Display substrate and manufacture method thereof, and display apparatus

Abstract

A display substrate, a manufacture method, and a display device are provided. Display substrate includes a substrate, and a light-emitting device layer on substrate. Light-emitting device layer includes an organic material film layer including an organic material layer and an ion implantation portion; and a material of ion implantation portion includes organic material layer material and doped ions. Light-emitting device layer includes sub-pixels, each sub-pixel includes a first electrode, an organic material layer on the first electrode away from the substrate, and a second electrode on the organic material layer away from the substrate; and organic material layer includes a light-emitting material layer. First electrodes of adjacent two sub-pixels are at an interval. Ion implantation portion is between adjacent two sub-pixels, and ion implantation portion is to electrically isolate film layers of adjacent two sub-pixels that are between first electrodes and a surface of light-emitting material layer away from substrate.

1 . A display substrate, comprising:
 a substrate; and   a light-emitting device layer on the substrate, wherein the light-emitting device layer comprises an organic material film layer, the organic material film layer comprises an organic material layer and an ion implantation portion, and a material of the ion implantation portion comprises a material of the organic material layer and doped ions;   wherein the light-emitting device layer comprises a plurality of sub-pixels, each sub-pixel comprises a first electrode, the organic material layer on the first electrode and away from the substrate, and a second electrode on the organic material layer and away from the substrate;   wherein the organic material layer comprises a light-emitting material layer; wherein first electrodes of adjacent sub-pixels among the plurality of sub-pixels are arranged at an interval; and   wherein the ion implantation portion is between adjacent two sub-pixels among the plurality of sub-pixels, and the ion implantation portion is to electrically isolate film layers of the adjacent two sub-pixels that are between the first electrodes and a surface of the light-emitting material layer away from the substrate.   
     
     
         2 . The display substrate according to  claim 1 , wherein the ion implantation portion comprises a P-type doped layer and an N-type doped layer; and/or
 wherein one of the first electrode and the second electrode is an anode and the other one of the first electrode and the second electrode is a cathode, and the ion implantation portion comprises an N-type doped layer and a P-type doped layer on the N-type doped layer and away from the anode.   
     
     
         3 . (canceled) 
     
     
         4 . The display substrate according to  claim 2 , wherein the first electrode is an anode, the second electrode is a cathode, and the organic material layer comprises a first organic layer between the first electrode and the light-emitting material layer and a second organic layer between the light-emitting material layer and the second electrode;
 wherein the first organic layer comprises a hole injection layer, a hole transport layer, an electron blocking layer, or any combination thereof, and the second organic layer comprises an electron injection layer, an electron transport layer, a hole blocking layer, or any combination thereof; and   wherein the N-type doped layer penetrates through the first organic layer and the light-emitting material layer; and a distance between the substrate and a surface of the P-type doped layer away from the substrate is less than or equal to a distance between the substrate and a surface of the second organic layer away from the substrate, or,   the display substrate further comprises an encapsulation layer on the second electrode and away from the substrate, and the P-type doped layer penetrates film layers between the light-emitting material layer and a surface of the encapsulation layer away from the substrate.   
     
     
         5 . The display substrate according to  claim 1 , further comprising a pixel defining layer on the substrate, and the pixel defining layer is provided with a plurality of pixel openings;
 wherein at least two sub-pixels with a same luminescence color are provided in a same pixel opening, and at least part of the organic material layers of the at least two sub-pixels is in the pixel opening;   wherein among the at least two sub-pixels in the same pixel opening, the ion implantation portion is between adjacent two sub-pixels; and the ion implantation portion is to electrically isolate film layers of the adjacent two sub-pixels in the same pixel opening that are between the first electrodes and a surface of the light-emitting material layer away from the substrate.   
     
     
         6 . The display substrate according to  claim 5 , wherein the display substrate further comprises an isolation column in the pixel opening, the isolation column is closer to the substrate than the ion implantation portion and between adjacent two first electrodes, and a height of the isolation column is greater than a thickness of the first electrode. 
     
