul 10, 2011(expired)· nominal 20-yr term from priority
H01J 37/3007
69
PatentIndex Score
21
Cited by
18
References
12
Claims

Abstract

A system for ion-beam imaging of a structure of a mask on a wafer has a two-lens set between the mask and the wafer which is one of the following combinations: (a) two accelerating Einzel lenses; (b) an accelerating immersion lens and a decelerating immersion lens wherein the accelerating immersion lens is the first collecting lens following the mask; (c) an accelerating immersion lens and a decelerating asymmetric Einzel lens wherein the accelerating immersion lens is the first collecting lens following the mask; (d) an accelerating asymmetric Einzel lens and a decelerating immersion lens wherein the accelerating asymmetric Einzel lens is the first collecting lens following the mask; and (e) an accelerating asymmetric Einzel lens and a decelerating asymmetric Einzel lens wherein the accelerating asymmetric Einzel lens is the first collecting lens following the mask.

Claims

exact text as granted — not AI-modified
We claim: 
     
       1. An ion-optical imaging system, comprising: a mask having a structure to be imaged upon a wafer and including at least one opening;   means for supporting the wafer upon which said structure is to be imaged at a distance from said mask along an optical axis; and   a lens system disposed between said mask and said wafer and essentially consisting of a set of two collecting lenses including a first collecting lens following said mask along said axis in a direction of ion beam travel toward said wafer, and a second collecting lens spaced from the first collecting lens along said axis in said direction,   said mask being disposed approximately in an object-side focal plane of the first collecting lens,   the wafer being positioned in a vicinity of an image-side focal plane of the second collecting lens following the mask, and   the set is constituted of one of the following lens-type sets: (a) two accelerating Einzel lenses;   (b) an accelerating immersion lens and a decelerating immersion lens wherein the accelerating immersion lens is the first collecting lens following the mask;   (c) an accelerating immersion lens and a decelerating asymmetric Einzel lens wherein the accelerating immersion lens is the first collecting lens following the mask;     (d) an accelerating asymmetric Einzel lens and a decelerating immersion lens wherein the accelerating asymmetric Einzel lens is the first collecting lens following the mask; and   (e) an accelerating asymmetric Einzel lens and a decelerating asymmetric Einzel lens wherein the accelerating asymmetric Einzel lens is the first collecting lens following the mask.   
     
     
       2. The ion-optical imaging system defined in claim 1 wherein a crossover of the first collecting lens following the mask lies in an object-side focal plane of the second collecting lens following the mask. 
     
     
       3. The ion-optical imaging system defined in claim 2, further comprising: an ion source disposed along said axis ahead of said mask for generating an ion beam;   a mass separator formed as an ExB filter between said ion source and said mask along said axis;   a condensing lens ahead of said mass separator along said axis and preferably being an Einzel lens; and   an illumination lens following said mass separator along said axis and being a lens selected from the group which consists of:   an immersion lens,   an accelerating Einzel lens,   a decelerating Einzel lens, and   at least one solenoid.   
     
     
       4. The ion-optical imaging system defined in claim 3 wherein said set is constituted of two accelerating Einzel lenses. 
     
     
       5. The ion-optical imaging system defined in claim 3 wherein said set is constituted of an accelerating immersion lens and a decelerating immersion lens wherein the accelerating immersion lens is the first collecting lens following the mask. 
     
     
       6. The ion-optical imaging system defined in claim 3 wherein said set is constituted of an accelerating immersion lens and a decelerating asymmetric Einzel lens wherein the accelerating immersion lens is the first collecting lens following the mask. 
     
     
       7. The ion-optical imaging system defined in claim 3 wherein said set is constituted of an accelerating asymmetric Einzel lens and a decelerating immersion lens wherein the accelerating asymmetric Einzel lens is the first collecting lens following the mask. 
     
     
       8. The ion-optical imaging system defined in claim 3 wherein said set is constituted of an accelerating asymmetric Einzel lens and a decelerating asymmetric Einzel lens wherein the accelerating asymmetric Einzel lens is the first collecting lens following the mask. 
     
