Composition for metal oxide film formation, method for producing composition for metal oxide film formation, and method for producing metal oxide film using the composition for metal oxide film formation
Abstract
Provided are a composition for metal oxide film formation, a method for producing the composition for metal oxide film formation, and a method for producing a metal oxide film using the composition for metal oxide film formation, which allow for a decrease in amount of residual metals after washing.The composition for metal oxide film formation according to an embodiment of the invention contains metal oxide nanoparticles, a capping agent, a polycarboxylic acid compound, and a solvent, wherein the metal oxide nanoparticles have a size of 5 nm or less; the capping agent includes at least one selected from the group consisting of an alkoxysilane, a phenol, an alcohol, a carboxylic acid, and a carboxylic acid halide; at least one of molecular chain(s) linking any two carboxy groups in the polycarboxylic acid compound has a side chain optionally having a heteroatom, and the side chain has an alkyl group; and in the solid content of the composition for metal oxide film formation, the ratio of the mass of inorganic matter is 25% by mass or more.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A composition for metal oxide film formation, comprising metal oxide nanoparticles, a capping agent, a polycarboxylic acid compound, and a solvent, wherein
the polycarboxylic acid compound is comprised as the capping agent, or separate from the capping agent, the metal oxide nanoparticles have a size of 5 nm or less, the capping agent comprises at least one selected from the group consisting of an alkoxysilane, a phenol, an alcohol, a carboxylic acid, and a carboxylic acid halide, at least one of molecular chain(s) linking any two carboxy groups in the polycarboxylic acid compound has a side chain optionally having a heteroatom, and the side chain has an alkyl group, and in the solid content of the composition for metal oxide film formation, a ratio of a mass of inorganic matter to a sum of the mass of the inorganic matter and a mass of organic matter is 25% by mass or more.
2 . The composition for metal oxide film formation according to claim 1 , wherein a metal comprised in the metal oxide nanoparticles is at least one selected from the group consisting of zinc, yttrium, hafnium, zirconium, lanthanum, cerium, neodymium, gadolinium, holmium, lutetium, tantalum, titanium, silicon, aluminum, antimony, tin, indium, tungsten, copper, vanadium, chromium, niobium, molybdenum, ruthenium, rhodium, rhenium, iridium, germanium, gallium, thallium, scandium, and magnesium.
3 . The composition for metal oxide film formation according to claim 1 , wherein the polycarboxylic acid compound is succinic acid having a side chain, and the side chain optionally has a heteroatom and has an alkyl group.
4 . The composition for metal oxide film formation according to claim 3 , wherein the succinic acid is spiculisporic acid.
5 . A method for producing the composition for metal oxide film formation according to claim 1 , the method comprising:
mixing a first dispersion comprising the metal oxide nanoparticles, the capping agent, and the solvent with a polycarboxylic acid compound solution comprising the polycarboxylic acid compound and the solvent, and the solvent, or mixing a second dispersion comprising the metal oxide nanoparticles, the polycarboxylic acid compound, and the solvent with the solvent.
6 . A method for producing a metal oxide film, the method comprising:
forming a coating film comprising the composition for metal oxide film formation according to claim 1 , and heating the coating film.
7 . The method for producing a metal oxide film according to claim 6 , further comprising performing at least one of edge-rinsing or back-rinsing.
8 . The method according to claim 6 , wherein the metal oxide film is a sacrificial film or a permanent film.Join the waitlist — get patent alerts
Track US2023416924A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.