     
         7 . (canceled) 
     
     
         8 . The display substrate according to  claim 5 , wherein the display substrate further comprises a driving circuit layer between the light-emitting device layer and the substrate, wherein the driving circuit layer comprises a plurality of pixel circuits, and at least two of the at least two sub-pixels in the same pixel opening, are electrically connected with a same pixel circuit. 
     
     
         9 . The display substrate according to  claim 8 , wherein the driving circuit layer further comprises a data signal gating circuit and a data signal line, wherein the pixel circuit comprises a data writing transistor, one end of the data signal line is connected with the data writing transistor, the other end of the data signal line is connected with the data signal gating circuit, and the data signal gating circuit is configured to input a data signal of a selected sub-pixel to the data signal line. 
     
     
         10 . The display substrate according to  claim 9 , wherein there are a plurality of the sub-pixels in the pixel opening, and the plurality of the sub-pixels in the pixel opening are electrically connected with a same pixel circuit; the data signal gating circuit comprises a plurality of data gating signal lines and a plurality of switch transistors respectively corresponding to the sub-pixels; the switch transistors corresponding to a same pixel opening are connected in parallel, one end of each of the switch transistors is connected with a driving chip, and the other end of each of the switch transistors is connected with a same data signal line; wherein a gate electrode of the switch transistor corresponding to each sub-pixel is connected with one of the data gating signal lines; and the data gating signal line is configured to turn on the switch transistor corresponding to a selected sub-pixel, such that a data signal provided by the driving chip to the selected sub-pixel is transmitted to the data signal line. 
     
     
         11 . The display substrate according to  claim 9 , wherein there are a plurality of the sub-pixels in the pixel opening, and the plurality of the sub-pixels in the pixel opening are electrically connected with a same pixel circuit; the data signal gating circuit comprises a plurality of data gating signal lines and a plurality of switch transistors respectively corresponding to the sub-pixels; among the at least two sub-pixels in the same pixel opening, switch transistors corresponding to at least two of the at least two sub-pixels are connected in parallel, one end of each of the switch transistors connected in parallel is connected with a driving chip, and the other end of each of the switch transistors connected in parallel is connected with one of the data signal lines; among the at least two sub-pixels in the same pixel opening, the switch transistors corresponding to the sub-pixels are connected with at least two data signal lines; at least two switch transistors connected with different data signal lines are connected with a same data gating signal line; and the data gating signal line is configured to turn on switch transistors corresponding to selected sub-pixels connected with the same data gating signal line, such that a data signal provided by the driving chip to the selected sub-pixels is transmitted to the data signal line. 
     
     
         12 . The display substrate according to  claim 1 , wherein the first electrode comprises a first conductive layer, a second conductive layer on the first conductive layer and away from the substrate, and a third conductive layer on the second conductive layer and away from the substrate, a material of the second conductive layer is selected from silver, aluminum, molybdenum, or any combination thereof, a material of the first conductive layer is selected from titanium, titanium nitride, transparent metal oxide, or any combination thereof, and a material of the third conductive layer is selected from titanium, titanium nitride, transparent metal oxide, or any combination thereof. 
     
     
         13 . The display substrate according to  claim 12 , wherein the display substrate further comprises a pixel defining layer on the substrate, and the pixel defining layer is provided with a plurality of pixel openings; at least two sub-pixels with a same luminescence color are provided in a same pixel opening, and at least part of the organic material layers of the at least two sub-pixel is in the pixel opening; and among the at least two sub-pixels in the same pixel opening, a distance between the first electrodes of adjacent two sub-pixels is less than 5.0 μm. 
     
     
         14 . The display substrate according to  claim 1 , wherein the display substrate further comprises a pixel defining layer on the substrate, and the pixel defining layer is provided with a plurality of pixel openings; at least one sub-pixel is provided in a same pixel opening, and at least part of the organic material layer of the at least one sub-pixel is in the pixel opening; and
 the ion implantation portion is on the pixel defining layer and away from the substrate, and the ion implantation portion is to electrically isolate the sub-pixels in adjacent pixel openings; and/or   wherein the first electrode is an anode, and the second electrode is a cathode; and the organic material layer comprises an electron transport layer between the light-emitting material layer and the second electrode, the electron transport layer comprises at least two electron transport film sub-layers, and at least one of the electron transport film sub-layers is on the ion implantation portion and away from the substrate.   
     
