US2023323052A1PendingUtilityA1

Nanocomposite Films And Methods For Producing The Same

Assignee: UNIV PENNSYLVANIAPriority: May 12, 2014Filed: Mar 21, 2023Published: Oct 12, 2023
Est. expiryMay 12, 2034(~7.8 yrs left)· nominal 20-yr term from priority
C08J 5/18B05D 3/0254B08B 17/06B82Y 30/00B05D 5/00B82Y 40/00B05D 5/08B05D 1/005C08K 3/22B05D 3/0209B05D 3/067C08J 2325/06C08K 2003/2241C08K 2201/011
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Claims

Abstract

A smudge-resistant composite, comprising: a layer of polymer having embedded therein and extending therefrom at least one of: a plurality of stringed nanoparticles, carbon nanotubes, or carbon nanowires. A method of forming a smudge-resistant composite, comprising: disposing, on a substrate, a layer comprising a thermoplastic photoresist or a thermoplastic polymer; and incorporating into the layer a plurality of nanoparticles, the nanoparticles comprising at least one of stringed nanoparticles, nanotubes and nanowires, such that the nanoparticles are partially embedded in and extend from the layer.

Claims

exact text as granted — not AI-modified
What is claimed: 
     
         1 . A smudge-resistant composite, comprising:
 a layer of polymer having embedded therein and extending therefrom at least one of:   a plurality of stringed nanoparticles, nanotubes, or nanowires.   
     
     
         2 . The smudge-resistant composite of  claim 1 , wherein the layer of polymer has a plurality of stringed nanoparticles embedded therein and extending therefrom. 
     
     
         3 . The smudge-resistant composite of  claim 2 , wherein a stringed nanoparticle comprises silica. 
     
     
         4 . The smudge-resistant composite of  claim 2 , wherein a stringed nanoparticle is at least partially fluorinated. 
     
     
         5 . The smudge-resistant composite of  claim 1 , wherein a stringed nanoparticle has a diameter of less than about 20 nm, an overall length of less than about 100 nm, or both. 
     
     
         6 . The smudge-resistant composite of  claim 5 , wherein a stringed nanoparticle has a diameter of from about 10 to about 50 nm, an overall length of from about 40 to about 150 nm, or both. 
     
     
         7 . The smudge-resistant composite of  claim 1 , wherein the layer of polymer comprises at least one of a thermoplastic photoresist or a thermoplastic polymer. 
     
     
         8 . The smudge-resistant composite of  claim 7 , wherein the thermoplastic photoresist comprises SU-8. 
     
     
         9 . The smudge-resistant composite of  claim 7 , wherein the thermoplastic polymer comprises any one or more of high density polyethylene (HDPE), low density polyethylene (LDPE), thermoplastic polyurethane (TPU), or polystyrene (PS). 
     
     
         10 . The smudge-resistant composite of  claim 1 , wherein the layer of polymer is superposed over a substrate. 
     
     
         11 . The smudge-resistant composite of  claim 10 , wherein the substrate is plastic or glass. 
     
     
         12 . The smudge-resistant composite of  claim 11 , wherein the substrate comprises polyethylene terephthalate. 
     
     
         13 . The smudge-resistant composite of  claim 10 , wherein the smudge-resistant composite has a transparency of greater than about 80% across the visible spectrum. 
     
     
         14 . The smudge-resistant composite of  claim 1 , wherein the smudge-resistant composite exhibits a water contact angle of at least 150°, an olive oil contact angle of at least 150°, or a hexadecane contact angle of at least 150°. 
     
     
         15 . A method of forming a smudge-resistant composite, comprising:
 disposing, on a substrate, a layer comprising a thermoplastic photoresist or a thermoplastic polymer; and   incorporating into the layer a plurality of nanoparticles, the nanoparticles comprising at least one of stringed nanoparticles, nanotubes and nanowires, such that the nanoparticles are partially embedded in and extend from the layer.   
     
     
         16 . The method of  claim 15 , wherein the partially embedding comprises heating the layer to a temperature above the melting point of the thermoplastic photoresist or a thermoplastic polymer. 
     
     
         17 . The method of  claim 15 , wherein the partially embedding comprises heating the layer to a temperature of from about 100 to about 150° C. 
     
     
         18 . The method of  claim 15 , wherein the nanoparticles comprise stringed nanoparticles. 
     
     
         19 . The method of  claim 15 , wherein the substrate is plastic or glass. 
     
     
         20 . The method of  claim 15 , wherein the method is performed in a continuous fashion.

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