Deposition mask

Abstract

A deposition mask includes a cell area, a cell peripheral area surrounding the cell area, and a grid area positioned between the cell area and the cell peripheral area in a plan view, the deposition mask. The deposition mask includes a mask membrane disposed in the cell area, including a mask shadow and defining a pixel opening therein; a mask frame disposed in the cell peripheral area and the gird area; and a plurality of ruler patterns disposed in the grid area, where the plurality of ruler patterns are adjacent to each other in a direction parallel to a major surface of the mask frame and spaced apart at equal intervals.

What is claimed is: 
     
         1 . A deposition mask including a cell area, a cell peripheral area surrounding the cell area, and a grid area positioned between the cell area and the cell peripheral area in a plan view, the deposition mask comprising:
 a mask membrane disposed in the cell area, including a mask shadow, and defining a pixel opening therein;   a mask frame disposed in the cell peripheral area and the grid area; and   a plurality of ruler patterns disposed in the grid area,   wherein the plurality of ruler patterns are adjacent to each other in a direction parallel to a major surface of the mask frame and spaced apart at equal intervals.   
     
     
         2 . The deposition mask of  claim 1 , wherein the mask frame includes a mask substrate disposed in the cell peripheral area and an upper inorganic layer positioned on the mask substrate, and
 the upper inorganic layer includes a protrusion that protrudes further toward the cell area than a side surface of the mask substrate positioned toward the cell area.   
     
     
         3 . The deposition mask of  claim 2 , wherein the protrusion of the upper inorganic layer is disposed in the grid area. 
     
     
         4 . The deposition mask of  claim 2 , wherein the plurality of ruler patterns is positioned on the upper inorganic layer, and
 the plurality of ruler patterns overlaps the protrusion of the upper inorganic layer in a direction perpendicular to the major surface of the mask frame.   
     
     
         5 . The deposition mask of  claim 4 , wherein the plurality of ruler patterns includes an inorganic insulating material. 
     
     
         6 . The deposition mask of  claim 5 , wherein a height of each of the ruler patterns in the direction perpendicular to the major surface of the mask frame is equal to or more than 0.2 micrometer and equal to or less than 3.0 micrometer. 
     
     
         7 . The deposition mask of  claim 4 , wherein the plurality of ruler patterns includes metal. 
     
     
         8 . The deposition mask of  claim 7 , wherein a height of each of the ruler patterns in the direction perpendicular to the major surface of the mask frame is equal to or more than 50 nanometers and equal to or less than 500 nanometers. 
     
     
         9 . The deposition mask of  claim 1 , wherein a gap between the plurality of ruler patterns adjacent to each other in the direction parallel to the major surface of the mask frame is equal to or more than 10 nanometers and equal to or less than 1000 nanometers. 
     
     
         10 . The deposition mask of  claim 1 , wherein in a cross-sectional view, each of the ruler patterns has a cylindrical shape. 
     
     
         11 . The deposition mask of  claim 1 , wherein in a cross-sectional view, each of the ruler patterns has a trapezoidal shape. 
     
     
         12 . The deposition mask of  claim 1 , wherein in a cross-sectional view, each of the ruler patterns has an inverted tapered shape. 
     
     
         13 . The deposition mask of  claim 2 , wherein each of the ruler patterns includes a lower surface facing the upper inorganic layer, an upper surface opposite to the lower surface, and a side surface connecting the upper surface and the lower surface, and
 the side surface of each of the ruler patterns includes a first side surface connected to the upper surface and a second side surface connected to the lower surface.   
     
     
         14 . The deposition mask of  claim 13 , wherein an inclination angle formed by the first side surface and the second side surface is an obtuse angle. 
     
     
         15 . The deposition mask of  claim 1 , wherein at least one of the ruler patterns is located to point a predetermined position of the pixel opening. 
     
     
         16 . A deposition mask including a cell area, a cell peripheral area surrounding the cell area, and a grid area positioned between the cell area and the cell peripheral area in a plan view, the deposition mask comprising:
 a mask membrane disposed in the cell area, defining a pixel opening therein, and including a mask shadow surrounding the pixel opening;   a mask frame disposed in the cell peripheral area and the grid area and defining a mask opening therein; and   a plurality of ruler patterns disposed in the grid area,   wherein in the plan view, the plurality of ruler patterns are positioned adjacent to each other and spaced at equal intervals.   
     
     
         17 . The deposition mask of  claim 16 , wherein in the plan view, a gap between the plurality of ruler patterns adjacent to each other is equal to or more than 10 nanometers and equal to or less than 1000 nanometers. 
     
     
         18 . The deposition mask of  claim 17 , wherein in the plan view, the mask opening overlaps the cell area, and
 in the plan view, the plurality of ruler patterns are positioned to surround the mask opening.   
     
     
         19 . The deposition mask of  claim 18 , wherein in the plan view, the ruler patterns surround an entirety of the mask membrane, and
 in the plan view, the mask frame surrounds an entirety of the ruler patterns.   
     
     
         20 . The deposition mask of  claim 19 , wherein in the plan view, the mask frame includes a mask substrate including silicon, and
 in the plan view, the mask substrate has a circular shape.