     
         15 . (canceled) 
     
     
         16 . The display substrate according to  claim 14 , wherein the electron transport layer comprises a first electron transport film sub-layer and a second electron transport film sub-layer on the first electron transport film sub-layer and away from the substrate; the ion implantation portion penetrates through the first electron transport film sub-layer; and the second electron transport film sub-layer is on the ion implantation portion and away from the substrate, and is in direct contact with the ion implantation portion. 
     
     
         17 . The display substrate according to  claim 1 , wherein the sub-pixels comprise a first color sub-pixel, a second color sub-pixel, and a third color sub-pixel, and there are a plurality of pixel openings arranged in a plurality of columns;
 wherein among adjacent two columns of the pixel openings, first color sub-pixels and second color sub-pixels are in one column of the pixel openings, the pixel openings of the first color sub-pixels and the pixel openings of the second color sub-pixels are alternately arranged, and third color sub-pixels are in the other column of the pixel openings; and,   wherein there are at least two first color sub-pixels in a pixel opening of the first color sub-pixels, there are at least two second color sub-pixels in a pixel opening of the second color sub-pixels, there are at least two third color sub-pixels in a pixel opening of the third color sub-pixels, and respective sub-pixels in a same pixel opening are arranged at an interval in a row direction, or respective sub-pixels in a same pixel opening are arranged at an interval in a column direction; or,   there are a plurality of the first color sub-pixels in the pixel opening of the first color sub-pixels, there are a plurality of the second color sub-pixels in the pixel opening of the second color sub-pixels, there are a plurality of the third color sub-pixels in the pixel opening of the third color sub-pixels, and a plurality of the sub-pixels in a same pixel opening are arranged in a plurality of rows and columns.   
     
     
         18 . A method of manufacturing the display substrate according to  claim 1 , comprising:
 providing a substrate; and   forming a light-emitting device layer on the substrate;   wherein the light-emitting device layer comprises an organic material film layer, the organic material film layer comprises an ion implantation portion and an organic material layer; the light-emitting device layer comprises a plurality of sub-pixels, each sub-pixel comprises a first electrode, the organic material layer on the first electrode and away from the substrate, and a second electrode on the organic material layer and away from the substrate, and the organic material layer comprises a light-emitting material layer; and   forming the ion implantation portion comprises:
 forming an organic film layer on the first electrode, performing ion implantation on the organic film layer to form the ion implantation portion, a portion of the organic film layer outside the ion implantation portion forms at least part film layer of the organic material layer, and wherein the ion implantation portion is to electrically isolate film layers of the adjacent two sub-pixels that are between the first electrodes and a surface of the light-emitting material layer away from the substrate. 
   
     
     
         19 . The method according to  claim 18 , wherein performing ion implantation on the organic film layer to form the ion implantation portion comprises:
 injecting P-type ions and/or N-type ions into the organic film layer by an ion implantation process, to form the ion implantation portion;   wherein the organic film layer comprises a first organic layer between the first electrode and the light-emitting material layer, and a third organic layer on the light-emitting material layer and away from the substrate; the first organic layer comprises at least one of a hole injection layer, a hole transport layer, or an electron blocking layer; and the third organic layer comprises at least one of an electron injection layer, an electron transport layer, or a hole blocking layer; and   injecting N-type ions into the first organic layer and the light-emitting material layer by an ion implantation process, to obtain an N-type doped layer penetrating through the first organic layer and the light-emitting material layer, and injecting P-type ions into the third organic layer to obtain a P-type doped layer penetrating through the third organic layer.   
     
