Exposure apparatus

Abstract

An exposure apparatus includes an exposure module that includes a spatial light modulator and projects and exposes pattern light generated by the spatial light modulator onto a substrate, and a determination unit configured to, when a plurality of substrates scheduled to be arranged on a substrate holder include a first substrate having a defect, determine a plurality of substrates to be arranged on the substrate holder from the plurality of substrates scheduled to be arranged on the substrate holder, based on a predetermined handling method for the first substrate.

1 . An exposure apparatus comprising:
 an exposure module that includes a spatial light modulator and projects pattern light generated by the spatial light modulator onto a substrate; and   a determination unit configured to, in response to that a plurality of substrates scheduled to be arranged on a substrate holder include a first substrate having a defect, determine a plurality of substrates to be arranged on the substrate holder from the plurality of substrates scheduled to be arranged on the substrate holder, based on a predetermined handling method for the first substrate.   
     
     
         2 . The exposure apparatus according to  claim 1 ,
 wherein the determination unit is configured to determine the plurality of substrates scheduled to be arranged on the substrate holder as the plurality of substrates to be arranged on the substrate holder, and   wherein the exposure module projects a pattern for a defect onto the first substrate, the pattern being generated by the spatial light modulator.   
     
     
         3 . The exposure apparatus according to  claim 1 , wherein the determination unit is configured to determine a substrate other than the first substrate among the plurality of substrates scheduled to be arranged on the substrate holder as the plurality of substrates to be arranged on the substrate holder. 
     
     
         4 . The exposure apparatus according to  claim 1 , wherein the determination unit is configured to determine a substrate other than the first substrate among the plurality of substrates scheduled to be arranged on the substrate holder and a second substrate other than the plurality of substrates scheduled to be arranged on the substrate holder as the plurality of substrates to be arranged on the substrate holder. 
     
     
         5 . The exposure apparatus according to  claim 4 , wherein the second substrate is arranged at a position where the first substrate is scheduled to be arranged on the substrate holder. 
     
     
         6 . The exposure apparatus according to  claim 4 , wherein a substrate different from the first substrate among the plurality of substrates scheduled to be arranged on the substrate holder is arranged at a position where the first substrate is scheduled to be arranged on the substrate holder. 
     
     
         7 . The exposure apparatus according to  claim 1 , further comprising a reception unit configured to receive selection of a handling method for the first substrate. 
     
     
         8 . The exposure apparatus according to  claim 1 , wherein, in response to that the spatial light modulator includes a defective element that cannot be driven in accordance with drawing data, the drawing data is changed so that the spatial light modulator including the defective element does not generate pattern light, or the exposure module is controlled so that pattern light generated by the spatial light modulator including the defective element is not projected. 
     
     
         9 . The exposure apparatus according to  claim 1 ,
 wherein the exposure module is provided in a plurality, and the plural exposure modules include a first exposure module and a second exposure module different from the first exposure module, and   wherein the exposure apparatus further comprises:   a change unit configured to, in response to that the spatial light modulator of the first exposure module includes a defective element that cannot be driven in accordance with drawing data, change the drawing data so that the second exposure module generates pattern light that is scheduled to be generated by the first exposure module; and a control unit configured to control a position of the substrate holder so that the pattern light generated by the second exposure module is projected onto a substrate onto which the pattern light is scheduled to be projected by the first exposure module.   
     
     
         10 . The exposure apparatus according to  claim 1 , further comprising:
 a change unit configured to, in response to that the spatial light modulator includes a defective element that cannot be driven in accordance with drawing data, change the drawing data so that elements other than the defective element among a plurality of elements of the spatial light modulator generate the pattern light; and   a control unit configured to control the exposure module so that the pattern light generated by the elements is projected onto a substrate onto which the pattern light is scheduled to be projected by the spatial light modulator including the defective element.   
     
     
         11 . An exposure apparatus comprising:
 a first exposure module that includes a first spatial light modulator and projects pattern light generated by the first spatial light modulator onto a substrate; and   a control device configured to generate drawing data for causing the first spatial light modulator to generate respective patterns to be exposed on a plurality of substrates actually arranged on a substrate holder,   wherein the control device is configured to, in response to that the first spatial light modulator includes a defective element that cannot be driven in accordance with the drawing data, change the drawing data so that the first spatial light modulator including the defective element does not generate pattern light, or control the first exposure module so that the pattern light generated by the first spatial light modulator is not projected.   
     
     
         12 . The exposure apparatus according to  claim 11 , further comprising:
 second exposure module including a second spatial light modulator,   a generation unit   configured to, in response to that the first spatial light modulator includes the defective element, change the drawing data into a changed drawing data so that the second exposure module different from the first exposure module generates pattern light that is scheduled to be generated by the first exposure module; and   a control unit configured to control a position of the substrate holder so that the pattern light generated by the second exposure module is projected onto a first substrate onto which the pattern light is scheduled to be projected by the first exposure module.   
     
     
         13 . An exposure apparatus comprising:
 an exposure module that includes a spatial light modulator and projects pattern light generated by the spatial light modulator onto a substrate;   a generation unit configured to generate drawing data for causing the spatial light modulator to generate respective patterns to be exposed on a plurality of substrates actually arranged on a substrate holder;   a change unit configured to, in response to that the spatial light modulator includes a defective element that cannot be driven in accordance with the drawing data, change the drawing data so that elements other than the defective element among a plurality of elements of the spatial light modulator generate the pattern light; and   elements is projected onto a first substrate onto which the pattern light is to be projected by the spatial light modulator.   
     
     
         14 . The exposure apparatus according to  claim 1 ,
 wherein in response to that the plurality of substrates scheduled to be arranged on the substrate holder include the first substrate having the defect, the exposure module projects a pattern for a defect onto the first substrate.   
     
     
         15 . The exposure apparatus according to  claim 3 , further comprising:
 arrange the substrate other than the first substrate having the defect on the substrate holder.   
     
     
         16 . The exposure apparatus according to  claim 7 ,
 wherein the reception unit is configured to select whether or not to continue exposure processing in response to that the plurality of substrates scheduled to be arranged on the substrate holder include the first substrate having the defect.   
     
     
         17 . The exposure apparatus according to  claim 1 , further comprising:
 a substrate exchange unit configured to, in response to that the plurality of substrates scheduled to be arranged on a substrate holder include the first substrate having the defect, arrange the plurality of substrates on the substrate holder based on the predetermined handling method.