Atomization core and electronic atomization device

Abstract

An atomization core includes: a porous substrate; a heating member protruding from the porous substrate, the heating member having a first surface and a second surface, the first surface being in contact with the porous substrate, and the second surface not being in contact with the porous substrate; and a porous liquid guide layer connected to the porous substrate and covering at least part of the second surface.

What is claimed is: 
     
         1 . An atomization core, comprising:
 a porous substrate;   a heating member protruding from the porous substrate, the heating member having a first surface and a second surface, the first surface being in contact with the porous substrate, and the second surface not being in contact with the porous substrate; and   a porous liquid guide layer connected to the porous substrate and covering at least part of the second surface.   
     
     
         2 . The atomization core of  claim 1 , wherein the first surface comprises a bottom surface of the heating member,
 wherein the second surface comprises a side surface intersecting with and connected to the bottom surface, and   wherein the porous liquid guide layer covers the side surface.   
     
     
         3 . The atomization core of  claim 2 , wherein the second surface comprises a top surface opposite to bottom surface, and
 wherein the porous liquid guide layer covers both the side surface and the top surface.   
     
     
         4 . The atomization core of  claim 1 , wherein the heating member extends along a preset path and is arranged on the porous substrate, and
 wherein the porous liquid guide layer continuously covers the second surface along the preset path.   
     
     
         5 . The atomization core of  claim 1 , wherein the heating member extends along a preset path and is arranged on the porous substrate, and
 wherein the porous liquid guide layer intermittently covers the second surface along the preset path.   
     
     
         6 . The atomization core of  claim 4 , wherein the porous liquid guide layer intermittently covers the second surface along the preset path, and
 wherein the porous liquid guide layer covers a proportion of about 20% to about 80% of an area of the second surface.   
     
     
         7 . The atomization core of  claim 4 , wherein the preset path includes a straight line segment and a curved line segment that are continuous. 
     
     
         8 . The atomization core of  claim 4 , further comprising:
 two electrodes arranged apart on the porous substrate, and   wherein the heating member extends along the preset path and is electrically connected between the two electrodes.   
     
     
         9 . The atomization core of  claim 1 , wherein a porosity of the porous liquid guide layer is about 40% to about 80%, and
 wherein an average pore size of the porous liquid guide layer is about 14 μm to about 26 μm.   
     
     
         10 . The atomization core of  claim 1 , wherein a porosity of the porous substrate is about 30% to about 75%, and
 wherein the average pore size of the porous substrate is about 10.5 μm to about 19.5 μm.   
     
     
         11 . The atomization core of  claim 1 , wherein the porous substrate comprises a raw material of the porous substrate through sintering,
 wherein the porous liquid guide layer comprises a raw material of a liquid guide layer through sintering, and   wherein, based on a mass percentage of each component in the raw material of the liquid guide layer, the raw material of the liquid guide layer comprises about 42% to about 78% of the raw material of the porous substrate, about 7% to about 13% of glass powder, and about 21% to about 39% of a porous former.   
     
     
         12 . The atomization core of  claim 1 , wherein the porous substrate comprises the raw material of the porous substrate through sintering, and
 wherein the porous liquid guide layer comprises the raw material of the liquid guide layer through sintering, and   wherein, based on a mass percentage of each component in the raw material of the porous substrate, the raw material of the porous substrate comprises about 35% to about 65% of diatomite, about 9% to about 17% of aluminum oxide, about 7% to about 13% of albite, about 3% to about 5% of clay, and about 16% to about 30% of PMMA.   
     
     
         13 . The atomization core of  claim 1 , wherein the heating member comprises a heating film formed on a surface of the porous substrate in a silk screen printing manner. 
     
     
         14 . An electronic atomization device, comprising:
 the atomization core of  claim 1 .