Support apparatus and substrate polishing apparatus including the same

Abstract

A support apparatus including a support portion configured to support a polishing portion for polishing a substrate; a fastening portion configured to fasten the polishing portion and the support portion; and a tilt adjustment portion configured to adjust a tilt of the polishing portion, the fastening portion including a fastening body attached to a side surface of the polishing portion; protrusions protruding outwardly from the fastening body, and the protrusions defining internal spaces therein; the support portion surrounding the side surface of the polishing portion, and defining insertion holes on the inner surface of the support portion, configured to respectively receive the protrusions ; the tilt adjustment portion including tilt adjustment shafts penetrating the support portion to pass through respective ones of the internal spaces and respective ones of the insertion holes.

What is claimed is: 
     
         1 . A support apparatus comprising:
 a support portion configured to support a polishing portion for polishing a substrate;   a fastening portion configured to fasten the polishing portion and the support portion; and   a tilt adjustment portion configured to adjust a tilt of the polishing portion,   the fastening portion including
 a fastening body attached to a side surface of the polishing portion; 
 protrusions protruding outwardly from the fastening body along a circumferential direction of the side surface of the polishing portion, and the protrusions defining internal spaces therein; 
   the support portion surrounding the side surface of the polishing portion, and defining insertion holes on an inner surface of the support portion, the insertion holes configured to receive respective ones of the protrusions;   the tilt adjustment portion including
 tilt adjustment shafts penetrating the support portion to pass through respective ones of the internal spaces and respective ones of the insertion holes, and the tilt adjustment shafts including catch fringes extended outwardly from parts of the tilt adjustment shafts corresponding to the internal spaces respectively and caught on ceiling walls and floor walls of the protrusions; and 
 fixing portions configured to fix each of the tilt adjustment shafts to a position set with respect to the support portion, 
   the tilt adjustment shafts and the support portion screw-connected to each other.   
     
     
         2 . The support apparatus of  claim 1 , wherein
 respective ends of each of the tilt adjustment shafts are exposed to an outside of the support portion,   each of the fixing portions is screw-connected to each of the respective ends.   
     
     
         3 . The support apparatus of  claim 2 , wherein at least some of the fixing portions include:
 a first nut screw-connected to a respective one of the tilt adjustment shafts;   a second nut screw-connected to an outer part of the respective tilt adjustment shaft compared to the first nut; and   an elastic connection portion connected to a part of the respective tilt adjustment shaft between the first nut and the second nut and having elasticity.   
     
     
         4 . The support apparatus of  claim 2 , wherein
 at least some of the fixing portions include:
 an inner body screw-connected to the tilt adjustment shaft; 
 an outer body surrounding an outer surface of the inner body; 
 a locking pin having an end connected to the inner body configured to be rotatable around the end between an outer position where the other end thereof protrudes from the outer surface of the inner body and an inner position where the other end does not protrude from the outer surface of the inner body; and 
 an elastic portion configured to apply elastic force to the locking pin in a direction in which the other end of the locking pin is positioned at the outer position, 
   an inner surface of the outer body includes a plurality of teeth along an inner circumferential direction of,   each of the teeth includes:
 a side inclined surface having a tilt at which the other end of the locking pin positioned at the outer position is configured to be caught by the side inclined surface based on a rotational force being applied to the outer body in a direction in which the inner body moves toward the support portion along the tilt adjustment shaft; and 
 an other-side inclined surface having a tilt at which the other end of the locking pin positioned at the outer position is configured to be guided to the inner position by the other-side inclined surface based on a rotational force being applied to the outer body in a direction in which the inner body moves away from the support portion along the tilt adjustment shaft. 
   
     
     
         5 . The support apparatus of  claim 1 , wherein at least some of the tilt adjustment portions further include an upper reinforcement plate between the ceiling wall of the internal space and the catch fringe, and penetrated by the tilt adjustment shaft, and wider outwardly than the catch fringe. 
     
     
         6 . The support apparatus of  claim 1 , wherein at least some of the tilt adjustment portions further include a lower reinforcement plate between the floor wall of the internal space and the catch fringe, and penetrated by the tilt adjustment shaft, and wider outwardly than the catch fringe. 
     
