Image sensors including phase detection pixel

Abstract

An image sensor is presented which includes a pixel array including a plurality of image sensing pixels in a substrate, a phase detection shared pixel in the substrate, the phase detection shared pixel including two phase detection subpixels arranged next to each other, a color filter fence disposed on the plurality of image sensing pixels, and the phase detection shared pixel, the color filter fence defining a plurality of color filter spaces, a plurality of color filter layers respectively disposed in the plurality of color filter spaces on the plurality of image sensing pixels, and the phase detection shared pixel, a first micro-lens disposed on each of the plurality of image sensing pixels to have a first height, and a second micro-lens disposed to vertically overlap the two phase detection subpixels of the phase detection shared pixel and to have a second height greater than the first height.

1 . A method of manufacturing an image sensor, the method comprising:
 providing a plurality of pixels on a substrate, wherein the plurality of pixels include one or more first pixels and one or more second pixels;   providing a first micro-lens on each of the one or more first pixels using a first process; and   providing a second micro-lens on each of the one or more second pixels using a second process, wherein the first micro-lens comprises a different shape from the second micro-lens.   
     
     
         2 . The method of  claim 1 , further comprising:
 forming a micro-lens material layer over the plurality of pixels,   wherein the first process comprises:
 forming a first mask pattern; 
 forming a first reflow pattern based on the first mask pattern; and 
 forming the first micro-lens from the micro-lens material layer based on the first reflow pattern; 
   and wherein the second process comprises:
 forming a second mask pattern; 
 forming a second reflow pattern based on the second mask pattern; and 
 forming the second micro-lens based on the second reflow pattern. 
   
     
     
         3 . The method of  claim 1 , wherein:
 the one or more first pixels comprise image sensing pixels; and   the one or more second pixels comprise phase detection shared pixels configured to generate a phase signal for calculating a phase difference between images.   
     
     
         4 . The method of  claim 2 , wherein:
 a height of the second micro-lens is greater than a height of the first micro-lens.   
     
     
         5 . The method of  claim 2 , wherein the micro-lens material layer is formed using a light-transmitting organic material. 
     
     
         6 . The method of  claim 2 , wherein:
 forming the first reflow pattern is performed by a process of applying heat treatment to the first mask pattern, and   forming the second reflow pattern is performed by a process of applying heat treatment to the second mask pattern.   
     
     
         7 . The method of  claim 2 , wherein:
 the first mask pattern has a first width in a horizontal direction, and   the second mask pattern has a second width in the horizontal direction greater than the first width.   
     
     
         8 . The method of  claim 2 , wherein:
 the first mask pattern has a first height in a vertical direction, and   the second mask pattern has a second height in the vertical direction greater than the first height.   
     
     
         9 . The method of  claim 2 , wherein:
 the plurality of pixels include:   a color filter fence arranged on the substrate; and   a color filter arranged on the substrate and disposed on a side wall of the color filter fence.   
     
     
         10 . The method of  claim 9 , wherein:
 the color filter fence comprises:   a first fence portion arranged between the one or more first pixels in a plan view and having a first width in a horizontal direction; and   a second fence portion arranged on at least one side of the one or more second pixels in a plan view and having a second width in the horizontal direction greater than the first width.   
     
     
         11 . A method of manufacturing an image sensor, the method comprising:
 providing a plurality of pixels on a substrate, wherein the plurality of pixels include one or more first pixels and one or more second pixels, each of the plurality of pixels includes a photodiode in the substrate;   forming a micro-lens material layer on the substrate;   forming a first mask pattern on the micro-lens material layer at a position vertically overlapping the one or more first pixels;   forming a second mask pattern on the micro-lens material layer at a position vertically overlapping the one or more second pixels;   forming a first reflow pattern based on the first mask pattern;   forming a second reflow pattern based on the second mask pattern;   forming a first micro-lens from the micro-lens material layer based on the first reflow pattern; and   forming a second micro-lens from the micro-lens material layer based on the second reflow pattern,   wherein the first micro-lens comprises a different shape from the second micro-lens.   
     
     
         12 . The method of  claim 11 , wherein a height of the second micro-lens is greater than a height of the first micro-lens. 
     
     
         13 . The method of  claim 11 , wherein the micro-lens material layer is formed using a light-transmitting organic material. 
     
     
         14 . The method of  claim 11 , wherein:
 forming the first reflow pattern is performed by a process of applying heat treatment to the first mask pattern, and   forming the second reflow pattern is performed by a process of applying heat treatment to the second mask pattern.   
     
     
         15 . The method of  claim 11 , wherein:
 the first mask pattern has a first width in a horizontal direction, and   the second mask pattern has a second width in the horizontal direction greater than the first width.   
     
     
         16 . The method of  claim 11 , wherein:
 the first mask pattern has a first height in a vertical direction, and   the second mask pattern has a second height in the vertical direction greater than the first height.   
     
     
         17 . The method of  claim 11 , wherein:
 the one or more first pixels comprise image sensing pixels; and   the one or more second pixels comprise phase detection shared pixels configured to generate a phase signal for calculating a phase difference between images.   
     
     
         18 . The method of  claim 17 , wherein:
 the plurality of pixels include:   a color filter fence arranged on the substrate, the color filter fence comprising:
 a first fence portion arranged between the one or more first pixels in a plan view and having a first width in a horizontal direction; and 
 a second fence portion arranged on at least one side of the one or more second pixels in a plan view and having a second width in the horizontal direction greater than the first width; and 
   a color filter arranged on the substrate and disposed on a side wall of the color filter fence.   
     
     
         19 . The method of  claim 18 , wherein:
 the color filter fence includes:   a barrier metal pattern; and   a low refractive index material layer pattern disposed on the barrier metal pattern to have a first refractive index, and   the first refractive index is greater than 1.0 and is less than or equal to 1.4.   
     
     
         20 . The method of  claim 18 , wherein:
 the one or more second pixels include four first image sensing subpixels arranged in a 2×2 matrix form, and   four first color filter layers having a same color are disposed on the four first image sensing subpixels.