Optical laminate, method for producing optical laminate, optical member, optical appratus, method for producing optical member, and method for producing optical apparatus
Abstract
The present invention provides an optical laminate including a void-containing layer with high strength against peeling, a method for producing the optical laminate, an optical member including the optical laminate, an optical apparatus including the optical laminate, a method for producing the optical member, and a method for producing the optical apparatus. The optical laminate ( 10 a ) or ( 10 b ) of the present inventions includes: a void-containing layer ( 12 ); and a hard layer ( 13 ) formed on the void-containing layer ( 12 ), wherein the void-containing layer ( 12 ) has a void fraction of 30 vol % or more, the hard layer ( 13 ) includes at least one element selected from the group consisting of metal, metal oxide, silicon, silicon oxide and an organic-inorganic hybrid material, and hardness measured by pushing an indenter of a nano indenter into the hard layer ( 13 ) for 20 nm is larger than hardness of the void-containing layer ( 12 ).
Claims
exact text as granted — not AI-modified1 . An optical laminate comprising;
a void-containing layer; and a hard layer formed on the void-containing layer, wherein the void-containing layer has a void fraction of 30 vol % or more, the hard layer comprises at least one element selected from the group consisting of metal, metal oxide, silicon, silicon oxide, and an organic-inorganic hybrid material, and hardness measured by pushing an indenter of a nano indenter into the hard layer for 20 nm is larger than hardness of the void-containing layer.
2 . The optical laminate according to claim 1 , wherein
the hardness measured by pushing an indenter of a nano indenter into the hard layer for 20 nm is 0.04 GPa or more.
3 . The optical laminate according to claim 1 , wherein
the hard layer comprises at least one element selected from the group consisting of silicon, aluminum, silicon dioxide, aluminum oxide, zinc tin complex oxide (ZTO), indium tin complex oxide (ITO), indium zinc complex oxide (IZO), gallium zinc complex oxide (GZO) and polysiloxane.
4 . The optical laminate according to claim 1 , comprising:
the hard layer with a thickness of 5 nm or more.
5 . The optical laminate according to claim 1 , comprising:
the hard layer formed by at least one method selected from the group consisting of vacuum vapor deposition, sputtering, and chemical vapor deposition (CVD).
6 . The optical laminate according to claim 1 , wherein
the void-containing layer is a porous material in which microporous particles of a silicon compound are chemically bonded with each other.
7 . The optical laminate according to claim 1 further comprising:
a pressure-sensitive adhesive/adhesive layer, wherein
the pressure-sensitive adhesive/adhesive layer is provided on the hard layer on a side opposite to the void-containing layer.
8 . A method for producing the optical laminate according to claim 1 comprising:
forming the hard layer on a surface of at least one side of the void-containing layer, wherein
the hard layer is formed by at least one method selected from the group consisting of the vacuum vapor deposition, the sputtering, and the chemical vapor deposition (CVD).
9 . An optical member comprising:
the optical laminate according to claim 1 .
10 . An optical apparatus comprising:
the optical member according to claim 9 .
11 . A method for producing the optical member according to claim 9 comprising:
producing the optical laminate by forming the hard layer on a surface of at least one side of the void-containing layer, wherein
the hard layer is formed by at least one method selected from the group consisting of the vacuum vapor deposition, the sputtering, and the chemical vapor deposition (CVD).
12 . A method for producing the optical apparatus according to claim comprising:
producing the optical member by forming the hard layer on a surface of at least one side of the void-containing layer, wherein the hard layer is formed by at least one method selected from the group consisting of the vacuum vapor deposition, the sputtering, and the chemical vapor deposition (CVD).Join the waitlist — get patent alerts
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