US2024192408A1PendingUtilityA1

Optical laminate, method for producing optical laminate, optical member, optical appratus, method for producing optical member, and method for producing optical apparatus

Assignee: NITTO DENKO CORPPriority: Mar 30, 2021Filed: Dec 28, 2021Published: Jun 13, 2024
Est. expiryMar 30, 2041(~14.7 yrs left)· nominal 20-yr term from priority
G02B 1/11G02B 2207/109G02B 2207/107G02B 1/14B32B 2266/0214B32B 2255/205B32B 2255/20C23C 14/34C23C 14/14C23C 14/08C09J 7/29C09J 7/26B32B 27/065C23C 18/122C23C 18/127G02B 6/0065G02B 6/0055G02B 1/045C23C 14/10C03C 2217/732C03C 2217/425C03C 17/3411C23C 18/1254B32B 5/18C03C 17/34
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Claims

Abstract

The present invention provides an optical laminate including a void-containing layer with high strength against peeling, a method for producing the optical laminate, an optical member including the optical laminate, an optical apparatus including the optical laminate, a method for producing the optical member, and a method for producing the optical apparatus. The optical laminate ( 10 a ) or ( 10 b ) of the present inventions includes: a void-containing layer ( 12 ); and a hard layer ( 13 ) formed on the void-containing layer ( 12 ), wherein the void-containing layer ( 12 ) has a void fraction of 30 vol % or more, the hard layer ( 13 ) includes at least one element selected from the group consisting of metal, metal oxide, silicon, silicon oxide and an organic-inorganic hybrid material, and hardness measured by pushing an indenter of a nano indenter into the hard layer ( 13 ) for 20 nm is larger than hardness of the void-containing layer ( 12 ).

Claims

exact text as granted — not AI-modified
1 . An optical laminate comprising;
 a void-containing layer; and   a hard layer formed on the void-containing layer, wherein   the void-containing layer has a void fraction of 30 vol % or more,   the hard layer comprises at least one element selected from the group consisting of metal, metal oxide, silicon, silicon oxide, and an organic-inorganic hybrid material, and   hardness measured by pushing an indenter of a nano indenter into the hard layer for 20 nm is larger than hardness of the void-containing layer.   
     
     
         2 . The optical laminate according to  claim 1 , wherein
 the hardness measured by pushing an indenter of a nano indenter into the hard layer for 20 nm is 0.04 GPa or more.   
     
     
         3 . The optical laminate according to  claim 1 , wherein
 the hard layer comprises at least one element selected from the group consisting of silicon, aluminum, silicon dioxide, aluminum oxide, zinc tin complex oxide (ZTO), indium tin complex oxide (ITO), indium zinc complex oxide (IZO), gallium zinc complex oxide (GZO) and polysiloxane.   
     
     
         4 . The optical laminate according to  claim 1 , comprising:
 the hard layer with a thickness of 5 nm or more.   
     
     
         5 . The optical laminate according to  claim 1 , comprising:
 the hard layer formed by at least one method selected from the group consisting of vacuum vapor deposition, sputtering, and chemical vapor deposition (CVD).   
     
     
         6 . The optical laminate according to  claim 1 , wherein
 the void-containing layer is a porous material in which microporous particles of a silicon compound are chemically bonded with each other.   
     
     
         7 . The optical laminate according to  claim 1  further comprising:
 a pressure-sensitive adhesive/adhesive layer, wherein 
 the pressure-sensitive adhesive/adhesive layer is provided on the hard layer on a side opposite to the void-containing layer. 
 
     
     
         8 . A method for producing the optical laminate according to  claim 1  comprising:
 forming the hard layer on a surface of at least one side of the void-containing layer, wherein 
 the hard layer is formed by at least one method selected from the group consisting of the vacuum vapor deposition, the sputtering, and the chemical vapor deposition (CVD). 
 
     
     
         9 . An optical member comprising:
 the optical laminate according to  claim 1 .   
     
     
         10 . An optical apparatus comprising:
 the optical member according to claim  9 .   
     
     
         11 . A method for producing the optical member according to  claim 9  comprising:
 producing the optical laminate by forming the hard layer on a surface of at least one side of the void-containing layer, wherein 
 the hard layer is formed by at least one method selected from the group consisting of the vacuum vapor deposition, the sputtering, and the chemical vapor deposition (CVD). 
 
     
     
         12 . A method for producing the optical apparatus according to claim comprising:
 producing the optical member by forming the hard layer on a surface of at least one side of the void-containing layer, wherein   the hard layer is formed by at least one method selected from the group consisting of the vacuum vapor deposition, the sputtering, and the chemical vapor deposition (CVD).

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