Precursor delivery vessel, precursor delivery system, and precursor deposition apparatus

Abstract

A vapor phase precursor delivery system for delivering a vapor phase precursor for depositing a layer in a vapor phase deposition apparatus is disclosed. The precursor delivery vessel is constructed and arranged to store a solid precursor and to deliver a vapor phase precursor at a vessel outlet. The system being provided with a plate provided with holes to allow for gas transport between the chamber and the part of the vessel where the solid precursor is stored.

1 . A precursor delivery vessel constructed and arranged to store a solid precursor and to deliver a vapor phase precursor at a vessel outlet, which is constructed in fluid communication with a chamber being defined by a top plate, and a bottom plate constructed and arranged to be supported on a top surface of the solid precursor and to be moveable with the top surface of the solid precursor in the vessel, wherein the bottom plate is provided with holes to allow for gas transport between the chamber and a part of the vessel where the solid precursor is stored and to allow sublimated precursor from the solid precursor to enter the chamber. 
     
     
         2 . The vessel according to  claim 1 , wherein the bottom plate is a meshed structure to allow for uniform sublimation of the solid precursor. 
     
     
         3 . The vessel according to  claim 1 , wherein the chamber is further defined by a wall connected to the top plate and the bottom plate. 
     
     
         4 . The vessel according to  claim 1 , wherein the vessel is provided with a spring between an inner surface of the vessel and the chamber to press the bottom plate against the top surface of the solid precursor in the vessel. 
     
     
         5 . The vessel according to  claim 1 , wherein the vessel is provided with a linear guiding surface in an interior of the vessel to guide the chamber linearly during its movement through the interior of the vessel. 
     
     
         6 . The vessel according to  claim 1 , wherein the vessel comprises an actuator constructed and arranged to move the solid precursor in the vessel. 
     
     
         7 . The vessel according to  claim 6 , wherein the actuator is constructed and arranged to provide a linear movement. 
     
     
         8 . The vessel according to  claim 6 , wherein the actuator is constructed and arranged to provide a reciprocating movement. 
     
     
         9 . The vessel according to  claim 6 , wherein the actuator is constructed and arranged to provide a reciprocating movement with a frequency between 0.1 and 10,000 Hz. 
     
     
         10 . The vessel according to  claim 6 , wherein the actuator is provided with a controller to switch movement on and off between 1 and 0.01 Hz. 
     
     
         11 . The vessel according to  claim 1 , wherein the vessel is provided with a vessel inlet constructed in fluid communication with the vessel outlet via the chamber and via at least one flexible tube to provide a flow of a pick-up gas through the chamber to transport the vapor phase precursor out of the chamber while allowing movement of the chamber in the vessel and the vessel is provided with a heater constructed and arranged to hold and sublimate a metal chloride, such as Hafnium tetrachloride (HfCl 4 ), Tantalum pentachloride (TaCl 5 ), Molybdenum pentachloride (MoCl 5 ), Zirconium tetrachloride (ZrCl 4 ), or Molybdenum dichloride dioxide (MoO 2 Cl 2 ) to deposit a transition metal. 
     
     
         12 . The vessel according to  claim 1 , wherein the vessel comprises:
 a lifting device constructed and arranged to lift the chamber up when the solid precursor is substantially finished;   a fill port for refilling the vessel with solid precursor when the chamber is lifted up; and,   a lid to cover the fill port.   
     
     
         13 . A precursor delivery system to provide a vapor phase precursor from a solid precursor, the system comprising:
 a vessel constructed and arranged for storing solid precursor and provided with a vessel outlet, which vessel outlet is constructed and arranged in fluid communication with a chamber constructed and arranged to be supported on top of the solid precursor and move with a level of the solid precursor in the vessel,   a holder constructed and arranged to hold the vessel; and   a vapor phase outlet constructed and arranged to connect to the vessel outlet for delivery of the vapor phase precursor, wherein the chamber is being defined by a top plate, and a bottom plate constructed and arranged to be supported on the top surface of the solid precursor and the bottom plate is provided with holes to allow for gas transport between a part of the vessel where the solid precursor is stored and the chamber to allow sublimated precursor from the solid precursor to enter the chamber.   
     
     
         14 . The system according to  claim 13 , wherein the system comprises an actuator constructed and arranged to move the solid precursor in the vessel. 
     
     
         15 . The system according to  claim 13 , wherein the system is provided with a support frame supporting an actuator and the holder and the actuator is constructed and arranged to exert a force between the support frame and the holder to move the vessel and the solid precursor. 
     
     
         16 . The system according to  claim 15 , wherein the support frame, actuator and holder are constructed and arranged to move the vessel with a rotational or tilting movement. 
     
     
         17 . A precursor delivery system to provide a vapor phase precursor from a solid precursor, the system comprising:
 a holder constructed and arranged to hold a vessel for storing and sublimating a solid precursor;   an inert gas source constructed an arranged to connect to the vessel to deliver inert gas to the vessel; and   a vapor phase outlet constructed and arranged to connect to the vessel for delivery of the vapor phase precursor, wherein the holder is constructed and arranged for allowing movement of the vessel.   
     
     
         18 . The system according to  claim 17 , wherein the system comprises an actuator constructed and arranged to exert a force on the vessel to move the vessel. 
     
     
         19 . A precursor deposition apparatus comprising a vapor phase precursor delivery system according to  claim 13  for delivering a vapor phase precursor for depositing a layer on a substrate. 
     
     
         20 . The apparatus according to  claim 19 , wherein the apparatus is a vertical furnace comprising a reactor constructed and arranged to load a boat with a plurality of substrates and the vapor phase precursor delivery system is constructed and arranged to deliver a vapor phase precursor for depositing a layer on the plurality of substrates in the reactor.