US2024157511A1PendingUtilityA1
Method of manufacturing composite article
Assignee: TAIWAN SEMICONDUCTOR MFG CO LTDPriority: Oct 31, 2018Filed: Jan 25, 2024Published: May 16, 2024
Est. expiryOct 31, 2038(~12.3 yrs left)· nominal 20-yr term from priority
H10P 72/00H10P 52/403H10P 52/00B24B 47/12B24B 37/042B24B 29/02B24B 55/12B27N 3/08B24B 37/10Y02P80/30B24B 53/017B24B 37/04B27N 3/007H01L 21/304H01L 21/3212H01L 21/67
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Claims
Abstract
A method of manufacturing a composite article includes providing a polishing pad; rubbing over the polishing pad to produce a polishing pad debris; collecting the polishing pad debris; providing a wood material; and applying a force over the wood material and the polishing pad debris to form the composite article, wherein the composite article includes the wood material and the polishing pad debris, and the rubbing of the polishing pad includes removing a portion of the polishing pad to produce the polishing pad debris.
Claims
exact text as granted — not AI-modified1 . A method of manufacturing a composite article, comprising:
rubbing a polishing pad to produce polishing pad debris; collecting the polishing pad debris; providing a wood material; and applying a force over the wood material and the polishing pad debris to form the composite article including the wood material and the polishing pad debris.
2 . The method of claim 1 , wherein the rubbing of the polishing pad includes grinding a semiconductor structure by the polishing pad.
3 . The method of claim 2 , wherein the semiconductor structure is a substrate or a wafer.
4 . The method of claim 1 , wherein the polishing pad and the polishing pad debris include polyurethane (PU).
5 . The method of claim 1 , wherein a thickness of the polishing pad is reduced by the rubbing of the polishing pad.
6 . The method of claim 1 , wherein the rubbing of the polishing pad includes removing a portion of the polishing pad.
7 . The method of claim 1 , wherein a first content of the polishing pad debris in the composite article is less than a second content of the wood material in the composite article.
8 . The method of claim 7 , wherein a ratio of the first content to the second content is about 3:7.
9 . The method of claim 1 , wherein the application of the force includes compressing the wood material and the polishing pad debris to form the composite article.
10 . The method of claim 1 , further comprising assembling the composite article with a plurality of wooden bars to form a pallet.
11 . The method of claim 1 , wherein the composite article is in a block configuration.
12 . A method of manufacturing a composite article, comprising:
providing a polishing pad; providing a semiconductor structure disposed above the polishing pad; polishing the semiconductor structure by the polishing pad; collecting polishing pad debris produced upon the polishing; providing a wood material; and compressing the wood material and the polishing pad debris to form the composite article,
wherein the polishing pad debris includes a portion of the polishing pad removed from the polishing pad upon the polishing.
13 . The method of claim 12 , wherein the polishing pad debris is cleaned prior to the compression.
14 . The method of claim 12 , further comprising:
providing a plurality of wooden bars arranged substantially in parallel to each other; attaching the composite article to an end of one of the plurality of wooden bars.
15 . The method of claim 12 , wherein the semiconductor structure is rotated relative to the polishing pad during the polishing.
16 . The method of claim 12 , wherein the polishing pad is rotated relative to the semiconductor structure during the polishing.
17 . The method of claim 12 , wherein the semiconductor structure and the polishing pad are rotated simultaneously during the polishing.
18 . A method of manufacturing a composite article, comprising:
rubbing a semiconductor structure by a polishing pad to produce debris, wherein the debris includes polishing pad debris and semiconductor structure debris; cleaning the debris; providing a wood material; and applying a force over the wood material and the debris after the cleaning to form the composite article.
19 . The method of claim 18 , wherein the cleaning of the debris includes removing the semiconductor structure debris from the debris.
20 . The method of claim 18 , wherein the semiconductor structure debris in the debris after the cleaning is almost absent.Join the waitlist — get patent alerts
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