     
       9. The ion-optical imaging system defined in claim 3 wherein said illumination lens is an immersion lens. 
     
     
       10. An ion-optical imaging system, comprising: a mask having a structure to be imaged upon a wafer and including at least one opening;   means for supporting the wafer upon which said structure is to be imaged at a distance from said mask along an optical axis;   a lens system disposed between said mask and said wafer and essentially consisting of a set of two collecting lenses including a first collecting lens following said mask along said axis in a direction of ion beam travel toward said wafer, and a second collecting lens spaced from the first collecting lens along said axis in said direction,   said mask being disposed approximately in an object-side focal plane of the first collecting lens,   the wafer being positioned in a vicinity of an image-side focal plane of the second collecting lens following the mask, and   the set is constituted of one of the following lens-type sets:   (a) two accelerating Einzel lenses;   (b) an accelerating immersion lens and a decelerating immersion lens wherein the accelerating immersion lens is the first collecting lens following the mask;   (c) an accelerating immersion lens and a decelerating asymmetric Einzel lens wherein the accelerating immersion lens is the first collecting lens following the mask;   (d) an accelerating asymmetric Einzel lens and a decelerating immersion lens wherein the accelerating asymmetric Einzel lens is the first collecting lens following the mask; and   (e) an accelerating asymmetric Einzel lens and a decelerating asymmetric Einzel lens wherein the accelerating asymmetric Einzel lens is the first collecting lens following the mask, a crossover of the first collecting lens following the mask lying in an object-side focal plane of the second collecting lens following the mask;   an ion source disposed along said axis ahead of said mask for generating an ion beam;   a mass separator formed as an ExB filter between said ion source and said mask along said axis;   a condensing lens ahead of said mass separator along said axis and preferably being an Einzel lens; and   an illumination lens following said mass separator along said axis and being an accelerating Einzel lens.   
     
     
       11. An ion-optical imaging system, comprising: a mask having a structure to be imaged upon a wafer and including at least one opening;   means for supporting the wafer upon which said structure is to be imaged at a distance from said mask along an optical axis;   a lens system disposed between said mask and said wafer and essentially consisting of a set of two collecting lenses including a first collecting lens following said mask along said axis in a direction of ion beam travel toward said wafer, and a second collecting lens spaced from the first collecting lens along said axis in said direction,   said mask being disposed approximately in an object-side focal plane of the first collecting lens   the wafer being positioned in a vicinity of an image-side focal plane of the second collecting lens following the mask, and   the set is constituted of one of the following lens-type sets:   (a) two accelerating Einzel lenses;   (b) an accelerating immersion lens and a decelerating immersion lens wherein the accelerating immersion lens is the first collecting lens following the mask;   (c) an accelerating immersion lens and a decelerating asymmetric Einzel lens wherein the accelerating immersion lens is the first collecting lens following the mask;   (d) an accelerating asymmetric Einzel lens and a decelerating immersion lens wherein the accelerating asymmetric Einzel lens is the first collecting lens following the mask; and   (e) an accelerating asymmetric Einzel lens and a decelerating asymmetric Einzel lens wherein the accelerating asymmetric Einzel lens is the first collecting lens following the mask, a crossover of the first collecting lens following the mask lying in an object-side focal plane of the second collecting lens following the mask;   an ion source disposed along said axis ahead of said mask for generating an ion beam;   a mass separator formed as an ExB filter between said ion source and said mask along said axis;   a condensing lens ahead of said mass separator along said axis and preferably being an Einzel lens; and   an illumination lens following said mass separator along said axis and being a decelerating Einzel lens.   
     
     
       12. An ion-optical imaging system, comprising: a mask having a structure to be imaged upon a wafer and including at least one opening;   means for supporting the wafer upon which said structure is to be imaged at a distance from said mask along an optical axis;   a lens system disposed between said mask and said wafer and essentially consisting of a set of two collecting lenses including a first collecting lens following said mask along said axis in a direction of ion beam travel toward said wafer, and a second collecting lens spaced from the first collecting lens along said axis in said direction,   said mask being disposed approximately in an object-side focal plane of the first collecting lens,   the wafer being positioned in a vicinity of an image-side focal plane of the second collecting lens following the mask, and   the set is constituted of one of the following lens-type sets:   (a) two accelerating Einzel lenses;   (b) an accelerating immersion lens and a decelerating immersion lens wherein the accelerating immersion lens is the first collecting lens following the mask;   (c) an accelerating immersion lens and a decelerating asymmetric Einzel lens wherein the accelerating immersion lens is the first collecting lens following the mask;   (d) an accelerating asymmetric Einzel lens and a decelerating immersion lens wherein the accelerating asymmetric Einzel lens is the first collecting lens following the mask; and   (e) an accelerating asymmetric Einzel lens and a decelerating asymmetric Einzel lens wherein the accelerating asymmetric Einzel lens is the first collecting lens following the mask, a crossover of the first collecting lens following the mask lying in an object-side focal plane of the second collecting lens following the mask;   an ion source disposed along said axis ahead of said mask for generating an ion beam;   a mass separator formed as an ExB filter between said ion source and said mask along said axis;   a condensing lens ahead of said mass separator along said axis and preferably being an Einzel lens; and   an illumination lens following said mass separator along said axis and being at least one solenoid.

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