     
         7 . The support apparatus of  claim 1 , further comprising a plurality of the fastening portions in a vertical direction. 
     
     
         8 . The support apparatus of  claim 1 , wherein
 the fastening portion includes:
 an upper fastening portion configured to be fastened to an upper part of a housing of the polishing portion; and 
 a lower fastening portion configured to be fastened to the lower part of the housing, 
   the protrusions of the upper fastening portion and the protrusions of the lower fastening portion are at same positions as each other when viewed from above.   
     
     
         9 . A substrate polishing apparatus comprising:
 a polishing portion configured to polish a substrate; and   a support apparatus configured to support the polishing portion and adjust a tilt of the polishing portion,   the polishing portion includes:
 a rotation shaft configured to be rotatable about a vertical direction as an axial direction; 
 a housing defining a space inside to accommodate an upper part of the rotation shaft; and 
 a polishing head having an upper surface connected to a lower end of the rotation shaft, 
   the support apparatus includes:
 a support portion configured to support the polishing portion; 
 a fastening portion configured to fasten the polishing portion and the support portion; and 
 a tilt adjustment portion configured to adjust the tilt of the polishing portion, 
   the fastening portion includes:
 a fastening body attached to a side surface of the housing; 
 protrusions protruding outwardly from the fastening body along a circumferential direction of the side surface of the housing, and the protrusions defining internal spaces therein; 
   the support portion surrounding the side surface of the housing, and defining insertion holes on an inner surface of the support portion, the insertion holes configured to receive respective ones of the protrusions;   the tilt adjustment portion including:
 tilt adjustment shafts penetrating the support portion to pass through respective ones of the internal spaces and respective ones of the insertion holes, and the tilt adjustment shafts including catch fringes extended outwardly from parts of the tilt adjustment shafts corresponding to the internal spaces respectively and caught on ceiling walls and floor walls of the protrusions; and 
 fixing portions configured to fix each of the tilt adjustment shafts to a position set with respect to the support portion, 
   the tilt adjustment shafts and the support portion screw-connected to each other.   
     
     
         10 . The substrate polishing apparatus of  claim 9 , wherein
 respective ends of each of the tilt adjustment shafts are exposed to an outside of the support portion,   each of the fixing portions is screw-connected to each of the respective ends.   
     
     
         11 . The substrate polishing apparatus of  claim 10 , wherein at least some of the fixing portions include:
 a first nut screw-connected to a respective one of the tilt adjustment shafts;   a second nut screw-connected to an outer part of the respective tilt adjustment shaft compared to the first nut; and   an elastic connection portion connected to a part of the respective tilt adjustment shaft between the first nut and the second nut and having elasticity.   
     
     
         12 . The substrate polishing apparatus of  claim 10 , wherein
 at least some of the fixing portions include:
 an inner body screw-connected to the a respective one of tilt adjustment shafts; 
 an outer body surrounding an outer surface of the inner body; 
   a locking pin having an end connected to the inner body configured to be rotatable around the end between an outer position where another end of the locking pin protrudes from the outer surface of the inner body and an inner position where the other end does not protrude from the outer surface of the inner body; and
 an elastic portion configured to apply elastic force to the locking pin in a direction in which the other end of the locking pin is positioned at the outer position, 
   an inner surface of the outer body including a plurality of teeth along an inner circumferential direction of the inner surface of the outer body,   each of the teeth includes:
 a side inclined surface configured to have a tilt at which the other end of the locking pin positioned at the outer position is configured to be caught by the side inclined surface based on a rotational force being applied to the outer body in a direction in which the inner body moves toward the support portion along the respective tilt adjustment shaft; and 
 an other-side inclined surface having a tilt at which the other end of the locking pin positioned at the outer position is configured to be guided to the inner position by the other-side inclined surface based on a rotational force being applied to the outer body in a direction in which the inner body moves away from the support portion along the tilt adjustment shaft. 
   
     
     
         13 . The substrate polishing apparatus of  claim 9 , wherein at least some of the tilt adjustment portions further include an upper reinforcement plate between the ceiling wall of the internal space and the catch fringe, and penetrated by the tilt adjustment shaft, and wider outwardly than the catch fringe. 
     
