Systems and methods for eliminating electromigration and self-heat violations in a mask layout block

Abstract

Computer-implemented systems and methods for improving construction of a mask layout block are provided including a processor, a computer-readable memory, a polygon analysis module, and an AI engine in communication with the processor, the computer-readable memory, and the polygon analysis module. The polygon analysis module is configured to analyze a selected position of a selected polygon in the mask layout block. The AI engine analyzes the mask layout block and builds a database to be used as an input for the polygon analysis module. In exemplary embodiments, the AI engine works incrementally, processing differences and variations in the mask layout block and analyzes only added and modified polygons. The AI engine has cognitive capabilities and is self-adapting to mask layout block data.

What is claimed is: 
     
         1 . A system for improving construction of a mask layout block, comprising:
 a processor;   a computer-readable memory;   a polygon analysis module configured to analyze a selected position of a selected polygon in the mask layout block; and   an AI engine in communication with the processor, the computer-readable memory, and the polygon analysis module;   wherein the AI engine analyzes the mask layout block and builds a database to be used as an input for the polygon analysis module.   
     
     
         2 . The system of  claim 1  wherein the AI engine works incrementally, processing differences and variations in the mask layout block. 
     
     
         3 . The system of  claim 1  wherein the AI engine analyzes only added and modified polygons. 
     
     
         4 . The system of  claim 1  wherein the AI engine has cognitive capabilities and is self-adapting to mask layout block data. 
     
     
         5 . The system of  claim 1  wherein the AI engine analysis includes analysis of corners, junctions, and vertices of polygons. 
     
     
         6 . The system of  claim 1  wherein the AI engine includes a convolutional neural network. 
     
     
         7 . The system of  claim 6  wherein the convolutional neural network classifies a polygon's features according to identified geometrical details and performs an on-the-fly reliability verification analysis. 
     
     
         8 . The system of  claim 7  wherein the convolutional neural network learns on-going design of the mask layout block and provides a real-time alert in event of a reliablity violation. 
     
     
         9 . The system of  claim 1  wherein the system determines if the selected position of the selected polygon or a length or width of the selected polygon violates an electromigration rule or self-heat rule. 
     
     
         10 . The system of  claim 9  wherein the system prevents creation, placement, and editing of the selected polygon at the selected position if the selected position or the length or the width would violate an electromigration rule or a self-heat rule. 
     
     
         11 . A computer-implemented method of improving construction of a mask layout block, comprising:
 determining a selected position of a selected polygon;   detecting intersecting line segments of the selected polygon including querying whether a first line segment and second line segment intersect; and   determining that the first line segment and the second line segment intersect if endpoints of the first line segment are on opposite sides of the second line segment and endpoints of the second line segment are on opposite sides of the first line segment.   
     
     
         12 . The computer-implemented method of  claim 11  further comprising performing a sweep line process. 
     
     
         13 . The computer-implemented method of  claim 12  wherein the sweep line process calculates intersections of lines. 
     
     
         14 . The computer-implemented method of  claim 11  further comprising:
 providing a violation marker associated with the selected position of the selected polygon; 
 determining if the selected position of the selected polygon produces a violation of one or more electromigration rules or self-heat rules associated with the selected polygon; and 
 preventing creating, placing, or editing of the selected polygon at the selected position if the selected position would violate at least one of the one or more electromigration rules or self-heat rules. 
 
     
     
         15 . A computer-implemented method of improving construction of a mask layout block including performing a sweep line process to calculate intersections of lines, comprising:
 performing a binary search to insert a line segment in a status data structure;   notifying neighbors of the line segment that they are no longer adjacent;   deleting intersection points of the neighbors from a stopping points data structure;   calculating intersections of the line segment with its neighbors and inserting the intersections into the stopping points data structure.