Graphene-enabled Block Copolymer Lithography Transfer to Arbitrary Surfaces

Abstract

A layer of nanopatterned phase separated block copolymers on an arbitrary surface comprising a first arbitrary substrate absent of chemical preparation, a layer of graphene on the first arbitrary substrate, and a layer of phase-separated block copolymers on the layer of graphene, wherein the layer of phase-separated block copolymers on the layer of graphene was formed on a second substrate and delaminated via water liftoff and wherein the nanopatterned phase separated block copolymers are utilized as a shadow mask for lithography on the first arbitrary substrate.

What we claim is: 
     
         1 . A graphene-enabled block copolymer lithography transfer to an arbitrary substrate, formed by the steps of:
 preparing graphene on a surface;   chemically-modifying the graphene;   adding block copolymers to the surface;   phase-separating the block copolymers;   forming nanopatterned phase separated block copolymers;   delaminating the graphene; and   transferring the graphene to a second surface.
 wherein the step of transferring the graphene maintains the nanopatterned phase separation of the block copolymers; 
 wherein the second surface does not undergo surface chemical preparation; and 
 wherein the step of delaminating the graphene is via water lift-off. 
   
     
     
         2 . The graphene-enabled block copolymer lithography transfer to an arbitrary substrate of  claim 1 ,
 wherein the second surface is absent chemical preparation.   
     
     
         3 . The graphene-enabled block copolymer lithography transfer to an arbitrary substrate of  claim 1 ,
 wherein the nanopatterned phase separated block copolymers are a shadow mask for lithography on the second surface.   
     
     
         4 . A layer of nanopatterned phase separated block copolymers on an arbitrary surface, comprising:
 a first arbitrary substrate absent of chemical preparation;   a layer of graphene on the first arbitrary substrate; and   a layer of nanopatterned phase-separated block copolymers on the layer of graphene;   wherein the layer of phase-separated block copolymers on the layer of graphene was formed on a second substrate and delaminated via water liftoff; and   wherein the nanopatterned phase separated block copolymers are utilized as a shadow mask for lithography on the first arbitrary substrate.   
     
     
         5 . The graphene-enabled block copolymer lithography transfer to an arbitrary substrate of  claim 4 ,
 wherein the graphene is chemically-modified.   
     
     
         6 . The graphene-enabled block copolymer lithography transfer to an arbitrary substrate of  claim 4 ,
 wherein the second surface does not undergo surface chemical preparation.