     
         20 . (canceled) 
     
     
         21 . The method according to  claim 18 , wherein the display substrate further comprises a pixel defining layer on the substrate, and the pixel defining layer is provided with a plurality of pixel openings;
 at least two sub-pixels with a same luminescence color are provided in a same pixel opening, at least part of the organic material layers of the at least two sub-pixels is in the pixel opening, and the ion implantation portion is formed between adjacent two sub-pixels in the same pixel opening; and/or,   the ion implantation portion is formed on the pixel defining layer and away from the substrate;   wherein when at least two sub-pixels with the same luminescence color are provided in the same pixel opening, before forming the ion implantation portion, the method further comprises:   forming an isolation column by a dry etching process, the isolation column is between the adjacent two first electrodes in the same pixel opening, and a height of the isolation column is greater than a thickness of the first electrode; and a material of the isolation column comprises an inorganic material.   
     
     
         22 . (canceled) 
     
     
         23 . The method according to  claim 18 , wherein performing ion implantation on the organic film layer to form the ion implantation portion is performed before forming the second electrode;
 before performing ion implantation on the organic film layer to form the ion implantation portion, the method further comprises: forming a mask layer with a hollow portion on the organic film layer;   wherein forming the mask layer with the hollow portion on the organic film layer comprises:
 sequentially forming a protective layer and a barrier layer on the organic film layer, wherein a material of the protective layer comprises a fluorinated polymer material; 
 simultaneously performing exposure processing on the protective layer and the barrier layer; 
 sequentially performing development processing on the barrier layer and the protective layer, to obtain a patterned protective layer and a patterned barrier layer, wherein an orthographic projection of the patterned barrier layer onto the substrate is within an orthographic projection of the patterned protective layer onto the substrate, to obtain the mask layer comprising the patterned protective layer and the patterned barrier layer; 
 performing ion implantation on the organic film layer to form the ion implantation portion comprises: performing ion implantation on the organic film layer through the hollow portion of the mask layer; and 
 wherein the organic material layer comprises an electron transport layer comprising at least two electron transport film sub-layers; after performing ion implantation on the organic film layer to form the ion implantation portion, the method further comprises: removing the mask layer; and forming at least one electron transport film sub-layer on the organic film layer and away from the substrate; 
   or,   the display substrate further comprises an encapsulation layer on the light-emitting device layer and away from the substrate, the encapsulation layer only comprises an inorganic layer, and a step of performing ion implantation on the organic film layer to form the ion implantation portion is performed after a step of forming the second electrode.   
     
     
         24 . The method according to  claim 18 , wherein forming the first electrode comprises:
 sequentially forming a first conductive film layer, a second conductive film layer on the first conductive film layer and away from the substrate, and a third conductive film layer on the second conductive film layer and away from the substrate, wherein a material of the second conductive film layer is selected from at least one of aluminum or molybdenum, and materials of the first conductive film layer and the third conductive film layer are respectively selected from at least one of titanium, titanium nitride, or transparent metal oxide, and orthographic projections of the first electrode film layer, the second conductive film layer, and the third conductive film layer onto the substrate cover a pixel defining layer and pixel openings; wherein the display substrate further comprises a pixel defining layer on the substrate, and the pixel defining layer is provided with a plurality of pixel openings;   etching the first conductive film layer, the second conductive film layer, and the third conductive film layer by a dry etching process or a wet etching process, to obtain the first electrode;   or,   sequentially forming the first conductive film layer, the second conductive film layer on the first conductive film layer and away from the substrate, and the third conductive film layer on the second conductive film layer and away from the substrate, wherein a material of the second conductive film layer comprises silver, and materials of the first conductive film layer and the third conductive film layer are respectively selected from at least one of titanium, titanium nitride, or transparent metal oxide, and orthographic projections of the first electrode film layer, the second conductive film layer, and the third conductive film layer onto the substrate cover the pixel defining layer and the pixel openings;   etching the first conductive film layer, the second conductive film layer, and the third conductive film layer by the wet etching process, to obtain the first electrode.   
     
     
         25 . A display device, comprising the display substrate according to  claim 1 .