Direct metal nano patterning

Abstract

Direct metal nano patterning is provided by constructing a carbon-based sheet that include self-assembled molecular monolayers (SAMs) of metals; and applying an electron beam to the carbon-based sheet to impart a pattern of metallic nano-particles in the carbon-based sheet.

1 - 15 . (canceled) 
     
     
         16 . A method for direct metal patterning on a carbon-based sheet built from self-assembled molecular monolayers (SAMs), comprising:
 embedding metallic atoms in the carbon-based sheet during a building block process of carbon-based molecular monolayers in the carbon-based sheet;   irradiating the carbon-based sheet with an electron beam or photons beam including Ultraviolet (UV) radiation to induce growth of metallic nanoparticles (NPs) at specific locations on the carbon-based sheet based on irradiation conditions; and   utilizing electron-metal or photon metal interactions and irradiation-induced electric-field to achieve both NP formation and metal nanopatterning on the carbon-based sheet.   
     
     
         17 . The method of  claim 16 , wherein the metallic NPs exhibit anisotropic growth and are directed to exist at predetermined locations on the carbon-based sheet. 
     
     
         18 . A substrate-free, resist-free method for direct metal patterning, comprising:
 using a metal-containing carbon-based sheet constructed from self-assembled monolayers of dithiole molecules or molecules with different end-functional groups as both the substrate and active material for patterning;   performing electron-beam irradiation or ultraviolet (UV) radiation on the metal-containing carbon-based sheet to induce formation of metallic nanoparticles and simultaneous metal nano-patterning; and   eliminating need for additional lift-off or metal evaporation steps typically associated with traditional patterning processes.   
     
     
         19 . The method of  claim 18 , wherein unexposed portions of the metal-containing carbon-based sheet, together with patterned metallic areas, form an integrated electronic component such as a diode, resistance, capacitor, or transistor, based on an electronic structure of molecules comprising the metal-containing carbon-based sheet. 
     
     
         20 . A direct electron-beam lithography method for single-step metallic patterning on self-assembled molecular-based sheets, comprising:
 using electron-beam irradiation or ultraviolet (UV) radiation on a metal-containing carbon-based sheet to create metallic nanoparticles through electron or photon-metal interactions and atom migration induced by irradiation-induced electric-fields; and   achieving different patterning designs by controlling parameters including electron-beam dose, diameter, and an irradiation method having a stationary or moving beam.   
     
     
         21 . The method of  claim 20 , wherein metallic patterning occurs on a periphery of an exposed area when subjected to a sudden high electron dose, resulting in formation of metallic patterns in parallel lines when using a moving electron beam. 
     
     
         22 . A carbon-based sheet patterned with metallic nanoparticles, produced by a one-step two-element direct electron-beam or photo-lithography process, comprising:
 using an electron beam or photon-beam and a metal-containing carbon-based sheet constructed from self-assembled monolayers (SAMs) to locally modify the SAMs and create complex surface nanostructures; and   incorporating patterned metallic areas and unexposed carbon-sheet as electronic components, including one or more of nanoscale conductive interconnect lines, diodes, resistors, capacitors, or transistors, depending on an electronics structure of molecules comprising the metal-containing carbon-based sheet.