Manufacturing equipment for light-emitting device

Abstract

Manufacturing equipment of a light-emitting device with which steps from formation to sealing of a light-emitting element can be successively performed can be provided. In the manufacturing equipment of a light-emitting device, a deposition step, a lithography step, an etching step, and a sealing step by forming a protective layer for forming an organic EL element can be successively performed, whereby a downscaled organic EL element achieving high luminance and high reliability can be formed. Moreover, the manufacturing equipment can have an in-line system where apparatuses are arranged in the order of process steps for the light-emitting device, resulting in high throughput manufacturing.

1 . A manufacturing equipment of a light-emitting device, comprising:
 a first cluster to an eleventh cluster and a first loadlock chamber to a tenth loadlock chamber,   wherein the first cluster is connected to the second cluster through the first loadlock chamber,   wherein the second cluster is connected to the third cluster through the second loadlock chamber,   wherein the third cluster is connected to the fourth cluster through the third loadlock chamber,   wherein the fourth cluster is connected to the fifth cluster through the fourth loadlock chamber,   wherein the fifth cluster is connected to the sixth cluster through the fifth loadlock chamber,   wherein the sixth cluster is connected to the seventh cluster through the sixth loadlock chamber,   wherein the seventh cluster is connected to the eighth cluster through the seventh loadlock chamber,   wherein the eighth cluster is connected to the ninth cluster through the eighth loadlock chamber,   wherein the ninth cluster is connected to the tenth cluster through the ninth loadlock chamber,   wherein the tenth cluster is connected to the eleventh cluster through the tenth loadlock chamber,   wherein each of the first cluster, the third cluster, the fourth cluster, the sixth cluster, the seventh cluster, the ninth cluster and the eleventh cluster is independently connected to a vacuum pump to reduce each pressure,   wherein each of atmospheres in the second cluster, the fifth cluster, the eighth cluster and the tenth cluster is independently connected to an inert gas atmosphere,   wherein each of the first cluster, the fourth cluster and the seventh cluster independently comprises a first carrying device and a first plurality of deposition apparatuses,   wherein each of the third cluster, the sixth cluster and the ninth cluster independently comprises a second carrying device, an etching apparatus and an ashing apparatus,   wherein each of the second cluster, the fifth cluster and the eighth cluster independently comprises a third carrying device and a plurality of apparatuses to perform lithography,   wherein the tenth cluster comprises a fourth carrying device and an etching apparatus,   wherein the eleventh cluster comprises a fifth carrying device and a second plurality of deposition apparatuses,   wherein the first carrying device comprises a substrate fixing portion, and   wherein the first carrying device has a mechanism of rotating the substrate fixing portion to reverse a substrate.   
     
     
         2 - 14 . (canceled) 
     
     
         15 . The manufacturing equipment of a light-emitting device according to  claim 1 , further comprising a twelfth cluster and an eleventh loadlock chamber,
 wherein the twelfth cluster is connected to the first cluster through the eleventh loadlock chamber,   wherein an atmosphere in the twelfth cluster is connected to an inert gas atmosphere, and   wherein the twelfth cluster comprises a cleaning apparatus and a baking apparatus.   
     
     
         16 . The manufacturing equipment of a light-emitting device according to  claim 15 ,
 wherein the twelfth cluster comprises a load chamber, and   wherein the eleventh cluster comprises an unload chamber.   
     
     
         17 . The manufacturing equipment of a light-emitting device, according to  claim 1 , further comprising a thirteenth cluster, a fourteenth cluster, a twelfth loadlock chamber and a thirteenth loadlock chamber,
 wherein the thirteenth cluster is connected to the third cluster through the third loadlock chamber,   wherein the thirteenth cluster is connected to the fourth cluster through the twelfth loadlock chamber,   wherein the fourteenth cluster is connected to the sixth cluster through the sixth loadlock chamber,   wherein the fourteenth cluster is connected to the seventh cluster through the thirteenth loadlock chamber,   wherein each of atmospheres in the thirteenth cluster and the fourteenth cluster is independently connected to an inert gas atmosphere, and   wherein each of the thirteenth cluster and the fourteenth cluster independently comprises a cleaning apparatus and a baking apparatus.   
     