     
         14 . The substrate polishing apparatus of  claim 9 , wherein at least some of the tilt adjustment portions further include a lower reinforcement plate between the floor wall of the internal space and the catch fringe, and penetrated by the tilt adjustment shaft, and wider outwardly than the catch fringe. 
     
     
         15 . A substrate polishing apparatus comprising:
 a polishing portion configured to polish a substrate; and   a support apparatus configured to support the polishing portion and adjust a tilt of the polishing portion,   the polishing portion including
 a rotation shaft configured to rotate about a vertical direction as an axial direction; 
 a housing defining a space inside to accommodate an upper part of the rotation shaft; and 
 a polishing head having an upper surface connected to a lower end of the rotation shaft, 
   the support apparatus including
 a support portion configured to support the polishing portion; 
 a fastening portion configured to fasten the polishing portion and the support portion; and 
 a tilt adjustment portion configured to adjust the tilt of the polishing portion, 
   the fastening portion including
 a fastening body attached to a side surface of the housing; 
 protrusions protruding outwardly from the fastening body along a circumferential direction of the side surface of the housing, and the protrusions defining internal spaces therein; 
   the support portion surrounding the side surface of the housing, and defining insertion holes on an inner surface of the support portion, the insertion holes configured to receive respective ones of the protrusions;   the tilt adjustment portion including
 tilt adjustment shafts penetrating the support portion to pass through respective ones of the internal spaces and respective ones of the insertion holes, and the tilt adjustment shafts including catch fringes extended outwardly from parts of the tilt adjustment shafts corresponding to the internal spaces respectively and caught on ceiling walls and floor walls of the protrusions; and 
 fixing portions configured to fix each of the tilt adjustment shafts to a position set with respect to the support portion, 
   the tilt adjustment shafts and the support portion screw-connected to each other,   the fastening portion including
 an upper fastening portion configured to be fastened to an upper part of the housing; and 
 a lower fastening portion configured to be fastened to the lower part of the housing. 
   
     
     
         16 . The substrate polishing apparatus of  claim 15 , wherein the protrusions of the upper fastening portion and the protrusions of the lower fastening portion are at same positions as each other when viewed from above. 
     
     
         17 . The substrate polishing apparatus of  claim 15 , wherein
 respective ends of each of the tilt adjustment shafts are exposed to an outside of the support portion,   each of the fixing portions is screw-connected to each of the respective ends.   
     
     
         18 . The substrate polishing apparatus of  claim 17 , wherein at least some of the fixing portions include:
 a first nut screw-connected to a respective one the tilt adjustment shaft;   a second nut screw-connected to an outer part of the respective tilt adjustment shaft compared to the first nut; and   an elastic connection portion connected to a part of the respective tilt adjustment shaft between the first nut and the second nut and having elasticity.   
     
     
         19 . The substrate polishing apparatus of  claim 17 , wherein
 at least some of the fixing portions include:
 an inner body screw-connected to the tilt adjustment shaft; 
 an outer body surrounding an outer surface of the inner body; 
 a locking pin having an end connected to the inner body configured to be rotatable around the end between an outer position where the other end thereof protrudes from the outer surface of the inner body and an inner position where the other end does not protrude from the outer surface of the inner body; and 
 an elastic portion configured to apply elastic force to the locking pin in a direction in which the other end of the locking pin is at the outer position, 
   an inner surface of the outer body including a plurality of teeth along an inner circumferential direction of the inner surface of the outer body,   each of the teeth includes:
 a side inclined surface having a tilt at which the other end of the locking pin positioned at the outer position is configured to be caught by the side inclined surface based on a rotational force being applied to the outer body in a direction in which the inner body moves toward the support portion along the tilt adjustment shaft; and 
 an other-side inclined surface having a tilt at which the other end of the locking pin positioned at the outer position is configured to be guided to the inner position by the other-side inclined surface based on a rotational force being applied to the outer body in a direction in which the inner body moves away from the support portion along the tilt adjustment shaft. 
   
     
     
         20 . The substrate polishing apparatus of  claim 15 , wherein at least some of the tilt adjustment portions further include an upper reinforcement plate between the ceiling wall of the internal space and the catch fringe, and penetrated by the tilt adjustment shaft, and wider outwardly than the catch fringe.