Electrolysis device, stirring deposition equipment, circulating deposition system and electrolysis method

Abstract

An electrolysis device, a stirring deposition equipment, a circulating deposition system, and an electrolysis method are provided. The electrolysis device is configured to electro-precipitate a magnetic deposition from a working fluid. The electrolysis device includes an anode plate, a cathode plate, and a magnetic component. The cathode plate and the anode plate are disposed correspondingly, and the magnetic component is disposed on a side of the cathode plate relatively away from the anode plate. The working fluid flows between the anode plate and the cathode plate, and an oxidation-reduction reaction occurs between the anode plate and the cathode plate. The magnetic component attaches the magnetic deposition resolved from the working fluid onto a surface of the cathode plate facing the anode plate. The magnetic deposition includes a product and a half-reactant.

What is claimed is: 
     
         1 . An electrolysis device, configured to electro-precipitate a magnetic deposition from a working fluid, the electrolysis device comprising:
 an anode plate;   a cathode plate, disposed corresponding to the anode plate; and   a magnetic component, disposed on a side of the cathode plate relatively away from the anode plate,   wherein the working fluid flows between the anode plate and the cathode plate, and an oxidation-reduction reaction occurs between the anode plate and the cathode plate, and   the magnetic component attaches the magnetic deposition resolved from the working fluid onto a surface of the cathode plate facing the anode plate, wherein the magnetic deposition comprises a product and a half-reactant.   
     
     
         2 . The electrolysis device according to  claim 1 , wherein the product is a metal and the half-reactant is a metal compound. 
     
     
         3 . The electrolysis device according to  claim 1 , wherein an orthographic projection range of the magnetic component falls within an orthographic projection range of the cathode plate. 
     
     
         4 . The electrolysis device according to  claim 1 , wherein in a flowing direction of the working fluid, a length of the magnetic component is less than a length of the cathode plate. 
     
     
         5 . The electrolysis device according to  claim 4 , wherein a distance from a first edge of the magnetic component to a first edge of the cathode plate is greater than a thickness of the magnetic component. 
     
     
         6 . The electrolysis device according to  claim 1 , wherein the magnetic component is set to multiple. 
     
     
         7 . The electrolysis device according to  claim 1 , further comprising: an electrical insulation layer, disposed along an outer circumference of the magnetic component. 
     
     
         8 . A stirring deposition equipment, comprising:
 a stirring tank, filled with a working fluid;   an electrolysis device according to  claim 1 ; and   a stirring rod, tilted at an angle relative to a tank bottom of the stirring tank, extending into the stirring tank, and immersed in the working fluid, wherein the anode plate of the electrolysis device is disposed in the stirring tank, and the cathode plate and the magnetic component of the electrolysis device are disposed at an end of the stirring rod extending into the stirring tank; and   a rotating electrode, connected to the stirring rod.   
     
     
         9 . The stirring deposition equipment according to  claim 8 , wherein a range of the angle of the stirring rod tilted relative to the tank bottom of the stirring tank is between  0  and  60  degrees. 
     
     
         10 . The stirring deposition equipment according to  claim 8 , further comprising: a heater, disposed on one side of the stirring tank, wherein the side where the heater is disposed is different from a side where the stirring rod extends into the stirring tank. 
     
     
         11 . A circulating deposition system, wherein a working fluid circulates in the circulating deposition system, and in a flowing direction of the working fluid, the circulating deposition system comprises:
 a stirring tank, filled with the working fluid;   a stirring rod, extending into the stirring tank and immersed in the working fluid;   an electrolysis device, comprising: a plating tank, an anode plate, a cathode plate, and a magnetic component, wherein the cathode plate is disposed at a tank bottom of the plating tank, the anode plate is disposed corresponding to the cathode plate, and the magnetic component is disposed outside the tank bottom of the plating tank;   a first pump; and   a pipeline, connecting the stirring tank, the plating tank, and the first pump,   wherein the working fluid that flows between the anode plate and the cathode plate undergoes an oxidation-reduction reaction between the anode plate and the cathode plate, and the magnetic component attaches a magnetic deposition resolved from the working fluid onto a surface of the cathode plate facing the anode plate, wherein the magnetic deposition comprises a product and a half-reactant.   
     
     
         12 . The circulating deposition system according to  claim 11 , wherein a longitudinal direction of the anode plate is perpendicular to a vertical direction of the cathode plate. 
     
     
         13 . The circulating deposition system according to  claim 11 , further comprising: a cleaning tank, connected to the plating tank and the first pump. 
     
     
         14 . The circulating deposition system according to  claim 13 , further comprising: a second pump, disposed between the cleaning tank and the plating tank. 
     
     
         15 . The circulating deposition system according to  claim 13 , further comprising: a valve, disposed between the cleaning tank and the plating tank. 
     
     
         16 . The circulating deposition system according to  claim 11 , further comprising: a plurality of valves, wherein a first valve is disposed between the stirring tank and the plating tank, and a second valve is disposed between the first pump and the stirring tank. 
     
     
         17 . The circulating deposition system according to  claim 11 , wherein the product is a metal and the half-reactant is a metal compound. 
     
     
         18 . The circulating deposition system according to  claim 11 , further comprising: a heater, disposed in the stirring tank. 
     
     
         19 . An electrolysis method for electro-precipitating a magnetic deposition, comprising:
 providing an electrolysis device, wherein the electrolysis device comprises an anode plate, a cathode plate disposed corresponding to the anode plate, and a magnetic component disposed on a side of the cathode plate relatively away from the anode plate,   wherein an oxidation-reduction reaction occurs when a working fluid flows through the anode plate and the cathode plate, and the magnetic component attaches the magnetic deposition resolved from the working fluid onto a surface of the cathode plate facing the anode plate, wherein the magnetic deposition comprises a product and a half-reactant.   
     
     
         20 . The electrolysis method according to  claim 19 , wherein in a flowing direction of the working fluid, a length of the magnetic component is made less than a length of the cathode plate. 
     
     
         21 . The electrolysis method according to  claim 19 , wherein a distance from a first edge of the magnetic component to a first edge of the cathode plate is made greater than a thickness of the magnetic component. 
     
     
         22 . The electrolysis method according to  claim 19 , wherein the magnetic component is set to multiple. 
     
     
         23 . The electrolysis method according to  claim 19 , wherein the product is a metal and the half-reactant is a metal compound.