Systems and apparatus for semiconductor equipment

Abstract

Various embodiments of the present technology may provide an apparatus for removing oxygen and moisture from a semiconductor system. The apparatus may be coupled to a wafer handling chamber and include a blower, a first air purifier, a second air purifier, and a particle filter. The first and second air purifiers may be coupled in parallel to each other and downstream from the blower. The particle filter may be coupled downstream from the first and second air purifiers. The wafer handling chamber may include a fan integrated within a lower region of the wafer handling chamber.

What is claimed is: 
     
         1 . An apparatus, comprising:
 a wafer handling chamber comprising:
 an upper region comprising a plurality of openings; and 
 a lower region, positioned below the upper region, comprising a fan; and 
   an air handling system coupled to the wafer handling chamber and configured to circulate air, the air handling system comprising:
 a blower downstream from the fan; 
 a set of purifiers comprising:
 a first purifier downstream from the blower; and 
 a second purifier downstream from the blower and coupled to the first purifier; and 
 
 a particle filter downstream from the set of purifiers and coupled between the set of purifiers and the fan. 
   
     
     
         2 . The apparatus according to  claim 1 , wherein each of the first and second purifiers are configured to remove oxygen and water from the air. 
     
     
         3 . The apparatus according to  claim 1 , wherein the second purifier is coupled in parallel with the first purifier. 
     
     
         4 . The apparatus according to  claim 1 , further comprising a first valve disposed between the set of purifiers and the blower and configured to control a direction of air flow through the set of purifiers. 
     
     
         5 . The apparatus according to  claim 1 , wherein the air handling system further comprises:
 a second valve disposed at an outlet of the first purifier; and   a third valve disposed at an outlet of the second purifier.   
     
     
         6 . The apparatus according to  claim 1 , wherein the fan comprises a fan cowling that is integrated into a sidewall of the wafer handling chamber. 
     
     
         7 . The apparatus according to  claim 1 , wherein the fan comprises a centrifugal fan configured to draw air from the upper region of the wafer handling chamber and push it to the air handling system. 
     
     
         8 . The apparatus according to  claim 1 , wherein each of the first and second purifiers comprises a plurality of porous pellets configured to absorb moisture from the air. 
     
     
         9 . The apparatus according to  claim 1 , wherein each of the first and second purifiers comprises a catalyst configured to absorb oxygen from the air. 
     
     
         10 . The apparatus according to  claim 1 , wherein the wafer handling chamber further comprises a mechanically-driven arm configured to pass through each opening. 
     
     
         11 . An apparatus, comprising:
 a wafer handling chamber comprising:
 an upper region comprising a plurality of openings; and 
 a lower region, positioned below the upper region, comprising an air outlet and an air inlet; and 
   an air handling system coupled to the wafer handling chamber and configured to circulate air, the air handling system comprising:
 a blower comprising:
 an inlet coupled to the air outlet and configured to pull air from the wafer handling chamber; and 
 an outlet configured to expel air; 
 
 a set of purifiers coupled to the outlet of the blower and configured to remove oxygen and water from the air; and 
 a particle filter downstream from the set of purifiers and coupled to the air inlet of the wafer handling chamber. 
   
     
     
         12 . The apparatus according to  claim 11 , wherein the set of purifiers comprises:
 a first purifier coupled to the outlet of the blower; and   a second purifier coupled to the outlet of the blower and coupled in parallel with the first purifier.   
     
     
         13 . The apparatus according to  claim 12 , wherein each of the first and second purifiers comprises:
 a plurality of porous pellets configured to absorb moisture from the air; and   a catalyst configured to absorb oxygen from the air.   
     
     
         14 . The apparatus according to  claim 12 , further comprising a valve disposed between the set of purifiers and the blower and configured to control a direction of air flow through the set of purifiers. 
     
     
         15 . The apparatus according to  claim 11 , wherein the wafer handling chamber further comprises a mechanically-driven arm configured to pass through each opening. 
     
     
         16 . The apparatus according to  claim 11 , wherein the wafer handling chamber further comprises a fan disposed in the bottom portion, and wherein the fan comprises a centrifugal fan configured to draw air from the upper region of the wafer handling chamber and push it to the air handling system. 
     
     
         17 . A system, comprising:
 a wafer handling chamber comprising:
 an upper region comprising a plurality of openings; and 
 a lower region, positioned below the upper region, comprising an air outlet and an air inlet; 
   a plurality of reaction chambers, wherein each reaction chamber is coupled to a respective opening from the plurality of openings; and   an air handling system coupled to the wafer handling chamber and configured to circulate air, the air handling system comprising:
 a blower comprising:
 an inlet coupled to the air outlet and configured to pull air from the wafer handling chamber; and 
 an outlet configured to expel air; 
 
 a set of purifiers coupled to the outlet of the blower and configured to remove oxygen and water from the air; and 
 a particle filter downstream from the set of purifiers and coupled to the air inlet of the wafer handling chamber. 
   
     
     
         18 . The system according to  claim 17 , wherein the set of purifiers comprises:
 a first purifier coupled to the outlet of the blower; and   a second purifier coupled to the outlet of the blower and coupled in parallel with the first purifier.   
     
     
         19 . The system according to  claim 18 , further comprising:
 a first valve disposed between the set of purifiers and the blower and configured to control a direction of air flow through the set of purifiers;   a second valve disposed at an outlet of the first purifier; and   a third valve disposed at an outlet of the second purifier.   
     
     
         20 . The system according to  claim 17 , wherein the wafer handling chamber further comprises a fan disposed in the bottom portion, and wherein the fan comprises a centrifugal fan configured to draw air from the top portion of the wafer handling chamber and push it to the air handling system.