Fluid resistant coatings for substrates

Abstract

Articles that are oleophobic and/or hydrophobic, as well as associated methods, are generally provided. In some embodiments, articles described herein do not comprise fluorinated polymers. Articles described herein may comprise nanostructures that contribute to their hydrophobicity and/or their oleophobicity. Articles described herein may have high wash resistance.

1 . An article, comprising:
 a substrate comprising a surface, wherein the substrate comprises a textile;   a plurality of nanostructures comprising a polymer on the surface of the substrate; and   a layer comprising a polymerized silane and/or a polymerized siloxane, wherein the layer covers at least a portion of the surface and at least a portion of the plurality of nanostructures, and   wherein a surface of the article is hydrophobic and/or oleophobic.   
     
     
         2 . The article of  claim 1 , wherein the layer comprising the polymerized silane and/or the polymerized siloxane has an elastic modulus of greater than or equal to 1 GPa and less than or equal to 5 GPa. 
     
     
         3 - 9 . (canceled) 
     
     
         10 . A method of forming an article, comprising:
 forming a first layer comprising a polymer on a surface of a substrate by exposing the surface of the substrate to a first plasma comprising a monomer;   etching the first layer by exposing the first layer to a second plasma to form an etched first layer; and   forming a second layer comprising a polymerized silane and/or a polymerized siloxane on the etched first layer.   
     
     
         11 . The method of  claim 10 , wherein the first layer has an elastic modulus of greater than or equal to 4 GPa and less than or equal to 12 GPa. 
     
     
         12 . The method of  claim 10 , wherein the second layer has an elastic modulus of greater than or equal to 0.5 GPa and less than or equal to 2 GPa. 
     
     
         13 . A method of forming an article, comprising:
 forming a layer comprising a polymer on a surface of a textile by exposing the surface of the textile to a first plasma comprising ethylene, butadiene, acetylene, methane, methanol, ethanol, or a combination thereof; and   etching the layer using a second plasma comprising oxygen, argon, helium, neon, krypton, xenon, or a combination thereof.   
     
     
         14 . (canceled) 
     
     
         15 . The method of  claim 10 , wherein the first plasma has a pressure of greater than or equal to 20 Pa and less than or equal to 80 Pa and/or the second plasma has a pressure of greater than or equal to 40 Pa and less than or equal to 80 Pa. 
     
     
         16 . The method of  claim 10 , wherein the first plasma is supplied a power of greater than or equal to 500 W and less than or equal to 1000 W. 
     
     
         17 - 18 . (canceled) 
     
     
         19 . The method of  claim 13 , forming a second layer comprising a polymerized silane and/or a polymerized siloxane on the etched first layer. 
     
     
         20 . The method of  claim 19 , wherein the second layer is formed by exposing the substrate to a third plasma comprising a silane and/or a siloxane on the etched first layer. 
     
     
         21 - 42 . (canceled) 
     
     
         43 . The article of  claim 1 , wherein the plurality of nanostructures are discrete nanostructures. 
     
     
         44 . The article of  claim 1 , wherein at least a portion of the plurality of nanostructures are isolated nanostructures that are not in contact with other nanostructures. 
     
     
         45 . The article of  claim 1 , wherein the article has a surface with an average RMS roughness of greater than or equal to 0.01 microns and less than or equal to 0.13 microns. 
     
     
         46 . (canceled) 
     
     
         47 . The article of  claim 1 , wherein the plurality of nanostructures has an average diameter of greater than or equal to 0.12 microns and less than or equal to 0.38 microns. 
     
     
         48 . (canceled) 
     
     
         49 . The article of  claim 1 , wherein an average peak-to-peak spacing between the plurality of nanostructures is greater than or equal to 0.22 microns and less than or equal to 2.1 microns. 
     
     
         50 . (canceled) 
     
     
         51 . The article of  claim 1 , wherein the substrate/textile has an elastic modulus of greater than or equal to 20 kPa and less than or equal to 80 kPa. 
     
     
         52 . The article of  claim 1 , wherein the hydrophobicity rank of the article is greater than or equal to 4 and less than or equal to 8 when measured using AATCC TM 193-2017. 
     
     
         53 . The article of  claim 1 , wherein the oleophobicity rank of the article is greater than or equal to 2 and less than or equal to 6 when measured using AATCC TM 118-2017. 
     
     
         54 . The article of  claim 1 , wherein the hydrophobicity rank of the article is greater than or equal to 2 and less than or equal to 8 when measured using AATCC TM 193-2017 after performing greater than or equal to 10 wash cycles and less than or equal to 15 wash cycles performed according to ISO W6330:2012(E). 
     
     
         55 . The article of  claim 1 , wherein the oleophobicity rank of the article is greater than or equal to 1 and less than or equal to 6 when measured using AATCC TM 118-2017 after performing greater than or equal to 10 wash cycles and less than or equal to 15 wash cycles performed according to ISO W6330:2012(E).