Device and method for separating a material

Abstract

A method for separating a workpiece having a transparent material includes providing ultrashort laser pulses using an ultrashort pulse laser, introducing material modifications into the transparent material of the workpiece along a separation line, and separating the material of the workpiece along the separation line. The laser pulses form a laser beam that is incident onto the workpiece at a work angle. The material modifications are Type III modifications associated with a formation of cracks in the material of the workpiece. The material modifications penetrate two sides of the workpiece that are located in intersecting planes. Separating the material of the workpiece produces a chamfer and/or a bevel. A length of a hypotenuse of the chamfer and/or bevel is between 50 μm and 5000 μm.

1 . A method for separating a workpiece having a transparent material, the method comprising:
 providing ultrashort laser pulses using an ultrashort pulse laser,   introducing material modifications into the transparent material of the workpiece along a separation line, and   separating the material of the workpiece along the separation line, wherein the laser pulses form a laser beam that is incident onto the workpiece at a work angle, the material modifications are Type III modifications associated with a formation of cracks in the material of the workpiece, the material modifications penetrate two sides of the workpiece that are located in intersecting planes, separating the material of the workpiece produces a chamfer and/or a bevel, and a length of a hypotenuse of the chamfer and/or bevel is between 50 μm and 5000 μm.   
     
     
         2 . The method according to  claim 1 , wherein separating the material of the workpiece comprises a mechanical separation, and/or an etching procedure, and/or an application of heat, and/or a self-separation. 
     
     
         3 . The method according to  claim 1 , wherein
 the laser beam is a non-diffractive laser beam, and/or   the laser beam has a non-radially symmetric transverse intensity distribution, with the transverse intensity distribution appearing elongate in a direction of a first axis in comparison with a second axis perpendicular to the first axis.   
     
     
         4 . The device according to  claim 3 , wherein
 a projection of the non-radially symmetric transverse intensity distribution onto the workpiece appears to have a same size along the first axis and along the second axis as a result of the work angle, and/or   the projection of the non-radially symmetric transverse intensity distribution onto the workpiece is elongated in a feed direction, and/or   a ratio of the first axis to the second axis of the non-radially symmetric transverse intensity distribution is greater than a reciprocal of cosine of the work angle, and/or   the ratio of the first axis to the second axis is greater than √{square root over (2)}.   
     
     
         5 . The method according to  claim 1 , wherein the length of the hypotenuse of the chamfer and/or bevel is between 100 μm and 200 μm. 
     
     
         6 . The method according to  claim 1 , wherein:
 a pulse energy of the laser pulses is between 10 μJ and 5 μJ, and/or   a mean laser power is between 1 W and 1 kW, and/or   the laser pulses are individual laser pulses or part of a laser burst, a laser burst comprising 2 to 20 laser pulses, and the laser pulses of the laser burst having a temporal spacing of 10 ns to 40 ns, and/or   a wavelength of the laser [I;ses is between 300 nm and 1500 nm.   
     
     
         7 . The method according to  claim 1 , wherein the laser beam is polarized parallel to a plane of incidence. 
     
     
         8 . A device for separating a workpiece comprising a transparent material, the device comprising:
 an ultrashort pulse laser configured to provide ultrashort laser pulses,   a processing optical unit configured to introduce the laser pulses into the material of the workpiece, and   a feed device configured to move the laser beam formed by the laser pulses and the workpiece relative to one another with a feed along a separation line, and to orient an optical axis of the processing optical unit at a work angle relative to a surface of the workpiece, wherein the laser pulses are introduced into the workpiece at the work angle, material modifications are introduced in the material of the workpiece by the laser pulses, the material modifications are Type III modifications associated with a formation of cracks in the material of the workpiece, the material modifications penetrate two sides of the workpiece that are located in intersecting planes, a separation step separating the material of the workpiece produces a chamfer and/or a bevel, a length of a hypotenuse of the chamfer and/or bevel is between 50 μm and 5000 μm.   
     
     
         9 . The device according to  claim 8 , further comprising a beam shaping optical unit configured to shape the laser beam into a non-diffractive laser beam, with a transverse intensity distribution of the non-diffractive laser beam being non-radially symmetric, with the non-radially symmetric transverse intensity distribution being elongate in a direction of a first axis in comparison with a second axis perpendicular to the first axis. 
     
     
         10 . The device according to  claim 8 , wherein:
 the processing optical unit comprises a telescope system configured to introduce the laser beam with a reduced and/or increased size into the workpiece, and/or   the feed device comprises an axis device and a workpiece holder that are configured to move the processing optical unit and the workpiece relative to one another along three spatial axes in translational fashion and about at least two spatial axes in rotational fashion.   
     
     
         11 . The device according to  claim 8 , wherein:
 the work angle of the processing optical unit is between 0 and 60°, and/or component laser rays of the laser beam are incident on the workpiece at an angle of incidence of no more than 80° with respect to a surface normal of the workpiece.   
     
     
         12 . The device according to  claim 8 , further comprising a polarization optical unit, the polarization optical unit comprising a polarizer and a waveplate, and configured to adjust a polarization of the laser beam relative to a plane of incidence of the laser beam. 
     
     
         13 . The device according to  claim 12 , wherein the polarization optical unit is configured to adjust the polarization parallel to the plane of incidence of the laser beam. 
     
     
         14 . The device according to  claim 10 , wherein the axis device is adjusted for aligning a long axis of the non-radially symmetric transverse intensity distribution along a feed direction. 
     
     
         15 . The device according  claim 8 , further comprising:
 a beam guiding device configured to guide the laser beam to the workpiece, the beam guiding device comprising a mirror system and/or an optical fibre, and/or   control electronics configured to trigger a laser pulse emission of the ultrashort pulse laser based on relative positions of the laser beam and the workpiece.   
     
     
         16 . The device according to  claim 10 , wherein the workpiece holder has a surface that does not reflect and/or scatter the laser beam.