Method of replicating a microstructure pattern

Abstract

A method includes providing a first multilayer structure including a substrate, a thin film, and a first photoresist layer; providing a second multilayer structure including a mold having a microstructure pattern, and a second photoresist layer; combining the first multilayer structure and the second multilayer structure so that the first photoresist layer is in contact with the second photoresist layer; and applying pressure and temperature. An article including a microstructure pattern is also disclosed.

1 .- 20 . (canceled) 
     
     
         21 . An article, comprising:
 a substrate; and   a thin film including a replicated microstructure pattern on the substrate.   
     
     
         22 . The article of  claim 21 , wherein the substrate is transparent. 
     
     
         23 . The article of  claim 22 , wherein the substrate comprises glass. 
     
     
         24 . The article of  claim 22 , wherein the substrate comprises a polymer. 
     
     
         25 . The article of  claim 24 , wherein the polymer is chosen from polycarbonate, polymethylmethacrylate, polyethylene terephthalate, polyethylene, amorphous copolyester, polyvinyl chloride; silicone rubber, cyclic olefin copolymers, ionomer resin, transparent polypropylene, fluorinated ethylene propylene, styrene methyl methacrylate, styrene acrylonitrile resin, polystyrene, and methyl methacrylate acrylonitrile butadiene styrene. 
     
     
         26 . The article of  claim 21 , wherein the substrate has a thickness selected from a range of about 50 microns to about 2000 microns. 
     
     
         27 . The article of  claim 21 , wherein the thin film is a single layer. 
     
     
         28 . The article of  claim 21 , wherein the thin film comprises a material having a refractive index of from about 2 to about 4. 
     
     
         29 . The article of  claim 21 , wherein the thin film comprises a gradient or continuous variation in the refractive index. 
     
     
         30 . The article of  claim 21 , wherein the thin film comprises a periodic refractive index profile. 
     
     
         31 . The article of  claim 21 , wherein the thin film has a thickness selected from a range of about 1 micron to about 20 microns. 
     
     
         32 . The article of  claim 21 , wherein the thin film is a multilayer stack. 
     
     
         33 . The article of  claim 21 , wherein the multilayer stack includes one or more layers chosen from a reflector material, a magnetic material, a dielectric material, and an absorbing material. 
     
     
         34 . The article of  claim 21 , wherein the microstructure pattern is a random pattern. 
     
     
         35 . The article of  claim 21 , wherein the microstructure pattern is a periodic pattern. 
     
     
         36 . The article of  claim 21 , wherein the microstructure pattern is a binary pattern. 
     
     
         37 . The article of  claim 21 , wherein the microstructure pattern is a gray-scale non-binary pattern. 
     
     
         38 . The article of  claim 21 , wherein the article is an optical device.