US5061216AExpiredUtility

Ionization chamber dosimeter

Assignee: US ENERGYPriority: Apr 16, 1990Filed: Apr 16, 1990Granted: Oct 29, 1991
Est. expiryApr 16, 2010(expired)· nominal 20-yr term from priority
H01J 47/001
13
PatentIndex Score
0
Cited by
7
References
3
Claims

Abstract

A method for fabricating an ion chamber dosimeter collecting array of the type utilizing plural discrete elements formed on a uniform collecting surface which includes forming a thin insulating layer over an aperture in a frame having surfaces, forming a predetermined pattern of through holes in the layer, plating both surfaces of the layer and simultaneously tilting and rotating the frame for uniform plate-through of the holes between surfaces. Aligned masking and patterned etching of the surfaces provides interconnects between the through holes and copper leads provided to external circuitry.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
       1. A method for fabricating an ionization chamber dosimeter collecting array for the purpose of measuring radiation dose delivered to a patient which comprises: providing at least one frame having top and bottom surfaces with an aperture formed therein surrounded by an edge portion,   forming plural edge connectors having multiple lead contacts on opposite edges of said frame,   forming a thin insulating layer over the aperture of said frame, said insulating layer having a collection surface and a trace surface,   providing a predetermined pattern of through holes in said insulating layer,   plating both said collection surface and trace surface of said insulating layer, simultaneously tilting and rotating said frame, so as to form layers of gold on said respective collection and trace surfaces and to uniformly plate said through holes extending from said collection surface to said trace surface,   selectively masking and pattern etching said plated collection surface of said insulating layer to form a multiplicity of electrically conductive discrete elements thereon having provided therein said uniformly plated through holes, and   selectively masking and pattern etching said plated trace surface of said insulating layer to form a trace pattern defining contiguous interconnecting paths between each of said discrete elements and said plural edge connectors.   
     
     
       2. The method of claim 1, further including providing two such ionization chamber dosimeter arrays with facing collection surfaces and providing a high voltage foil between each of said arrays. 
     
     
       3. The method of claim 1, wherein said frame comprises an epoxy circuit board.

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