US2024157505A1PendingUtilityA1

Polishing pad

59
Assignee: UNIVERSAL PHOTONICS FAR EAST INCPriority: Aug 4, 2021Filed: Jan 19, 2024Published: May 16, 2024
Est. expiryAug 4, 2041(~15 yrs left)· nominal 20-yr term from priority
Inventors:Osamu KinoshitaKazuo Shoji
H10P 52/00B24B 37/24B24B 37/26
59
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Claims

Abstract

A polishing pad is formed from a foam body comprising substantially spherical air bubbles. When the density of a pad constituent material is denoted by DM g/cm 3 , the density of the polishing pad is in the range of 0.36 to 0.70 DM, the variation (standard deviation σ1) of an opening part diameter based on the air bubbles and formed in the surface of the polishing pad is adjusted to 45 μm or less, when the area of a portion surrounded by opening parts based on the air bubbles formed in the surface of the polishing pad is approximated to a circle, the variation (standard deviation σ2) of a diameter of the circle, is adjusted to 35 μm or less, and the air bubbles included in the foam body may be closed cell or open cell.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A polishing pad comprising a foam body containing substantially spherical air bubbles,
 wherein when the density of a pad constituent material is denoted by DM g/cm 3 , the density of the polishing pad is in the range of 0.36 to 0.70 DM, the variation (standard deviation σ1) of an opening part diameter based on the air bubbles formed in the surface of the polishing pad is adjusted to 45 μm or less,   when the area of a portion surrounded by an opening based on the air bubbles formed in the surface of the polishing pad is approximated to a circle, the variation (standard deviation σ2) of a diameter of the circle is adjusted to 35 μm or less.   
     
     
         2 . A polishing pad composed of foam containing substantially spherical air bubbles,
 wherein when the density of a pad constituent material is denoted by DM g/cm 3 , the density of the polishing pad is in the range of 0.36 to 0.70 DM, and when the area of a portion surrounded by an opening based on the air bubbles formed in the surface of the polishing pad is approximated to a circle, the variation (standard deviation σ2) of a diameter of the circle is adjusted to 35 μm or less.   
     
     
         3 . The polishing pad as defined in  claim 1 , wherein the foam is composed of a polyurethane foam. 
     
     
         4 . The polishing pad as defined in  claim 3 , wherein the average air bubble diameter of the urethane foam does not exceed 150 μm.

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