Method for Producing Titanium-containing Electrodeposit and Metal Titanium Electrodeposit

Abstract

Provided is a method for producing a titanium-containing electrodeposit, which can achieve good refinement by an electrodeposition without using the Kroll method. A method for producing a titanium-containing electrodeposit, including an electrodeposition step of electrodepositing a titanium-containing electrodeposit in a chloride bath, the chloride bath being a molten salt, using an anode including a TiAlO conductive material containing titanium, aluminum, and oxygen, and a cathode, wherein, in the electrodeposition step, a current density of the cathode is in a range of 0.3 A/cm 2 or more and 2.0 A/cm 2 or less, and wherein the chloride bath contains 1 mol % or more of a titanium subchloride.

1 . A method for producing a titanium-containing electrodeposit, comprising an electrodeposition step of electrodepositing a titanium-containing electrodeposit in a chloride bath, the chloride bath being a molten salt, using an anode comprising a TiAlO conductive material containing titanium, aluminum, and oxygen, and a cathode,
 wherein, in the electrodeposition step, a current density of the cathode is in a range of 0.3 A/cm 2  or more and 2.0 A/cm 2  or less, and   wherein the chloride bath contains 1 mol % or more of a titanium subchloride.   
     
     
         2 . The method for producing a titanium-containing electrodeposit according to  claim 1 , wherein a temperature of the chloride bath is 730° C. or more. 
     
     
         3 . The method for producing a titanium-containing electrodeposit according to  claim 1 , wherein the chloride bath contains 6 mol % or more of the titanium subchloride. 
     
     
         4 . The method for producing a titanium-containing electrodeposit according to  claim 1 , wherein the method comprises a generation step of generating the titanium subchloride by bringing metal titanium and titanium tetrachloride into contact with each other in a chloride bath, before the electrodeposition step. 
     
     
         5 . The method for producing a titanium-containing electrodeposit according to  claim 1  wherein the method comprises a generation step of generating the titanium subchloride by bringing sponge titanium and titanium tetrachloride into contact with each other in a chloride bath, before the electrodeposition step. 
     
     
         6 . The method for producing a titanium-containing electrodeposit according to  claim 1 , further comprising an extracting step of heating a chemical blend comprising a titanium ore containing titanium oxide, aluminum, and a separating agent to obtain the TiAlO conductive material, before the electrodeposition step. 
     
     
         7 . The method for producing a titanium-containing electrodeposit according to  claim 6 , wherein the separating agent comprises one or more selected from calcium fluoride, calcium oxide, and sodium fluoride. 
     
     
         8 . The method for producing a titanium-containing electrodeposit according to  claim 1 , wherein a refined titanium-containing electrodeposit is obtained by performing multiple electrodepositions in the electrodeposition step. 
     
     
         9 . The method for producing a titanium-containing electrodeposit according to  claim 8 , wherein the refined titanium-containing electrodeposit has an aluminum content of 1000 ppm by mass or less, an oxygen content of 500 ppm by mass or less, and a chlorine content of 500 ppm by mass or less. 
     
     
         10 . The method for producing a titanium-containing electrodeposit according to  claim 9 , wherein the refined titanium-containing electrodeposit has:
 a nitrogen content of 0.03% by mass or less;   a carbon content of 0.01% by mass or less;   an iron content of 0.010% by mass or less;   a magnesium content of 0.05% by mass or less;   a nickel content of 0.01% by mass or less;   a chromium content of 0.005% by mass or less;   a silicon content of 0.001% by mass or less;   a manganese content of 0.05% by mass or less; and   a tin content of 0.01% by mass or less.   
     
     
         11 . A metal titanium electrodeposit,
 wherein the metal titanium electrodeposit has an aluminum content of 5 ppm by mass or more and 1000 ppm by mass or less, an oxygen content of 100 ppm by mass or more and 500 ppm by mass or less, and a chlorine content of 500 ppm by mass or less.   
     
     
         12 . The metal titanium electrodeposit according to  claim 11 , wherein the metal titanium electrodeposit has:
 a nitrogen content of 0.001% by mass or more and 0.03% by mass or less;   a carbon content of 0.0004% by mass or more and 0.01% by mass or less;   an iron content of 0.010% by mass or less;   a magnesium content of 0.05% by mass or less;   a nickel content of 0.01% by mass or less;   a chromium content of 0.005% by mass or less;   a silicon content of 0.001% by mass or less;   a manganese content of 0.05% by mass or less; and   a tin content of 0.01% by mass or less.