     
         18 . The manufacturing equipment of a light-emitting device according to  claim 1 , wherein each of the first cluster, the fourth cluster and the seventh cluster independently comprises one or more of an evaporation apparatus, a sputtering apparatus, a chemical vapor deposition apparatus and an atomic layer deposition apparatus. 
     
     
         19 . The manufacturing equipment of a light-emitting device according to  claim 1 , wherein each of the third cluster, the sixth cluster and the ninth cluster comprises a dry etching apparatus. 
     
     
         20 . The manufacturing equipment of a light-emitting device according to  claim 1 , wherein the tenth cluster comprises a wet etching apparatus. 
     
     
         21 . The manufacturing equipment of a light-emitting device according to  claim 1 , wherein each of the second cluster, the fifth cluster and the eighth cluster independently comprises an application apparatus, a light-exposure apparatus, a developing apparatus and a baking apparatus in the plurality of apparatuses to perform lithography. 
     
     
         22 . The manufacturing equipment of a light-emitting device according to  claim 1 , wherein each of the second cluster, the fifth cluster and the eighth cluster independently further comprises an application apparatus and a nanoimprint apparatus in the plurality of apparatuses to perform lithography. 
     
     
         23 . The manufacturing equipment of a light-emitting device according to  claim 1 , wherein the manufacturing equipment is configured to manufacture a light-emitting device on a silicon wafer. 
     
     
         24 . The manufacturing equipment of a light-emitting device according to  claim 1 ,
 wherein each of the first plurality of deposition apparatuses comprises an alignment mechanism and a mask jig, and   wherein the alignment mechanism has a mechanism of attaching a substrate to the mask jig.   
     
     
         25 . A manufacturing equipment of a light-emitting device, comprising:
 a first cluster to an eleventh cluster and a first loadlock chamber to a tenth loadlock chamber,   wherein the first cluster is connected to the second cluster through the first loadlock chamber,   wherein the second cluster is connected to the third cluster through the second loadlock chamber,   wherein the third cluster is connected to the fourth cluster through the third loadlock chamber,   wherein the fourth cluster is connected to the fifth cluster through the fourth loadlock chamber,   wherein the fifth cluster is connected to the sixth cluster through the fifth loadlock chamber,   wherein the sixth cluster is connected to the seventh cluster through the sixth loadlock chamber,   wherein the seventh cluster is connected to the eighth cluster through the seventh loadlock chamber,   wherein the eighth cluster is connected to the ninth cluster through the eighth loadlock chamber,   wherein the ninth cluster is connected to the tenth cluster through the ninth loadlock chamber,   wherein the tenth cluster is connected to the eleventh cluster through the tenth loadlock chamber,   wherein the first cluster, the third cluster, the fourth cluster, the sixth cluster, the seventh cluster, the ninth cluster and the eleventh cluster is independently connected to a vacuum pump to reduce each pressure,   wherein each of atmospheres in the second cluster, the fifth cluster, the eighth cluster and the tenth cluster is connected to inert gas atmospheres,   wherein each of the first cluster, the fourth cluster and the seventh cluster independently comprises a first carrying device, a substrate transfer device and a first plurality of deposition apparatuses,   wherein each of the third cluster, the sixth cluster and the ninth cluster independently comprises a second carrying device, an etching apparatus and an ashing apparatus,   wherein each of the second cluster, the fifth cluster and the eighth cluster independently comprises a third carrying device and a plurality of apparatuses to perform lithography,   wherein the tenth cluster comprises a fourth carrying device and an etching apparatus,   wherein the eleventh cluster comprises a fifth carrying device and a second plurality of deposition apparatuses, and in each of the first cluster, the fourth cluster and the seventh cluster:
 wherein the substrate transfer device comprises a stage, a sixth carrying device and a seventh carrying device; 
 wherein the stage has a place to place a mask jig on the stage; 
 wherein the first carrying device is configure to carry the mask jig; 
 wherein the sixth carrying device has a mechanism of reversing a substrate to be mounted and a mechanism of mounting the substrate on the mask jig; and 
 wherein the seventh carrying device has a mechanism of taking out the substrate from being mounted on the mask jig and a mechanism of reversing the substrate. 
   
