Composition and method for treating substrate

Abstract

An object of the present invention is to provide a composition that leaves few residues in a case where the composition is brought into contact with a Ru-containing substance to perform an etching treatment on the Ru-containing substance, and to provide a method for treating a substrate. The composition according to an embodiment of the present invention contains one or more periodic acid compounds selected from the group consisting of a periodic acid and a salt thereof, a quaternary ammonium salt represented by Formula (A), and a trialkylamine or a salt thereof.

What is claimed is: 
     
         1 . A composition comprising:
 one or more periodic acid compounds selected from the group consisting of a periodic acid and a salt thereof,   a quaternary ammonium salt represented by Formula (A); and   a trialkylamine or a salt thereof,   
       
         
           
           
               
               
           
         
         in Formula (A), R a  to R d  each independently represent an alkyl group which may have a substituent, n represents an integer of 1 or 2, and X n−  represents Br − , Cl − , F − , CH 3 COO − , HSO 4   − , OH − , NO 3   − , or SO 4   2− . 
       
     
     
         2 . The composition according to  claim 1 ,
 wherein the composition is used for removing a ruthenium-containing substance on a substrate.   
     
     
         3 . The composition according to  claim 1 ,
 wherein the periodic acid compound includes at least one compound selected from the group consisting of orthoperiodic acid, metaperiodic acid, and salts thereof.   
     
     
         4 . The composition according to  claim 1 ,
 wherein a content of the periodic acid compound is 0.01% to 5.0% by mass with respect to a total mass of the composition.   
     
     
         5 . The composition according to  claim 1 ,
 wherein a total number of carbon atoms contained in the quaternary ammonium salt is 4 to 16.   
     
     
         6 . The composition according to  claim 1 ,
 wherein a total number of carbon atoms contained in the quaternary ammonium salt is 4 to 8.   
     
     
         7 . The composition according to  claim 1 ,
 wherein the quaternary ammonium salt includes at least one compound selected from the group consisting of a tetramethylammonium salt, a tetraethylammonium salt, a tetrabutylammonium salt, an ethyltrimethylammonium salt, a methyltriethylammonium salt, a diethyldimethylammonium salt, a methyltributylammonium salt, a dimethyldipropylammonium salt, a benzyltrimethylammonium salt, a benzyltriethylammonium salt, a trimethyl(hydroxyethyl)ammonium salt, and a triethyl(hydroxyethyl)ammonium salt.   
     
     
         8 . The composition according to  claim 1 ,
 wherein the trialkylamine or a salt thereof is a compound represented by Formula (1) or a salt thereof,   
       
         
           
           
               
               
           
         
         in Formula (1), R 1 , R 2 , and R 3  each independently represent an alkyl group which may have a substituent. 
       
     
     
         9 . The composition according to  claim 8 ,
 wherein R 1 , R 2 , and R 3  in Formula (1) each independently represent an alkyl group having 1 to 4 carbon atoms without a substituent.   
     
     
         10 . The composition according to  claim 1 ,
 wherein a content of the trialkylamine or a salt thereof is 1.0 ppb by mass to 1.5% by mass with respect to a total mass of the composition.   
     
     
         11 . The composition according to  claim 1 ,
 wherein a content of the trialkylamine or a salt thereof is 1.0 ppb by mass to 0.2% by mass with respect to a total mass of the composition.   
     
     
         12 . The composition according to  claim 1 , further comprising:
 a compound having at least one anion selected from the group consisting of IO 3   − , I − , and I 3   − .   
     
     
         13 . The composition according to  claim 12 ,
 wherein a mass ratio of a content of the trialkylamine to a total mass of the anion in the compound having the anion is 1×10 −5  to 1×10 5 .   
     
     
         14 . The composition according to  claim 1 ,
 wherein a pH of the composition is 2.0 to 11.0.   
     
     
         15 . The composition according to  claim 1 ,
 wherein a pH of the composition is 3.0 to 10.0.   
     
     
         16 . The composition according to  claim 1 ,
 wherein a pH of the composition is 4.0 to 8.0.   
     
     
         17 . A method for treating a substrate, comprising:
 a step A of removing a ruthenium-containing substance on a substrate by using the composition according to  claim 1 .   
     
     
         18 . The method for treating a substrate according to  claim 17 ,
 wherein the step A is a step A1 of performing a recess etching treatment on a ruthenium-containing wiring line or ruthenium-containing liner disposed on a substrate by using the composition, a step A2 of removing a ruthenium-containing film at an outer edge portion of a substrate, on which the ruthenium-containing film is disposed, by using the composition, a step A3 of removing a ruthenium-containing substance attached to a back surface of a substrate, on which a ruthenium-containing film is disposed, by using the composition, a step A4 of removing a ruthenium-containing substance on a substrate, which has undergone dry etching, by using the composition, a step A5 of removing a ruthenium-containing substance on a substrate, which has undergone a chemical mechanical polishing treatment, by using the composition, or a step A6 of removing a ruthenium-containing substance in a region other than a region where a ruthenium-containing film is supposed to be formed on a substrate by using the composition after a ruthenium-containing film is deposited on the region where a ruthenium-containing film is supposed to be formed on the substrate.   
     
     
         19 . The composition according to  claim 2 ,
 wherein the periodic acid compound includes at least one compound selected from the group consisting of orthoperiodic acid, metaperiodic acid, and salts thereof.   
     
     
         20 . The composition according to  claim 2 ,
 wherein a content of the periodic acid compound is 0.01% to 5.0% by mass with respect to a total mass of the composition.