Display device and method of manufacturing the same

Abstract

A display device is disclosed that includes a substrate, a light emitting device disposed on the substrate, an encapsulation layer covering the light emitting device, a light control film disposed on the encapsulation layer and including a plurality of light control patterns, and each of the light control patterns includes a first metal pattern disposed on the encapsulation layer, a first light transmission pattern disposed on the first metal pattern, a second metal pattern disposed on the first light transmission pattern and overlapping the first metal pattern, a second light transmission pattern disposed on the second metal pattern and overlapping the first light transmission pattern, a first light blocking pattern disposed on the same layer as the first metal pattern and overlapping the first light transmission pattern, and a second light blocking pattern disposed on the same layer as the second metal pattern and overlapping the second light transmission pattern.

What is claimed is: 
     
         1 . A display device comprising:
 a substrate;   a light emitting device disposed on the substrate;   an encapsulation layer covering the light emitting device; and   a light control film disposed on the encapsulation layer and including a plurality of light control patterns, and   wherein each of the light control patterns includes:
 a first metal pattern disposed on the encapsulation layer; 
 a first light transmission pattern disposed on the first metal pattern; 
 a second metal pattern disposed on the first light transmission pattern and overlapping the first metal pattern; 
 a second light transmission pattern disposed on the second metal pattern and overlapping the first light transmission pattern; 
 a first light blocking pattern disposed on a same layer as the first metal pattern and overlapping the first light transmission pattern; and 
 a second light blocking pattern disposed on a same layer as the second metal pattern and overlapping the second light transmission pattern. 
   
     
     
         2 . The display device of  claim 1 , wherein the first light blocking pattern is disposed within a first undercut shape defined by the first metal pattern and the first light transmission pattern, and
 wherein the second light blocking pattern is disposed within a second undercut shape defined by the second metal pattern and the second light transmission pattern.   
     
     
         3 . The display device of  claim 1 , wherein a refractive index of the first light transmission pattern for light in a wavelength range of about 380 nm to about 780 nm is about 1 to about 2, and
 wherein a refractive index of the second light transmission pattern for light in a wavelength range of about 380 nm to about 780 nm is about 1 to about 2.   
     
     
         4 . The display device of  claim 1 , wherein a distance between the light control patterns adjacent to each other is about 5 micrometers to about 10 micrometers. 
     
     
         5 . The display device of  claim 1 , wherein a height of each of the light control patterns is about 10 micrometers to about 30 micrometers. 
     
     
         6 . The display device of  claim 1 , wherein a width of the first light blocking pattern and a width of the second light blocking pattern are about 1 micrometers to 2 micrometers. 
     
     
         7 . The display device of  claim 1 , wherein an etching rate of the second metal pattern is lower than an etching rate of the first metal pattern in the same etching process. 
     
     
         8 . The display device of  claim 1 , wherein the first metal pattern and the second metal pattern include a transparent conductive oxide. 
     
     
         9 . The display device of  claim 1 , wherein the first light transmission pattern and the second light transmission pattern include a transparent organic material. 
     
     
         10 . The display device of  claim 1 , wherein the first light blocking pattern and the second light blocking pattern overlap each other in a plan view. 
     
     
         11 . The display device of  claim 1 , wherein the light control film further include at least one filling pattern disposed between light control patterns adjacent to each other and including a transparent organic material. 
     
     
         12 . The display device of  claim 1 , wherein each of the light control patterns further includes a light blocking partition covering a side surface of the first light transmission pattern, a side surface of the second light transmission pattern, a side surface of the first light blocking pattern, and a side surface of the second light blocking pattern. 
     
     
         13 . The display device of  claim 12 , wherein the light blocking partition is integrally formed with the first light blocking pattern and the second light blocking pattern. 
     
     
         14 . The display device of  claim 1 , wherein at least one of the light control patterns has a through hole penetrating a corresponding light control pattern, and
 wherein the through hole is filled with the same material as the first light blocking pattern and the second light blocking pattern.   
     
     
         15 . A method of manufacturing a display device, the method comprising:
 providing a substrate with a light emitting device formed on the substrate and an encapsulation layer covering the light emitting device; and   producing a light control film including a plurality of light control patterns on the encapsulation layer,   wherein the producing the light control film includes forming the light control patterns, and   wherein the forming the light control patterns includes:
 forming a preliminary light control layer in which a first metal layer, a first insulating layer, a second metal layer, and a second insulating layer are sequentially stacked; 
 forming a mask pattern on the preliminary light control layer; 
 forming a second light transmission pattern by removing a portion of the second insulating layer exposed from the mask pattern through a first etching process; 
 forming a second metal pattern by removing a portion of the second metal layer exposed from the second light transmission pattern and a portion of the second metal layer overlapping a portion of the second light transmission pattern through a second etching process; 
 forming a first light transmission pattern by removing a portion of the first insulating layer through the first etching process using the mask pattern as a mask; 
 forming a first metal pattern by removing a portion of the first metal layer exposed from the first light transmission pattern and a portion of the first metal layer overlapping a portion of the first light transmission pattern through the second etching process; 
 forming a preliminary light blocking layer covering the first metal pattern, the first light transmission pattern, the second metal pattern, and the second light transmission pattern; and 
 forming a first light blocking pattern on a same layer as the first metal pattern and a second light blocking pattern on a the same layer as the second metal pattern by removing a portion of the preliminary light blocking layer. 
   
     
     
         16 . The method of  claim 15 , wherein an etching rate of the first metal layer in the first etching process is lower than an etching rate of the first insulating layer in the first etching process,
 wherein an etching rate of the second metal layer in the first etching process is lower than an etching rate of the second insulating layer in the first etching process,   wherein an etching rate of the first metal layer in the second etching process is higher than an etching rate of the first insulating layer in the second etching process, and   wherein an etching rate of the second metal layer in the second etching process is higher than an etching rate of the second insulating layer in the second etching process.   
     
     
         17 . The method of  claim 16 , wherein an etching rate of the mask pattern in the second etching process is lower than the etching rate of the first metal layer in the second etching process and the etching rate of the second metal layer in the second etching process. 
     
     
         18 . The method of  claim 16 , wherein the etching rate of the second metal layer in the second etching process is lower than the etching rate of the first metal layer in the second etching process. 
     
     
         19 . The method of  claim 15 , wherein the providing of the light control film further includes providing a filling pattern disposed between the light control patterns adjacent each other and including a transparent organic material after providing the light control patterns. 
     
     
         20 . The method of  claim 15 , wherein in the providing the first light blocking pattern and the second light blocking pattern, a portion of the preliminary light blocking layer is removed through an entire-surface ashing process.