Dresser cleaning device and substrate polishing device

Abstract

A dresser cleaning device includes a cleaning nozzle that sprays a cleaning fluid for cleaning a dresser onto the dresser, a movement mechanism that moves at least one of the dresser and the cleaning nozzle in a direction in which the dresser and the cleaning nozzle approach each other or separate from each other, a load sensor that detects a load applied to the dresser when the cleaning nozzle sprays the cleaning fluid onto the dresser, and a distance control unit that adjusts a distance between the dresser and the cleaning nozzle using the movement mechanism based on a detection value of the load sensor.

What is claimed is: 
     
         1 . A dresser cleaning device that cleans a dresser dressing a polishing surface of a polishing pad for polishing a substrate, the device comprising:
 a cleaning nozzle that sprays a cleaning fluid for cleaning the dresser onto the dresser;   a movement mechanism that moves at least one of the dresser and the cleaning nozzle in a direction in which the dresser and the cleaning nozzle approach each other or separate from each other;   a load sensor that detects a load applied to the dresser when the cleaning nozzle sprays the cleaning fluid onto the dresser; and   a distance control unit that adjusts a distance between the dresser and the cleaning nozzle using the movement mechanism based on a detection value of the load sensor.   
     
     
         2 . The dresser cleaning device according to  claim 1 , wherein
 the cleaning nozzle is disposed to face a dressing surface of the dresser that is in sliding contact with the polishing surface, and   the movement mechanism is a dresser lifting and lowering mechanism that adjusts a height position of the dresser.   
     
     
         3 . The dresser cleaning device according to  claim 1 , further comprising:
 a cleaning fluid supply unit that supplies the cleaning fluid to the cleaning nozzle, wherein   the cleaning fluid is a mixed fluid containing a cleaning liquid and a gas.   
     
     
         4 . A substrate polishing device comprising:
 the dresser cleaning device according to  claim 1 ; and   a polishing table that holds the polishing pad.   
     
     
         5 . A substrate polishing device comprising:
 the dresser cleaning device according to  claim 2 ; and   a polishing table that holds the polishing pad.   
     
     
         6 . A substrate polishing device comprising:
 the dresser cleaning device according to claim  3 ; and   a polishing table that holds the polishing pad.