US4339527AExpiredUtility

Process for using photopolymerizable compositions

Assignee: DU PONTPriority: Jan 31, 1979Filed: Jul 31, 1980Granted: Jul 13, 1982
Est. expiryJan 31, 1999(expired)· nominal 20-yr term from priority
Inventors:Martin Hill
G03F 7/027
53
PatentIndex Score
13
Cited by
8
References
5
Claims

Abstract

Process for using photopolymerizable compositions involving monomers of ethylenically unsaturated esters of difunctional acids and polymethylene glycols terminated with acrylate and methacrylate groups.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
       1. A method comprising: (1) applying to a surface the surface of a solid, unexposed photopolymerizable layer of a composition consisting essentially of: (a) a photoinitiator;   (b) a macromolecular linear organic film-forming polymeric binder; and   (c) a photopolymerizable monomer, with the following present: (i) 0.001 to 20 parts by weight, based on the weight of monomer, of nonperoxide photoinitiator, which is activatable by actinic radiation and thermally inactive at and below 85° C.;   (ii) 10 to 95 parts by weight, based on the total weight of the photopolymerizable composition, of binder; and   (iii) 5 to 90 parts by weight, based on the total weight of the photopolymerizable composition of an ethylenically unsaturated addition-polymerizable compound having a molecular weight of at least 150 and a boiling point of above 100° C. and having the formula: ##STR2##  or (CH 2 ) n-2  ; and m and n are independently from 2 to 10; while the other surface of the layer has adhered thereto with low to moderate adherence a thin, flexible sheet support, then in either order;       (2) exposing the layer, imagewise, to actinic radiation to form a polymeric image in the layer;   (3) removing the sheet support from the resulting image-bearing layer; and   (4) removing the unexposed areas of the layer to form a resist image of polymeric materials; and   (5) permanently modifying the adjacent areas on said surface which are unprotected by the resist image by using a reagent capable of etching said areas or depositing a material on said areas.   
     
     
       2. The process of claim 1 wherein said composition the ethylenically unsaturated addition polymerizable compound is selected from bis(2-methacryloxyethyl) adipate, bis-(3-methacryloxypropyl) adipate, bis(4-metharyloxybutyl) adipate, bis(6-methacryloxyhexyl) adipate, bis(10-methacryloxydecyl) adipate, bis(6-methacryloxyhexyl) malonate, bis(6-methacryloxyhexyl) phthalate, bis(2-methacryloxyethyl) phthalate, bis(2-methacryloxyethyl) isophthalate, bis(2-methacryloxyethyl) terephthalate, bis(10-methacryloxydecyl) sebacate, bis(6-acryloxyhexyl) adipate, and bis(2-acryloxyethyl) adipate. 
     
     
       3. The process of claim 1 wherein said polymeric binder is an acrylic polymer. 
     
     
       4. The process of claim 3 wherein said acrylic polymer is polymethyl methacrylate. 
     
     
       5. The process of claim 1 wherein in said composition any of the photoinitiator compound, the polymeric binder, and the ethylenically unsaturated addition polymerizable compound is present as a mixture of several such materials.

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