Electroplating equipment and electroplating fluid disturbance device thereof

Abstract

An electroplating fluid disturbance device is used in electroplating equipment. The electroplating fluid disturbance device includes two horizontal driving devices, two fan blade structures and two fan blade structure driving devices. Each horizontal driving device connects one fan blade structure, allowing each fan blade structure to move toward or away from two surfaces of a plated substrate. Each fan blade structure driving device connects one fan blade structure, allowing each fan blade structure to move back-and-forth in a specific direction perpendicular to a surface normal of the plated substrate and the height of electroplating equipment. An included angle between 10 degrees and 50 degrees is disposed between a direction along which the width of a left fan blade or a right fan blade of the fan blade structure is extended and a direction along which the width of a central fan blade of the fan blade structure is extended.

What is claimed is: 
     
         1 . An electroplating fluid disturbance device used in electroplating equipment, comprising
 a first horizontal driving device;   a first fan blade structure, which is connected to the first horizontal driving device, wherein the first horizontal driving structure is used to drive the first fan blade structure to move toward or away from a first surface of a plated substrate, forming a first specific distance between the first fan blade structure and the first surface of the plated substrate; and   a first fan blade structure driving device, which is connected to the first fan blade structure and is used to drive the entire first fan blade structure, allowing the first fan blade structure to move back-and-forth in a specific direction, with that the specific direction is perpendicular to a surface normal of the plated substrate and is perpendicular to a height of electroplating equipment;   wherein the first fan blade structure includes a first left fan blade, a first central fan blade, and a first right fan blade, with that the first central fan blade of the first fan blade structure is disposed between the first left fan blade and the first right fan blade of the first fan blade structure, a first included angle is disposed between a direction along which a width of the first central fan blade is extended and a direction along which a width of the first left fan blade is extended, a second included angle is disposed between a direction along which the width of the first central fan blade is extended and a direction along which a width of the first right fan blade is extended, and both the first included angle and the second included angle are between 10 degrees and 50 degrees.   
     
     
         2 . The electroplating fluid disturbance device according to  claim 1 , further comprising
 a second horizontal driving device;   a second fan blade structure, which is connected to the second horizontal driving device, wherein the second horizontal driving device is used to drive the second fan blade structure to move toward or away from a second surface of the plated substrate, forming a second specific distance between the second fan blade structure and the second surface of the plated substrate, with that the second surface is opposite to the first surface; and   a second fan blade structure driving device, which is connected to the second fan blade structure and is used to drive the entire second fan blade structure, allowing the second fan blade structure to move back-and-forth in a specific direction;   wherein the second fan blade structure includes a second left fan blade, a second central fan blade, and a second right fan blade, with that the second central fan blade of the second fan blade structure is disposed between the second left fan blade and the second right fan blade of the second fan blade structure, a third included angle is disposed between a direction along which the width of second central fan blade is extended and a direction along which the width of second left fan blade is extended, a fourth included angle is disposed between a direction along which the width of second central fan blade is extended and a direction along which the width of second right fan blade is extended, and both the third included angle and the fourth included angle are between 10 degrees and 50 degrees.   
     
     
         3 . The electroplating fluid disturbance device according to  claim 2 , wherein both of the first specific distance and the second specific distance are between 1 cm and 30 cm. 
     
     
         4 . The electroplating fluid disturbance device according to  claim 3 , wherein the first specific distance is equal to the second specific distance. 
     
     
         5 . The electroplating fluid disturbance device according to  claim 4 , wherein both of the first specific distance and the second specific distance are 2 cm. 
     
     
         6 . The electroplating fluid disturbance device according to  claim 2 , wherein the first included angle, the second included angle, the third included angle, and the fourth included angle are all equal. 
     
     
         7 . The electroplating fluid disturbance device according to  claim 6 , wherein the first included angle, the second included angle, the third included angle, and the fourth included angle are all 15 degrees. 
     
     
         8 . The electroplating fluid disturbance device according to  claim 2 , wherein both of the first left fan blade and the first right fan blade of the first fan blade structure are plural, and both of the second left fan blade and the second right fan blade of the second fan blade structure are plural. 
     
     
         9 . An electroplating equipment, comprising
 the electroplating fluid disturbance device described in any one claim in  claim 2 ;   an electroplating tank, wherein the electroplating fluid disturbance device is disposed in the electroplating tank;   a cathode device;   a jig, which is disposed in the electroplating tank when the electroplating equipment performs electroplating to the plated substrate, wherein a top of the jig is connected to the cathode device, and the jig is used to clamp the plated substrate;   a first anode device, which is connected at a rear side of the first fan blade structure;   a second anode device, which is connected at a rear side of the second fan blade structure; and   a vertical driving device, which is connected to the cathode device to drive the cathode device and the jig to move vertically and to be positioned, allowing the plated substrate clamped by the jig to enter into or exit from the electroplating tank or to be positioned in the electroplating tank.   
     
     
         10 . The electroplating equipment according to  claim 9 , wherein the jig includes a first jig frame and a second jig frame, the first jig frame and the second jig frame are disposed on each of two sides on the top of the jig, and are extended downward in a vertical direction, so as to clamp each of the two sides of the plated substrate. 
     
     
         11 . The electroplating equipment according to  claim 9 , further comprising
 a first electroplating current providing device, which is connected electrically to the first anode device to provide a first electroplating current to the first anode device; and   a second electroplating current providing device, which is connected electrically to the second anode device to provide the second electroplating current to the second anode device.   
     
     
         12 . The electroplating equipment according to  claim 9 , further comprising an electroplating current providing device, which is connected electrically to the first anode device and the second anode device to provide an electroplating current to the first anode device and the second anode device.