     
     
         26 . The manufacturing equipment of a light-emitting device according to  claim 25 ,
 wherein each of the first cluster, the fourth cluster and the seventh cluster has an alignment mechanism,   in each of the first cluster, the fourth cluster and the seventh cluster:
 wherein the substrate transfer device comprises a camera; 
 wherein the sixth carrying device has a substrate rotation mechanism; and 
 wherein the alignment mechanism is configured to adjust a position of the substrate by using the camera and the substrate rotation mechanism in order to mount the substrate on the mask jig. 
   
     
     
         27 . The manufacturing equipment of a light-emitting device according to  claim 26 , wherein the mask jig is configured to mount a plurality of substrates. 
     
     
         28 . The manufacturing equipment of a light-emitting device according to  claim 25 , further comprising a twelfth cluster and an eleventh loadlock chamber,
 wherein the twelfth cluster is connected to the first cluster through the eleventh loadlock chamber,   wherein an atmosphere in the twelfth cluster is connected to an inert gas atmosphere, and   wherein the twelfth cluster comprises a cleaning apparatus and a baking apparatus.   
     
     
         29 . The manufacturing equipment of a light-emitting device according to  claim 28 ,
 wherein the twelfth cluster comprises a load chamber, and   wherein the eleventh cluster comprises an unload chamber.   
     
     
         30 . The manufacturing equipment of a light-emitting device, according to  claim 25 , further comprising a thirteenth cluster, a fourteenth cluster, a twelfth loadlock chamber and a thirteenth loadlock chamber,
 wherein the thirteenth cluster is connected to the third cluster through the third loadlock chamber,   wherein the thirteenth cluster is connected to the fourth cluster through the twelfth loadlock chamber,   wherein the fourteenth cluster is connected to the sixth cluster through the sixth loadlock chamber,   wherein the fourteenth cluster is connected to the seventh cluster through the thirteenth loadlock chamber,   wherein each of atmospheres in the thirteenth cluster and the fourteenth cluster is independently connected to an inert gas atmosphere, and   wherein each of the thirteenth cluster and the fourteenth cluster independently comprises a cleaning apparatus and a baking apparatus.   
     
     
         31 . The manufacturing equipment of a light-emitting device according to  claim 25 , wherein each of the first cluster, the fourth cluster and the seventh cluster independently comprises one or more of an evaporation apparatus, a sputtering apparatus, a chemical vapor deposition apparatus and an atomic layer deposition apparatus. 
     
     
         32 . The manufacturing equipment of a light-emitting device according to  claim 25 , wherein each of the third cluster, the sixth cluster and the ninth cluster comprises a dry etching apparatus. 
     
     
         33 . The manufacturing equipment of a light-emitting device according to  claim 25 , wherein the tenth cluster comprises a wet etching apparatus. 
     
     
         34 . The manufacturing equipment of a light-emitting device according to  claim 25 , wherein each of the second cluster, the fifth cluster and the eighth cluster independently comprises an application apparatus, a light-exposure apparatus, a developing apparatus and a baking apparatus in the plurality of apparatuses to perform lithography. 
     
     
         35 . The manufacturing equipment of a light-emitting device according to  claim 25 , wherein each of the second cluster, the fifth cluster and the eighth cluster independently further comprises an application apparatus and a nanoimprint apparatus in the plurality of apparatuses to perform lithography. 
     
     
         36 . The manufacturing equipment of a light-emitting device according to  claim 25 , wherein the manufacturing equipment is configured to manufacture a light-emitting device on a silicon wafer. 
     
     
         37 . The manufacturing equipment of a light-emitting device according to  claim 25 ,
 wherein each of the first plurality of deposition apparatuses comprises an alignment mechanism and a mask jig, and   wherein the alignment mechanism has a mechanism of attaching a substrate to the mask jig.