US2023402399A1PendingUtilityA1
Semiconductor device and method for making the same
Est. expiryOct 29, 2041(~15.3 yrs left)· nominal 20-yr term from priority
H10W 42/276H10W 44/248H10W 90/00H10W 72/072H10W 72/20H10W 90/701H10W 74/114H10W 74/01H10W 42/20H10W 40/10H10W 44/20H10W 70/611H10W 70/685H10W 74/019H10W 74/014H10P 72/7416H10P 72/7428H10P 72/74H10W 72/071H05K 1/0218H10W 90/724H10W 70/093H01L 23/552H01L 23/3121H01L 21/56H01L 23/36H01Q 1/38H01Q 1/2283H05K 3/02H01Q 1/22H01Q 23/00H05K 1/165H05K 2201/10098H05K 1/181H05K 3/284H05K 3/4007H05K 3/3436H01R 12/716H05K 2201/10189
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Claims
Abstract
A semiconductor device comprises a substrate, at least one electronic component mounted on the substrate, an encapsulant formed on the substrate and at least partially encapsulating the at least one electronic component, a shielding layer formed on the encapsulant, a thermal interface layer formed on the shielding layer, and a metal lid formed on the thermal interface layer.
Claims
exact text as granted — not AI-modified1 . A semiconductor device, comprising:
a substrate; at least one electronic component mounted on the substrate; an encapsulant formed on the substrate and at least partially encapsulating the at least one electronic component; a shielding layer formed on the encapsulant; a thermal interface layer formed on the shielding layer; and a metal lid formed on the thermal interface layer.
2 . The semiconductor device of claim 1 , wherein the shielding layer comprises:
a wetting sublayer; and a shielding sublayer formed on the wetting sublayer.
3 . The semiconductor device of claim 2 , wherein the shielding layer further comprises a protection sublayer formed on the shielding sublayer.
4 . The semiconductor device of claim 3 , wherein the protection sublayer comprises stainless steel, organic solderability preservative, or nickel.
5 . The semiconductor device of claim 2 , wherein
the wetting sublayer comprises stainless steel or titanium; and the shielding sublayer comprises copper.
6 . The semiconductor device of claim 1 , wherein the encapsulant is constructed that a top surface of the at least one electronic component is exposed from the encapsulant to be in contact with the shielding layer.
7 . The semiconductor device of claim 1 , wherein the thermal interface layer comprises a solder paste.
8 . A semiconductor device, comprising:
a substrate; at least one electronic component mounted on the substrate; an encapsulant formed on the substrate and at least partially encapsulating the at least one electronic component; a thermal interface layer formed on the encapsulant; a metal lid formed on the thermal interface layer; and a shielding layer formed on the substrate and covering the metal lid, the thermal interface layer and the encapsulant.
9 . The semiconductor device of claim 8 , wherein the shielding layer comprises:
a shielding sublayer; and a protection sublayer formed on the wetting sublayer.
10 . The semiconductor device of claim 9 , wherein the shielding layer further comprises a wetting sublayer formed underneath the shielding sublayer.
11 . The semiconductor device of claim 10 , wherein the wetting sublayer comprises stainless steel or titanium.
12 . The semiconductor device of claim 9 , wherein
the shielding sublayer comprises copper; and the protection sublayer comprises stainless steel, organic solderability preservative, or nickel.
13 . The semiconductor device of claim 8 , wherein the encapsulant is constructed that a top surface of the at least one electronic component is exposed from the encapsulant to be in contact with the shielding layer.
14 . The semiconductor device of claim 8 , wherein the thermal interface layer includes a solder paste.
15 . A method for making a semiconductor device, comprising:
providing a substrate; mounting at least one electronic component on the substrate; forming an encapsulant on the substrate and at least partially encapsulating the at least one electronic component; forming a shielding layer on the encapsulant; forming a thermal interface layer on the shielding layer; and forming a metal lid on the thermal interface layer.
16 . The method of claim 15 , wherein the shielding layer comprises:
a wetting sublayer; and a shielding sublayer formed on the wetting sublayer.
17 . The method of claim 16 , wherein the shielding layer further comprises a protection sublayer formed on the shielding sublayer.
18 . The method of claim 15 , wherein the encapsulant is constructed that a top surface of the at least one electronic component is exposed from the encapsulant to be in contact with the shielding layer.
19 . The method of claim 15 , wherein the encapsulant is constructed to cover a top surface and lateral surfaces of the at least one electronic component.
20 . A method for making a semiconductor device, comprising:
providing a substrate; mounting at least one electronic component on the substrate; forming an encapsulant on the substrate and at least partially encapsulating the at least one electronic component; forming a thermal interface layer on the encapsulant; forming a metal lid on the thermal interface layer; and forming a shielding layer on the substrate and covering the metal lid, the thermal interface layer and the encapsulant.Join the waitlist — get patent alerts
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